Description
The following Semiconductor Equipment are only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
| 1 | N&K Technology, inc. | N&K ANALYZER 1700RT | Wafer Analyzer |
| 2 | Nanometrics | NANO 215S | Film Thickness |
| 3 | Nanometrics | Caliper Elan | Metrology |
| 4 | Nanometrics | Caliper Q300 | Metrology |
| 5 | Nanometrics | Q200I | Metrology |
| 6 | nanometrics | M6100UV | Optical Interference Film Thickness Measuring Equipment |
| 7 | NCB Network | NF200 | Component |
| 8 | Negevtech | NT3100 | Metrology |
| 9 | NEW LONG SEUMITSU KOGYO |
LS-34TVA | Printer |
| 10 | NEWTECH | HNUV128-A | AUTO UV IRRADITIOR |
| 11 | NEXTEST | Maverick-II PT | Bitmap Tester |
| 12 | NEXTEST | Maverick-II PT | Bitmap Tester |
| 13 | NEXX | Tornado 300 | WET |
| 14 | Nicolet | ECO1000 | Metrology |
| 15 | Nikon | NSR-2005i8A | Stepper |
| 16 | Nikon | NSR-2005i8A | Stepper |
| 17 | Nikon | NSR-4425i | Stepper |
| 18 | Nikon | NWL641 | Auto Microscope |
| 19 | NIKON | VMR-C4540 | FOUP INSPECTION |
| 20 | NIKON | V-24B | PROFILE PROJECTOR |
| 21 | NIKON | NES1-h4 | Mini Stepper |
| 22 | NIKON | OST-3 | Equipment for Inspecting Wafer Appearances |
| 23 | NIKON | OST-3 | Equipment for Inspecting Wafer Appearances |
| 24 | NIKON | NWL200 | Wafer Loader |
| 25 | Nippon Scientific | PS102W | Etch |
| 26 | NIPPON THERMOENER |
EQS-100K | Once-Through Boiler |
| 27 | Nissin Ion Equipment |
EXCEED 2300AH | Medium current Ion Implantation |
| 28 | NORITAKE | MBK-950 | Mesh Belt Type Atmosphere Heating Furnace |
| 29 | Novellus | CONCEPT ONE-150 | PE-TEOS |
| 30 | Novellus | IPEC472 | CMP |
| 31 | Novellus | C3 Altus Chamber | CVD |
| 32 | Novellus | C3 Altus Chamber | CVD |
| 33 | Novellus | C3 Speed Max | CVD |
| 34 | Novellus | Inova | PVD |
| 35 | Novellus | Inova NExT | PVD |
| 36 | Novellus | Inova NExT | PVD |
| 37 | Novellus | Inova NExT | PVD |
| 38 | NOVELLUS | Inova XT | PVD |
| 39 | Novellus | Sabre | WET |
| 40 | Novellus | Sabre | WET |
| 41 | Novellus | Sabre 3D | WET |
| 42 | Novellus | Vector | CVD |
| 43 | Novellus | Vector Express | CVD |
| 44 | Novellus | Concept-1-200-W | Plasma CVD System |
| 45 | Novellus | Concept-1-200-W | Plasma CVD System |
| 46 | NSC | BA101 | IC Backside Preparation System |
| 47 | Nuaire | Fumeguard 156 | Component |
| 48 | Nuaire | Fumeguard 156 | Component |
| 49 | Ohkura Electric | Y5175PS624F0102 01 | Diffusion furnace (horizontal type) |
| 50 | OHMIYA IND | ISI1005 | UV iIrradiation Machine |
| 51 | Oki | APR-5000 | Rework |
| 52 | OKINS | PARAMETER ANALYZER | |
| 53 | OLYMPUS | AL110-LMB12-LP2/MX61L-F | MICROSCOPE&AUTO LOADER |
| 54 | OLYMPUS | AL100-L8/MX50A-F | MICROSCOPE&AUTO LOADER |
| 55 | OLYMPUS | SZ60TR-60 | LOW POWER SCOPE |
| 56 | Olympus | PMG3 | Metrology |
| 57 | olympus | Micro-hole Automatic Filing System |
Micro-hole Automatic Filing System |
| 58 | Olympus | AL110-12-LP | Auto Loader |
| 59 | Olympus | AL110-LMB12/MX50LR | Auto Loader /Microscope |
| 60 | Oryx | EX11000S M65X | Component |
| 61 | Oryx | EX11000S M65X | Component |
| 62 | OSUNG | OS_OVN11CL01W | OVEN |
| 63 | OSUNG | OS_OVN11CL01W | OVEN |
| 64 | OSUNG | OST-TST06-D03 | |
| 65 | Otsuka Electronics | FE-12 | Permeation Rate/Transmission Measuring Instrument (Spectrophotometer) |
| 66 | Packaging Systems | Entry Conveyor | Component |
| 67 | Pan Abrasives | KS9090WB/SS4 | WET |
| 68 | PANASONIC | FCB3 | Flip Chip Bonder |
| 69 | panasonic | E725SC | Dry Etching Equipment |
| 70 | Panasonic | NM-SB50A | Bonder |
| 71 | Perkin Elmer | AANALYST 600 | ATE ETC |
| 72 | Philps | X-PERT | X-RAY DIFFRACTOMETER |
| 73 | Phoenix | micromex 160 | Metrology |
| 74 | Phoenix | Micromex SE 160T | Metrology |
| 75 | PHOENIX X-RAY | NANOMX160 | X-RAY SYSTEM |
| 76 | Phoseon Tech | MX1001 | AOI（IR） |
| 77 | Phoseon Tech | MX1000 | AOI（IR） |
| 78 | Pillar | UNIBLOCK CLASSIC 500 KVA UPS | Component |
| 79 | Plasmec | MPC-1000S | Plasma Cleaning Equipment |
| 80 | PMS | Lasair 110 | Metrology |
| 81 | PMS | Surfex200 | Component |
| 82 | Polycom | ISX309 | Component |
| 83 | Polycom | Studio ISX321 | Component |
| 84 | Polycom | Various Parts | Component |
| 85 | PREMTEK INTERNATIONAL | 9920 | Prober |
| 86 | PSK | Tera 21 | Asher |
| 87 | PSS | AccuSizer APS 780 | Metrology |
| 88 | Qualitau | EM Module system | Component |
| 89 | Quantum | Unknown | Metrology |
| 90 | Quintel | Q7000 | SMT ETC |
| 91 | Raytex | RXW-1226SFI | Metrology |
| 92 | Revco | ULT 2140-5- D30 -40C | Component |
| 93 | ReVera Incorporated | RVX5000 | Metrology |
| 94 | Rigaku | SYS3620 | Metrology |
| 95 | Rigaku | SYS3620 | Metrology |
| 96 | Rigaku | TXRF3750 | Metrology |
| 97 | Rigaku | 3620 | X-ray Fluorescent Equipment |
| 98 | Rigaku | Rigaku CIROS CCD | ICP- Emission Spectrophotometer |
| 99 | Rigaku | 3272 | Metrology |
| 100 | RION | KS-40AF | Metrology |
| 101 | RORZE | B2-BL-R | Metrology |
| 102 | RORZE | B4 | Component |
| 103 | RORZE | B4 | Component |
| 104 | RORZE | RSR160 | Metrology |
| 105 | RORZE | RV201-F05-202CE-1 | Component |
| 106 | RORZE | RV201-F05-202CE-1 | Component |
| 107 | Royal Sovereign | RSL-2702 | PKG ETC |
| 108 | Rudolph | Probe Card Interface | Component |
| 109 | Rudolph | S300 | Metrology |
| 110 | Rudolph | S300 | Metrology |
| 111 | Rudolph | S3000S | Metrology |
| 112 | Rudolph | S3000sx | Metrology |
| 113 | Rudolph | WV320 | MACRO INSPECTION |
| 114 | SAMCO | FA-1 | Dry Etching Equipment |
| 115 | SAMCO | RIE-10NR | Etching system |
| 116 | SAMCO | PD-3800LT | Plasma CVD System |
| 117 | Sancha Electric Manufacturing |
WBTA03-W12 | Manual three-tank shower Washing equipment |
| 118 | sanei riken | SM-2110 | Small Sputtering Equipment |
| 119 | SAN-EI TECH | Desktop Type Liquid Application Robot |
Desktop Type Liquid Application Robot |
| 120 | Sanmei Electronics |
DC110 | Spray Coater |
| 121 | SANYU ELECTRON |
SC-701HMCⅡ | Desktop Sputtering Equipment |
| 122 | SATO | SG412R | Barcode Printer |
| 123 | Scientek | Stacis 2100 | Component |
| 124 | SCP | Semi Auto | WET |
| 125 | SCP | TCAS 181-7-72-E-36 | Furnace |
| 126 | SCREEN | RF3 | |
| 127 | SCREEN | DT-3000 | Track |
| 128 | SCREEN | FC-3000 | WET |
| 129 | SCREEN | RF-300A | Track |
| 130 | SCREEN | SK-W80B-B | Track |
| 131 | SCREEN | Sokudo Duo | Track |
| 132 | SCREEN | SU-3100 | WET |
| 133 | SCREEN | SU-3200 | WET |
| 134 | SCREEN | SU-3200 | WET |
| 135 | SCREEN | SSW80A | Surface Scrubber |
| 136 | SDI Diagnostics Inc | SPVCMS4000 | Metrology |
| 137 | Seiko Instrument Inc. | XV 300DB | Metrology |
| 138 | Seiko Instruments |
SEA-1000A | X-ray Fluorescent Equipment |
| 139 | seiwa kagaku | PA-150MAD | Wafer Exposure Equipment |
| 140 | seiwa kagaku | AD-1200 | Spin Developer |
| 141 | seiwa kagaku | AD-1200 | Spin Developer |
| 142 | SEIWA KOGYO | Mixing Equipment （小） |
Mixing Equipment |
| 143 | SEIWA KOGYO | Mixing Equipment （大） |
Mixing Equipment |
| 144 | SEIWA KOGYO | Mixing Equipment （大） |
Mixing Equipment |
| 145 | SEMES | EKPS-01 | EMC |
| 146 | SEMES | PVC-211 | CLEAN OVEN |
| 147 | SEMICS | OPUS II | |
| 148 | SEMICS | OPUS II | |
| 149 | Semilab | IR3100s | Metrology |
| 150 | Semilab | PS-2000 | Metrology |
| 151 | semilab | GES5e | Spectroscopic Ellipsometer |
| 152 | SemiProbe | PS4L FA-12 | Prober |
| 153 | Semitool | EXCALIBUR2000 | HF FUME |
| 154 | Semitool | ACMSOXT-AGS-E | Component |
| 155 | Semitool | R310 FMC2 | WET |
| 156 | Semitool | R310 FMC2 | Etch |
| 157 | Semitool | Raider ECD 310 | WET |
| 158 | Semitool | Raider ECD310 | WET |
| 159 | Semitool | Raider SP | WET |
| 160 | Semitool | Spectrum 300 | WET |
| 161 | Semitool | SRD-470S | Spin Dry Equipment |
| 162 | Semitool | PSC-101 | Spin Dry Equipment |
| 163 | Semitool | SRD840S-1-1-E-ML | Spin Dry Equipment |
| 164 | SEMIX | TR6133UD | SOG |
| 165 | SEN LIGHTS | Infrared Heating System |
Infrared Heating System |
| 166 | SENJU METAL INDUSTRY |
SNR-615 | Eco-reflow Furnace |
| 167 | Shibasoku | S230 | Tester |
| 168 | Shibaura | CDE-80 | Etch |
| 169 | Shibaura | ICE/CDE300 | Etch |
| 170 | Shibaura | Allegro CDE-300 | Etch |
| 171 | Shin Ohtsuka | SK-07-6328-2 | Ultrasonic Cleaning Equipment |
| 172 | ShinEtsu | Mask BLANKS | Component |
| 173 | SHINKAWA | UTC-1000super | WIRE BONDER |
| 174 | Shinkawa | ACB3000(Led) | Led Wire Bonder |
| 175 | Shinkawa | SFB-200 | Flip Chip Bonder |
| 176 | Shinkawa | SBB410 | Bonder |
| 177 | Shinkawa | UTC-2000 | Bonder |
| 178 | SHOWA SHINKU | SKF-1300 | Evaporation System |
| 179 | SHOWA SHINKU | SEC-10D | Vapor Deposition System |
| 180 | SHOWA SHINKU | SGC-12SAC | Optical Evaporation System |
| 181 | SHOWA SHINKU | SGC-26WA | Evaporation System |
| 182 | SHOWA SHINKU | SGC-26WA | Evaporation System |
| 183 | SHOWA SHINKU | SPH-2500-RF | Interback Type Sputtering Equipment |
| 184 | SHOWA SHINKU | SPH-2610 | Load lock Type Sputtering Equipment |
| 185 | SHUWA | SGM-6301 | Horizontal Surface Grinding Machine |
| 186 | Siemens Technology | 3 DEMESION MEA | FAB-METROLOGY |
| 187 | SOLVISION | PRECIS 3D | Metrology |
| 188 | SOLVISION | PRECIS 3D | Metrology |
| 189 | Sonicar | TS-12047HC | Component |
| 190 | Sonicor Instruments | TS-2404/402424H | Component |
| 191 | SONIX | QUANTUM-350 | SAT |
| 192 | SOPRA | EP12 | Metrology |
| 193 | SPC ELECTRONICS |
ACA-001A-113A | M-Jet Scrubber |
| 194 | SPP | MUC-21-098 | Dry Etching Equipment |
| 195 | Steag | ElectroDep 2000 | Etch |
| 196 | Steag-Mattson | TiW Etch Tool | Component |
| 197 | STI | TR-48II | Tape & Reel |
| 198 | STI | TR-48II | Tape & Reel |
| 199 | Strasbaugh | nTrepid 6EH | CMP / Polishing |
| 200 | SUSS | MA6 | Mask Aligner |
| 201 | SUSS | MA6 | Mask Aligner |
| 202 | SUSS | MA150 CC | Mask Aligner |
| 203 | SUSS MICROTEC | MA6/BA6 | Double-sided mask aligner |
| 204 | SUSSMicroTec | HVMMFT | Component |
| 205 | SUSSMicroTec | HVMMFT | Component |
| 206 | SUSSMicroTec | XBC300 | PKG ETC |
| 207 | SVG | SVG5200 | Furnace |
| 208 | TAKADA CORPORATION |
TWPS-064-TJ | Single wafer Washing equipment |
| 209 | takano | Mp siries | Chip Counter |
| 210 | Takatori | DAM-812M | Tape Mounter |
| 211 | Takatori | ATM-1100EF | Fully Automatic DFR Lamination Machine |
| 212 | TAKUDA | TYLAN TAKUDA | Oxide Etch |
| 213 | TAKUDA | TYLAN TAKUDA | Oxide Etch |
| 214 | Technos | Trex 610 | Reflection X-Ray Fluorescence Spectrometer |
| 215 | tecno wave | 1148-010_911 Model (1) |
Powder Deposition Equipment |
| 216 | Tegal | Tegal 903 | Oxide Etch |
| 217 | Tegal | Tegal 903e | Oxide Etch |
| 218 | Tektronix | TDS7404 | General-Tester |
| 219 | TEL | Mark V | Track |
| 220 | TEL | Alpha 8S | Vertical LP-CVD |
| 221 | TEL | Mark Vz | Track |
| 222 | TEL | Mark V | Track |
| 223 | TEL | Alpha 8S | Vertical Furnace |
| 224 | TEL | Alpha 8S | Vertical Furnace |
| 225 | TEL | INDY | Furnace |
| 226 | TEL | INDY | Furnace |
| 227 | TEL | P12XL | Wafer Prober |
