Refurbished Plasma-Therm 790 PECVD Plasma Enhanced Chemical Vapor Deposition System

SemiStar Corp. offers one refurbished Plasma-Therm 790 PECVD Plasma Enhanced Chemical Vapor Deposition System located at our Morgan Hill, California, USA facility. This system is available in refurbished condition with OEM specifications, subject to final inspection, configuration confirmation, and prior sale.

The Plasma-Therm 790 Series PECVD system is designed for semiconductor, MEMS, university, compound semiconductor, nanotechnology, and advanced materials thin-film deposition applications. The platform is widely used for dielectric film deposition processes including silicon nitride, silicon dioxide, passivation layers, and related PECVD thin-film applications.

Product photos are for reference only. Actual system configuration, accessories, cosmetic condition, utilities, and installed options should be confirmed by SemiStar’s final quotation and inspection report.

Availability

System Description

The Plasma-Therm 790 PECVD platform is a plasma enhanced chemical vapor deposition system designed for thin-film deposition applications in semiconductor research, university laboratories, MEMS processing, compound semiconductor fabrication, and advanced materials development.

The system supports PECVD dielectric film deposition processes including silicon nitride, silicon dioxide, passivation films, and related low-temperature plasma deposition applications. The platform is suitable for process development, pilot production, and research applications.

Current Configuration

• Plasma-Therm 790 PECVD system
• Approximate chuck size: 11 inch
• MKS mass flow controllers installed
• MKS Type 153 pressure controller
• RF Power Products Inc. RF matching/controller system
• RF Power Products Inc. AM-5 RF generator
• 500 W RF power
• 13.56 MHz RF frequency
• Industrial PECVD deposition platform
• Manual loading configuration
• Research and pilot production capability

Installed Gas Configuration

RF Power Configuration

• RF Power Products Inc. RF controller model: I22050007
• RF Generator model: AM-5
• 500 W RF output
• 13.56 MHz frequency
• 115 VAC, 50/60 Hz

Temperature Information

The exact installed heater and temperature controller configuration should be confirmed during final inspection. Based on typical Plasma-Therm 790 PECVD process applications and available configuration information, the estimated operating process temperature range is approximately 200 °C to 320 °C depending on process recipe, chuck configuration, substrate loading, and installed hardware.

Final process temperature capability and uniformity specifications should be confirmed during refurbishment and customer acceptance discussions.

Typical Applications

• PECVD silicon nitride deposition
• PECVD silicon dioxide deposition
• Low-temperature dielectric deposition
• Passivation film deposition
• MEMS thin-film processing
• Compound semiconductor dielectric films
• University and research institute process development
• Advanced materials and nanotechnology research

Facility Requirements

• Electrical power requirements to be confirmed during final configuration review
• Process gas cabinets and gas delivery systems required
• Vacuum pump and exhaust requirements to be reviewed
• Cooling water/chiller requirements to be confirmed
• Facility exhaust and scrubber compatibility required
• Customer responsible for utilities, facility preparation, gas safety systems, exhaust, abatement, and local code compliance unless specifically included in quotation

Refurbishment and Support

SemiStar can provide the equipment in refurbished condition with OEM specifications. Refurbishment scope, functional testing, installation, training, software verification, utilities integration, and warranty scope will be confirmed based on the final purchase order and customer requirements.

The standard offering includes a 6-month warranty after shipment unless otherwise stated in the official quotation. Installation and training can be quoted separately if required.

RFQ Information Requested

To help us recommend the best final configuration and support scope, please provide:

• Substrate size and material
• Target film type and process application
• Required deposition temperature range
• Required gas configuration changes if any
• Expected film thickness and uniformity targets
• Need for installation, startup, or training support
• Facility readiness and utility information
• Expected purchase timeline and budget range

Important Notes

• Subject to prior sale without notice.
• Final specifications subject to SemiStar official quotation and inspection confirmation.
• All OEM names, trademarks, and model names belong to their respective owners.
• SemiStar is not the OEM. Product information is provided for reference only and should not be used as final purchase specifications.
• Final purchase specifications, refurbishment scope, warranty terms, installation scope, and commercial terms must follow SemiStar’s official quotation.

Contact SemiStar

SS380-MSP-145