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Oxford Plasmalab 100 PECVD

Description

OXFORD Plasma lab system 100 PECVD, Plasmalab 100 PECVD  (PDF with description and photos)

Condition: Refurbished

GAS BOX CONFIG

  • GAS 1 MKS 1479A 5%SiH4/N2 1000SCCM
  • GAS 2 MKS 1479A NH3 100SCCM
  • GAS 3 MKS 1179A N2 2000SCCM
  • GAS 4 MKS 1179A N2O 3000SCCM
  • GAS 5 MKS 1179A O2 300SCCM
  • GAS 6 MKS 1179A Ar 500SCCM(TEOS carrier gas)
  • TEOS THERMOTANK:THERMOCENTER salvis LAB

CHAMBER CONFIGURATION

  • Chuck φ202mm( φ2’φ4’φ6’φ8’)
  • Shower head φ225mm

RF SYSTEM

  • RF Generator:AE RFX600A
  • MATCH BOX:OPT AMU OXFORD
  • LF Generator:AE LF-5
  • MATCH BOX: MANUAL TRANSFOR UP

PRESSURE CONTROL

  • VALVE:VAT 12036-PA44
  • MKS VALVE CONTROL:253B

TURBO PUMP

  • ALCITEL ACT200T CONTROL UNIT
  • ALCITEL ATP 80/100 TURBO PUMP

LL CHAMBER

  • φ2’φ4’φ6’φ8’single wafer auto transfer
  • SLIT VALVE:VAT 02110-BA24-AQZ1
  • PIRANI GAUGE:EDWARDS APG-L-NW16
  • VACCUM GAUGE :EDWARDS AIM-S-NW25

DRY PUMP

  • EDWARDS:QDP40

SYSTEM CONTROL

  • HP PC system,Windows XP

POWER

  • POWER:208VAC 3PHASE
  • FULL LOAD:25AMPS

Location: Jiangsu, China

Lead time: 4 TO 12 WEEKS DEPENDING ON PURCHASE TIME.

Valid Time: Subject to prior sale. This item is only for end user

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The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers