Description
150mm assets from a running fab in the US. This is only for end user. All are subject to prior sale.
Please contact us if you have any questions. Appreciate your time!
| Manufacturer | Model | Process Type | Wafer |
| Advanced Modular Systems, Inc. | AMS 2000 | PVD (Physical Vapor Deposition) | 150mm |
| Advanced Modular Systems, Inc. | AMS 2000 | PVD (Physical Vapor Deposition) | 150mm |
| Advanced Modular Systems, Inc. | AMS 2000 | PVD (Physical Vapor Deposition) | 150mm |
| Advanced Modular Systems, Inc. | AMS 2000 | PVD (Physical Vapor Deposition) | 150mm |
| Akrion | V2 | Batch Wafer Processing | 150mm |
| Applied Materials | P-5000 Mark II Delta CVD | PECVD (Chemical Vapor Deposition) | 150mm |
| Applied Materials | P-5000 Mark II Delta CVD | PECVD (Chemical Vapor Deposition) | 150mm |
| Applied Materials | P-5000 Mark II Delta CVD | PECVD (Chemical Vapor Deposition) | 150mm |
| Applied Materials | P-5000 Mark II Delta CVD | PECVD (Chemical Vapor Deposition) | 150mm |
| Bruce Technology International | BDF-41 | Horizontal Atmospheric Furnace | 150mm |
| Bruce Technology International | BDF-41 | Horizontal Atmospheric Furnace | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Dainippon Screen Mfg. Co. | SK-80BW-AVPE | Single Block (Resist Coater/Developer) | 150mm |
| Despatch Industries | LCD1-16-3 | Cure Oven | 150mm |
| Despatch Industries | LCD1-16-3 | Cure Oven | 150mm |
| Despatch Industries | LCD1-16-3 | Cure Oven | 150mm |
| Despatch Industries | LCD1-16-3 | Cure Oven | 150mm |
| EV Group | Gemini | Fully-Automated Wafer Bonder | 150mm |
| EV Group | Gemini | Fully-Automated Wafer Bonder | 150mm |
| FEI Company | Vectra Vision | Focused Ion Beam (FIB) | 150mm |
| Frontier Semiconductor Measurements, Inc. | FSM 128 | Stress Measurement | 150mm |
| FSI International | Mercury MP | Batch Wafer Processing | 150mm |
| FSI International | Mercury MP | Batch Wafer Processing | 150mm |
| Fusion Semiconductor Systems | 150PC | UV Cure System | 150mm |
| Fusion Semiconductor Systems | 150PC | UV Cure System | 150mm |
| Fusion Semiconductor Systems | 150PC | UV Cure System | 150mm |
| Fusion Semiconductor Systems | 150PC | UV Cure System | 150mm |
| Fusion Semiconductor Systems | 200PCU | UV Cure System | 150mm |
| Fusion Semiconductor Systems | 200PCU | UV Cure System | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| GaSonics International | L3510 | Stripper/Asher | 150mm |
| Heller Industries, Inc. | 1809EXL | IR reflow | 150mm |
| Hitachi (Semiconductor) | S-9380 | SEM – Critical Dimension (CD) Measurement | 150mm |
| Hitachi (Semiconductor) | S-8840 | SEM – Critical Dimension (CD) Measurement | 150mm |
| Hitachi (Semiconductor) | S-8840 | SEM – Critical Dimension (CD) Measurement | 150mm |
| Jabil Chad Automation | WaferMate200 | Wafer and Substrate Handling | 150mm |
| Jabil Chad Automation | WaferMate200 | Wafer and Substrate Handling | 150mm |
| JST Manufacturing, Inc. | Automated Wet Bench (Solvent) | Batch Wafer Processing | 150mm |
| JST Manufacturing, Inc. | Automated Wet Bench (Solvent) | Batch Wafer Processing | 150mm |
| JST Manufacturing, Inc. | Automated Wet Bench (Solvent) | Batch Wafer Processing | 150mm |
| KLA-Tencor Corp. | AIT I | Darkfield Inspection | 150mm |
| KLA-Tencor Corp. | FLX-5400 | Stress Measurement | 150mm |
| KLA-Tencor Corp. | FLX-5400 | Stress Measurement | 150mm |
| KLA-Tencor Corp. | FLX-5400 | Stress Measurement | 150mm |
| KLA-Tencor Corp. | Surfscan 6200 | Particle Measurement | 150mm |
| LAM Research | Alliance (A6) TCP 9400DSiE | Polysilicon Etch | 150mm |
| LAM Research | Alliance (A6) TCP 9400DSiE – Chamber Only | Polysilicon Etch | 150mm |
| LAM Research | Alliance (A6) TCP 9400DSiE – Chamber Only | Polysilicon Etch | 150mm |
| LAM Research | Alliance (A6) TCP 9400DSiE – Chamber Only | Polysilicon Etch | 150mm |
| LAM Research | Alliance (A6) 4720XL | Metal Etch | 150mm |
| LAM Research | Rainbow 4520 | Dielectric Etch | 150mm |
| LAM Research | Rainbow 4520 | Dielectric Etch | 150mm |
| LAM Research | Synergy | Wafer Scrubber – Post CMP | 150mm |
