Description
- RF Biasable Platen
- Thickness Monitor
- 5×10-7 Torr base pressure
- High accuracy and repeatability
- High quality films
- Atomic level clean surfaces
- Atomic cleaning and polishing
- LabVIEW user interface
- Automatic load/Unload
- Automatic transfer between chambers
- Recipe driven, password protected
- Safety interlocks
- 46″x44″ footprint
Options
- Sputter down/up
- Co-sputtering
- DC, RF and pulsed power supplies
- Ion beam assisted deposition
- E-Beam and plasma sources
Applications:
- Optical coatings: Sputtering and IBAD
- Reactive ion beam etching cleaning
- Ion beam milling
- Infrared coatings
- Surface treatment
The trademarks of the equipment and parts contained on this page belong to the Original Equipment Manufacturers.
Nano-Master Main Equipment: Thin Film | Etch | Cleaning | Space Simulation | Hybrid
SS10840
