Description
Typical NANOTECHNOLOGY Lab Fab Equipment
Please contact us for our Main Refurbished Equipment. Appreciate your time.
The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.
| PHOTOLITHOGRAPHY |
| REYNOLDSTECH PHOTOLITHOGRAPHY HOODS AND SPINNERS |
| LAURELL SPIN COATER |
| HEIDELBERG µPG 101 LASER WRITER |
| HEIDELBERG DWL 66+ LASER WRITER |
| SUSS MICROTEC MA6 MASK ALIGNER |
| SUSS MICROTEC DUV MA6 MASK ALIGNER |
| THERMO VACUUM OVEN |
| BLUE M OVEN |
| YES HMDS OVEN |
| ELECTRON-BEAM LITHOGRAPHY |
| NABITY PATTERN GENERATION SYSTEM (v9.1) |
| NANOBEAM Ltd. nB4 SYSTEM |
| GenISys BEAMER PROXIMITY CORRECTION SOFTWARE |
| THIN-FILM DEPOSITION, GROWTH, AND ANNEAL |
| EDWARDS BOC/AUTO 306 THERMAL EVAPORATOR
TES FC-1800 |
| CRESSINGTON 108 MANUAL SPUTTER COATER |
| OXFORD PLASMAPRO NPG80 PECVD (SiO2, SiNx & a-Si) |
| ANGSTROM EVOVAC DEPOSITION SYSTEM (E-BEAM, THERMAL AND SPUTTER DEPOSITION) |
| ANGSTROM ULTRA HIGH VACUUM E-BEAM DEPOSITION SYSTEM |
| AJA DIELECTRIC SPUTTERING ORION-8 |
| AJA METALLIC SPUTTERING ORION-3 |
| CAMBRIDGE NANO TECH INC SAVANNAH 200 ALD |
| SCS LABCOTER 2 PARYLENE DEPOSITION SYSTEM |
| EXPERTECH LPCVD FURNACE (SiNx, SiOx, SiC, AND ANNEAL)
SAVANNAH S200-ALD |
| SOLARIS 100, RTA
Heatpulse 8108 |
| DRY ETCH & WET PROCESSING |
| OXFORD PLASMA PRO 100 COBRA – CL RIE
Tegal 901e |
| OXFORD PLASMA PRO 100 COBRA – F RIE and DRIE |
| OXFORD PLASMALAB 80+ ICP (ICP ANISOTROPIC ETHCING OF Si including Bosch, SiO2, SiN AND DIELECTRIC MATERIALS) |
| DIENER PLASMA ETCH SYSTEM (OXYGEN AND HYDROGEN PLASMA ETCH SYSTEM) |
| ANATECH PLASMA ASHER |
| REYNOLDSTECH WET PROCESSING STATIONS |
| RCA STATION |
| SPIN RINSE DRY WAFER STATION |
| UVOCS UV/OZONE CLEANER |
| BACK-END & PACKAGING |
| TPT WIRE BONDER – HB10 |
| DICING SAW – DISCO DAD3220 |
| CHEMICAL MECHANICAL POLISHING – G&P POLI 400L |
| CRITICAL POINT DRYER, BAL-TEC 030 |
| METROLOGY |
| KLA P-17 STYLUS PROFILER |
| WYKO NT9100 (OPTICAL PROFILER) |
| FILMETRICS THIN FILM MEASUREMENT SYSTEM |
| NIKON ECLIPSE (OPTICAL MICROSCOPE + DIGITAL CAMERA) |
| SURFACE PROFILOMETER, ALPHA STEP D-600 KLA-TENCOR |
| FEI NOVA NANO SEM 450 |
| LAKE SHORE HALL MEASUREMENT SYSTEM |
| NANOMAGNETICS ezAFM |
| PARK AFM |
Tencor Mgage-300
Tencor Mgage-200
Tencor Sonogage 200
KLA Tencor P-7
KLA Tencor P6
ResMap 178
Sloan Dektak II
Microscope AFX-II
Gaertner L117
Electroglas EG 4090u+
Electroglas EG 4090X
Electroglas EG 2001
Electroglas EG 1034
Cascade PS-21
HITACHI S-4700
F.E.I.Quanta 200
HEWLETT PACKARD,Agilent HP 4062UX
SS3856-20240524