| LAM Research | Synergy | Wafer Scrubber – Post CMP | 150mm |
| LAM Research | Alliance (A6) TCP 9600PTX | Metal Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | TCP 9600SE | Metal Etch | 150mm |
| LAM Research | AutoEtch 590 | Dielectric Etch | 150mm |
| LAM Research | TCP 9600SE | Metal Etch | 150mm |
| LAM Research | AutoEtch 790 | Metal Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | Rainbow 4420 | Multi-Process Etch | 150mm |
| LAM Research | Rainbow 4520 | Dielectric Etch | 150mm |
| Leitz | Ergolux | Microscope | 150mm |
| Leitz | Ergolux | Microscope | 150mm |
| Materials Research Corp. | Eclipse Mark II | PVD (Physical Vapor Deposition) | 150mm |
| Materials Research Corp. | Eclipse Mark II | PVD (Physical Vapor Deposition) | 150mm |
| Materials Research Corp. | Eclipse Mark II | PVD (Physical Vapor Deposition) | 150mm |
| Materials Research Corp. | Eclipse Mark II | PVD (Physical Vapor Deposition) | 150mm |
| MEI, LLC. | REVOLUTION Classic-3 | Batch Wafer Processing | 150mm |
| MEI, LLC. | REVOLUTION Classic-3 | Batch Wafer Processing | 150mm |
| MEI, LLC. | REVOLUTION Classic-3 | Batch Wafer Processing | 150mm |
| MEI, LLC. | REVOLUTION Classic-3 | Batch Wafer Processing | 150mm |
| MEI, LLC. | Advancer Classic 150 | Batch Wafer Processing | 150mm |
| MEI, LLC. | REVOLUTION Classic-3 | Batch Wafer Processing | 150mm |
| Nanometrics Inc. | NanoSpec 9100 | Film Thickness Measurement System | 150mm |
| Nanometrics Inc. | NanoSpec 9100 | Film Thickness Measurement System | 150mm |
| Nanometrics Inc. | NanoSpec 9100 | Film Thickness Measurement System | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i11D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i11D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i11D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i12D | i-Line Stepper | 150mm |
| Nikon | ECLIPSE L200 | Microscope | 150mm |
| Nikon | ECLIPSE L200 | Microscope | 150mm |
| Nikon | NSR-2205i11D | i-Line Stepper | 150mm |
| Nikon | NSR-2205i11D | i-Line Stepper | 150mm |
| Novellus Systems Inc. | Concept One | TEOS | 150mm |
| Novellus Systems Inc. | Concept One | TEOS | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| Octel | Cabinet | Other | 150mm |
| OnTrak Systems, Inc. | DSS-200 Series II | Wafer Scrubber – Post CMP | 150mm |
| OnTrak Systems, Inc. | DSS-200 Series II | Wafer Scrubber – Post CMP | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200X Cu | Film Thickness Measurement System | 150mm |
| Rudolph Technologies, Inc. | MetaPULSE 200 | Film Thickness Measurement System | 150mm |
| Santa Clara Plastics | 9400 | Batch Wafer Processing | 150mm |
| Semitool Inc. | SAT | Batch Wafer Processing | 150mm |
| Semitool Inc. | Raider ECD | ECD (Electro Chemical Deposition) | 150mm |
| Sikama International, Inc. | Falcon ICS 412 | Wafer Coating | 150mm |
| Solid State Equipment Corporation | SSEC 3303/4 | Single Wafer Processing | 150mm |
| Solid State Equipment Corporation | SSEC 3303/4 | Single Wafer Processing | 150mm |
| Solid State Equipment Corporation | SSEC 3303/4 | Single Wafer Processing | 150mm |
| SpeedFam Corp. | CMP-V | Dielectric CMP | 150mm |
| SpeedFam Corp. | CMP-V | Dielectric CMP | 150mm |
| Suss Microtec AG | ACS200 Plus | Linear Wafer Tracks (Resist Coater/Developer) | 150mm |
| SVG Thermco | VTR-7000 | Vertical Diffusion Furnace | 150mm |
| SVG Thermco | VTR-7000 | Vertical Diffusion Furnace | 150mm |
| SVG Thermco | VTR-7000 | Vertical Diffusion Furnace | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Tokyo Electron Ltd. | CLEAN TRACK ACT 8 | Single Block (Coat/Develop) | 150mm |
| Varian Semiconductor Equipment Associates | E500HP | Mid Current Implanter | 150mm |
| Varian Semiconductor Equipment Associates | E500HP | Mid Current Implanter | 150mm |
| Veeco/Sloan Technology | C-1 MicroEtch IBE 350 | Ion Milling | 150mm |
| Veeco/Sloan Technology | C-1 MicroEtch IBE 350 | Ion Milling | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
| Verteq, Inc. | 1600 | Spin Rinse / Dryer (SRD) | 150mm |
ID-OEM-000-2
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