Description
Refurbished MRC 643 Sputtering System Materials Research Corp. Vacuum Deposition Equipment
SemiStar Corp. offers an MRC Materials Research Corporation 643 Sputtering System for semiconductor, university, research institute, optical coating, and advanced materials thin film deposition applications.
We have one MRC 643 sputtering system available. This system includes an AE MDX Magnetron Drive and an ENI Power Generator. Depending on customer budget and project requirements, it may be sold in AS-IS condition or refurbished condition with warranty and installation support if applicable.
Photos shown are for reference only. Actual configuration, options, condition, installed accessories, and final specifications may vary. Final purchase specifications are subject to formal quotation.
Availability
- MRC 643 Sputtering System
- OEM: Materials Research Corporation
- Serial Number: 1016533
- Available AS-IS or refurbished condition
- Warranty available for refurbished system under formal quotation terms
- Installation and startup support available if applicable
- Subject to prior sale
Current Configuration
- MRC Materials Research Corp. 643 Sputtering System
- Serial# 1016533
- AE MDX Magnetron Drive
- ENI Power Generator
- Vacuum process chamber
- System control cabinet and electronics
- Vacuum pumping system, subject to final inspection
- Vacuum gauges and controls, subject to final inspection
- Process gas configuration, subject to final inspection
Sales Options
- Option 1: AS-IS condition for customers with internal inspection and refurbishment capability
- Option 2: Refurbished condition with OEM specifications, warranty, and installation support if applicable
System Description
The MRC 643 is a legacy Materials Research Corporation sputtering platform designed for thin film vacuum deposition applications. The system may be used for research, development, process support, and production-related sputtering applications depending on final configuration and refurbishment scope.
This available system includes an AE MDX Magnetron Drive and an ENI Power Generator. Final system capability, cathode configuration, RF/DC power configuration, vacuum pump package, gauges, gas controls, and installed accessories should be confirmed during inspection and quotation.
Typical Applications
- Magnetron sputtering thin film deposition
- Semiconductor material research
- Metal thin film deposition
- Optical coating research
- Advanced materials R&D
- University and institute research applications
- Process development and pilot-scale coating
- Laboratory vacuum deposition applications
Refurbishment Capability
- System inspection and condition report
- Vacuum chamber cleaning
- Vacuum leak check
- AE MDX Magnetron Drive inspection
- ENI Power Generator inspection
- Vacuum pump inspection or service if required
- Gauge and control verification
- Electrical and interlock inspection
- Functional test before shipment if included in purchase scope
- Installation and startup support if applicable
Reference Specifications
| System Type | Sputtering vacuum deposition system |
| OEM | Materials Research Corporation |
| Model | MRC 643 |
| Serial Number | 1016533 |
| Included Power Components | AE MDX Magnetron Drive, ENI Power Generator |
| Condition | Available AS-IS or refurbished |
| Process Capability | Sputtering thin film deposition, subject to final configuration |
| Warranty | Available for refurbished system under formal quotation terms |
Facility Requirements
- Customer is responsible for facility preparation
- Electrical power requirements to be confirmed based on final configuration
- Cooling water may be required depending on power supply and pump configuration
- Compressed air may be required depending on valve configuration
- Vacuum pump exhaust connection required
- Process gas supply and gas safety system are customer responsibility
- Rigging, utilities, exhaust, and local code compliance are customer responsibility unless otherwise specified
RFQ Information Requested
- Substrate size and material
- Target materials
- Film thickness requirements
- Required film uniformity, if applicable
- RF/DC sputtering process requirements
- Process gas requirements
- Required vacuum level
- Facility location and available utilities
- Preferred purchase condition: AS-IS or refurbished
- Installation and training requirements
- Expected purchase timeline
Important Notes
- All configurations and specifications are subject to final inspection and formal quotation.
- Actual installed options, cathodes, power supplies, pump package, gauges, and controls must be confirmed before quotation.
- AS-IS systems are sold without refurbishment unless otherwise specified.
- Refurbished systems may include warranty and installation support under formal quotation terms.
- All OEM names and trademarks belong to their respective owners.
- Website information is for reference only and is not final purchase specification.
Contact SemiStar
SS380-LOT116-MSP-18500-350000
The following are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time! 1 11″ Ti Titanium Sputtering Targets 2 FIL-TECH G71PT .709″ PYREX TWIN TUNGSTEN FILAMENTS MRC STYLE SPUTTERING G-71-PT 3 FIL-TECH G71PT .709″ PYREX, TWIN TUNGSTEN FILAMENTS, MRC STYLE, SPUTTERING – NIB 4 LAM / MRC Materials Research CORP. DC SPUTTER CONTROL PCB, P/N 880-71-000 REV G 5 Material Research Corporation MRC 603-III 3-Target Side Sputtering Chamber 6 Material Research Corporation MRC 603-III 3-Target Side Sputtering Chamber 7 Material Research Corporation Ni Mz Nickel Magnesium Sputtering Target 8 Material Research Corporation VP Vanadium Sputtering Target 9 Materials Research Corp 20-554F-AL107-1000 MRC 11″ SPUTTERING TARGET 10 Materials Research Corp MRC (Tosoh-Varian) VP Delta Al/Si Sputter Target NOS 11 MRC 11″ Screw Eclpise Sputtering Target Al/Cu 1,5% 12 MRC 11″D Screw Eclpise Sputtering Target Al/Si 1% 13 MRC 20-555B-NB000-9000 NIOBIUM 99.8 RMX12 ASSY Sputtering Target Plate 14 MRC 5″ Stainless Steel ZINC Backing Plate, 808-03-005 Sputtering Target 15 MRC 500354-00 Belt, Timing .5W X15 Long Sputtering Tool 16 MRC 500665-00 Pin, Arm First, Sputtering Tool 17 MRC 500670-00 Bearing, Thrust Sputtering Tool 18 MRC 500676-00 Bearing Sputtering Tool 19 MRC 500679-00 Heater Cartridge 500W Sputtering Tool 20 MRC 500680-00 Heater Cartridge 100W Sputtering Tool 21 MRC 500681-00 Thermostat, Tempswitch Sputtering Tool 22 MRC 500691-00 Standoff, Vented Sputtering Tool 23 MRC 500737-00 Bearing, Arm (Elbow) Sputtering Tool 24 MRC 6 5/16″OD Ti/W Sputtering Target, NEW!! 25 MRC 808-88-100 NI/FE19% Mounted 6″ x 0.25″ TH Sputtering Target 26 MRC 828-04-200 VP Nickel 15″ x 4.75″ x 0.25″ Sputtering Target 27 MRC 902 Sputtering System, 2 Targets 28 MRC A114265 Quad 1000 RF Deck Sputter Power Supply 3500 VDC Rev. E 29 MRC Chi Sputter target: Al/Si 99/1 wt%, new, vacuum sealed 30 MRC CHI Sputtering Target Set Al/1SI/0.5Cu 31 MRC CHI Sputtering Target Set Al/Cu/Si VP Grade 32 MRC Materials Research A120024 Sputtering System Remote Stand Eclipse Star 33 MRC Materials Research A120024 Table Top Sputtering System Remote Eclipse 34 MRC Materials Research Corp A120024 Sputtering System Remote Stand Rev. B 35 MRC Materials Research Corp A120024 Sputtering System Remote Stand Rev. C 36 MRC Materials Research Corp. 900 In-Line Sputtering Systems Info Manual 1981 37 MRC Sputtering Conmag Target. AL / SI 30PPM for Varian 3180 38 MRC Sputtering Target #20-551C-AL235-3000 ~ AL/.5CU/1.2SI For S-Gun 39 MRC Sputtering Target #H46-0775-70915-04 ~ AL/.5CU/1.2SI For S-Gun 40 MRC SPUTTERING TARGET CONICAL II 20-551J-TI000-0018 41 MRC Sputtering Target. Al/30ppmSi. CCH CONICAL 1 TGT. for Varian 3180 42 MRC UNK VP Chromium 15″ x 4.75″ x 0.25″ Sputtering Target 43 PRAXAIR MRC 20-555B-MO000-300 MO MOLYBDENUM Sputtering Target Plate 44 PRAXAIR MRC MRCGTI0009678 TI TITANIUM Sputtering Target Plate 45 SEMICORE / MRC SEC-643 SC643 RF Sputter Coater Sputtering System 46 SiO2 sputtering target 4″ diameter 0.25″ thick sputter NEW old stock MRC 47 Sputtering Target Silicon Dioxide (SiO2) Diameter:3 inch Thick:0.5 inch:4 pcs 48 TEL / MRC SPUTTER PART P/N A115553 49 TEL Tokyo Electron D122081 Sputter Shield Rev. C MRC Metron New Surplus 50 Tosoh ( Materials Research Corp MRC -Varian) VP Delta Al/Cu Sputter Target NOS 51 Varian ( Materials Research Corp MRC -Tosoh) VP Delta Al/Si Sputter Target NOS
