Description

Refurbished Perkin-Elmer 2400-8L Sputter Deposition Semiconductor System

SemiStar Corp. provides refurbished Perkin-Elmer 2400-8L sputter deposition systems for universities, research institutes, compound semiconductor laboratories, and semiconductor production environments.
The Perkin-Elmer 2400 series is one of the classic semiconductor sputtering platforms widely used for metal deposition, RF sputtering, DC sputtering, RF etch, and thin film research applications.

We currently have one Perkin-Elmer 2400-8L system available at refurbished condition only. The system can be configured with customized chamber and cathode configurations depending on customer applications and process requirements.

Photos and configuration shown are for reference only. Actual refurbished system configuration, options, controller layout, accessories, pumps, power supplies, cathodes, and utilities may vary depending on final customer requirements and refurbishment scope.

Available Refurbishment / Configuration Capability

• 1 to 3 cathode configuration available
• 8 inch circular cathode configuration
• RF sputter configuration
• DC sputter configuration
• RF etch capability
• Single target or multi-target deposition capability
• Sequential deposition capability
• Substrate rotation capability
• Cryopump or diffusion pump configuration available
• Manual or semi-automatic operating configuration
• Customized gas control configuration
• Customized wafer holders and substrate fixtures
• Process chamber refurbishment and vacuum restoration
• Optional upgraded controller/instrumentation depending on project scope

Perkin-Elmer 2400 Series Features

• Designed for high quality sputter deposition applications
• Wide process flexibility for research and production
• RF and DC sputtering capability
• Multiple target capability
• Low substrate temperature processing capability
• High vacuum process chamber design
• Load lock configuration available on 2400 series systems
• Cryopump compatible configuration
• Large rotating substrate table capability
• Thin film deposition for semiconductor and advanced material applications

The Perkin-Elmer 2400 series supports a wide range of thin film deposition applications including aluminum, titanium, platinum, refractory metals, dielectric films, RF bias sputtering, and co-sputtering applications.

Typical Applications

• Semiconductor metal deposition
• Research and development thin film deposition
• RF sputter deposition
• DC magnetron sputtering
• RF etch applications
• Compound semiconductor process development
• MEMS research
• University laboratory applications
• Optical coating research
• Advanced materials research

Typical 2400 Series Capability Information

• Up to 8 inch substrate capability depending on configuration
• Multi-target sputtering capability
• Sequential deposition capability
• RF bias capability
• High vacuum cryopump configuration available
• Rotating substrate table capability
• Load lock configuration available
• Process chamber heating options available depending on configuration

Perkin-Elmer 2400 series systems were designed for flexible sputter deposition processing and support various operating modes including RF magnetron sputtering, DC magnetron sputtering, RF diode sputtering, RF bias sputtering, co-sputtering, and RF etch configurations.

Vacuum System / Pumping Configuration

• Cryopump configuration available
• Diffusion pump configuration available
• Mechanical roughing pump system
• High vacuum process chamber
• Load lock capability depending on configuration
• Vacuum gauges and pressure control instrumentation

Facility Requirements For Reference Only

Final facility requirements depend on the final refurbished configuration, RF/DC power supply selection, cathode quantity, and customer process requirements.

• Electrical Requirements:
  208VAC, 3 Phase, 50/60Hz
• Cooling Water:
  Process chilled water or facility cooling water required
• CDA / Nitrogen:
  Depending on final gas control and process configuration
• Vacuum:
  Mechanical roughing pump and high vacuum pump system required

Important Notes

• System is sold only at refurbished condition
• Final system configuration depends on customer RFQ and application requirements
• System refurbishment scope may vary depending on selected options
• Customer responsible for facility preparation, utilities, exhaust, and installation environment
• Target materials, gas lines, MFCs, pumps, and accessories may vary
• Optional installation, startup, and training available
• Subject to prior sale

RFQ Information Recommended

To help recommend the correct Perkin-Elmer 2400-8L configuration, please provide:

• Substrate size and quantity
• Target materials
• RF or DC sputtering requirement
• Required cathode quantity
• Required deposition materials
• Film thickness requirements
• Uniformity requirements
• Vacuum configuration preference
• Gas configuration
• Current process information
• Budgetary expectations
• Expected purchase timeline