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New Wet Process Equipment

Description

New Wet Process Equipment – Spin Rinse Dryers, Box Washers, Mask Cleaners, Waste Carboys, Bottle Washers, Wet Benches, Chemical Delivery Systems

New + Refurbished + Customized Wet Process Equipment Solutions

Quick Navigation : Spin Rinse Dryers (SRD)Wet BenchesBox WashersMask CleanersChemical Systems

SemiStar provides new wet processing equipment solutions for semiconductor fabs, universities, and R&D facilities. Our systems support wafer cleaning, drying, chemical processing, and contamination control across a wide range of applications.

We combine new equipment platforms, refurbished legacy systems, and customized configurations to deliver flexible, cost-effective, and production-proven solutions tailored to your process requirements.


Key Equipment Offerings

Spin Rinse Dryers (SRD)

High-performance systems designed for wafer cleaning and drying processes.

  • Single and dual stack configurations
  • Compatible with multiple wafer sizes (2”–8” and beyond)
  • Stable and repeatable drying performance
  • Ideal for post-etch, post-clean, and surface preparation

Wet Benches

Flexible wet processing systems for batch chemical treatment in cleanroom environments.

  • Acid and solvent process capability
  • Manual and semi-automated configurations
  • Custom deck layouts and tank designs
  • Easy integration with existing fab infrastructure

Chemical Handling & Delivery Systems

Designed for safe, reliable, and efficient wet processing operations.

  • Centralized or tool-level chemical delivery
  • Compatible with acids, solvents, and DI water
  • Integrated safety and monitoring features
  • Seamless connection to wet benches and standalone tools

Box Washers / Cassette Cleaners

Automated systems for cleaning wafer carriers, cassettes, and process hardware.

  • Supports a wide range of cassette and box types
  • High-throughput cleaning capability
  • Custom racks for different substrates
  • Spare parts and upgrade support available

Mask Cleaners

Precision cleaning systems for photomasks and reticles.

  • Configurable cleaning processes
  • Compatible with masks, wafers, and film frames
  • High repeatability and contamination control
  • Suitable for both R&D and production environments

Upgrade & Modernization Options

SemiStar offers upgrade solutions to enhance performance, reliability, and usability:

  • PLC and touchscreen HMI upgrades
  • Improved recipe management and process control
  • SECS/GEM compatibility for fab integration
  • Advanced diagnostics and troubleshooting

Refurbished + New Hybrid Solutions

In addition to new equipment, we provide:

  • Refurbished legacy systems (e.g., SRD, wet benches, cleaners)
  • Re-engineered and upgraded platforms
  • Spare parts and field service support

This approach allows customers to achieve the optimal balance of cost, performance, and lead time.


Applications

  • Wafer cleaning and drying
  • Post-etch and post-deposition cleaning
  • Surface preparation
  • Chemical processing
  • Photomask and reticle maintenance
  • Cassette and carrier cleaning

Why Work with SemiStar

  • Multi-source equipment solutions (new + refurbished)
  • Strong experience in compound semiconductor and research fabs
  • Flexible configurations tailored to your process
  • Fast RFQ response and engineering support

Request a Quote

Please provide the following information and our team will recommend a suitable configuration:

  • Wafer size and material
  • Process type (cleaning, chemical, etc.)
  • Throughput requirement
  • Facility constraints (cleanroom, utilities)
  • Budget and purchase timeline

Quick Navigation : Spin Rinse Dryers (SRD)Wet BenchesBox WashersMask CleanersChemical Systems

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