| 228 | TEL | INDY+ | |
| 229 | TEL | Alpha 303i | Furnace |
| 230 | TEL | Certas LEAGA | Etch |
| 231 | TEL | Indy IRAD | Furnace |
| 232 | TEL | Indy Plus | Furnace |
| 233 | TEL | Indy Plus | Furnace |
| 234 | TEL | LITHIUS | Track |
| 235 | TEL | LITHIUS | Track |
| 236 | TEL | LITHIUS Pro V | Track |
| 237 | TEL | nFusion 700 | Component |
| 238 | TEL | nFusion 700 MP | Component |
| 239 | TEL | nFusion 700 MP | Component |
| 240 | TEL | Precio octo | Prober |
| 241 | TEL | RLSA-H Chambers | Component |
| 242 | TEL | Tactras | Etch |
| 243 | TEL | Tactras | Etch |
| 244 | TEL | Tactras Vigus ATCC | Etch |
| 245 | TEL | Tactras Vigus Chamber | Etch |
| 246 | TEL | Tactras Vigus Chamber | Etch |
| 247 | TEL | Tactras Vigus-0 | Etch |
| 248 | TEL | Telius SP 304 | Etch |
| 249 | TEL | Telius SP 304 SCCM | Etch |
| 250 | TEL | Telius SP 305 SCCM TE | Etch |
| 251 | Tel | Trias | CVD |
| 252 | TEL | TE8500ESC | Oxide Dry Etching Equipment |
| 253 | TEL | Unity 2e-855DD | Oxide Dry Etching Equipment |
| 254 | TEL | Unity_Ver2_845DD | Oxide Dry Etching Equipment |
| 255 | TEL | Unity 2e-844DD | Oxide Dry Etching Equipment |
| 256 | TEL | MK-5 | TEL coating/developing Machine |
| 257 | TEL | Clean Track ACT-12 | Coater, Developers |
| 258 | TEL | Clean Track ACT-12 | Coater, Developers |
| 259 | TEL | P-12XL | Full Auto-Prober |
| 260 | TEL | P-12XL | Full Auto-Prober |
| 261 | TEL | D204 | CHILLER |
| 262 | TEL | D250 | CHILLER |
| 263 | TEMPRONIC | TPO4200A-3C31-4 | Temperature Source |
| 264 | Temptronic | TP04000A-2B21-2 | ATE ETC |
| 265 | TEMPTRONICS | TPO4300A | Temp Forcing System |
| 266 | TEMPTRONICS | TPO4300A | Temp Forcing System |
| 267 | Teradyne | UltraFlex | Tester |
| 268 | TESTER SANGYO | SA-303 | Desktop Type Test Press |
| 269 | Thermo Fisher Scientific | FD 400 | Component |
| 270 | Thermo Fisher Scientific | FED720 | Component |
| 271 | THERMOTRON | SM-1.0 | |
| 272 | TOEI Science | Opposed-Target Sputter Equipment |
Opposed-Target Sputter Equipment |
| 273 | TOHO KASEI | Spin Dryer | Spin Dry Equipment |
| 274 | TOHO KASEI | WETStation | WETStation |
| 275 | TOHO KASEI | WETStation | WETStation |
| 276 | Toho technology | H840A | Spin Dry Equipment |
| 277 | Toho technology | H840A | Spin Dry Equipment |
| 278 | Toho technology | P-40H | Surface Profiler |
| 279 | Toho technology | Acid Washing Draft | Acid Washing Draft |
| 280 | Toho technology | IZ0 | Acid Wet Station |
| 281 | Toho technology | 180RN | Lincer Dryer |
| 282 | TOKUDA | CFS-04ES | Sputtering Equipment |
| 283 | Tokyo Motoyama Syokai |
MSKTF100200ES | Horizontal Diffusion Furnace |
| 284 | tokyo ohaka kogyo |
TVC-8011 | Vacuum UV hardening Equipment |
| 285 | tokyo ohaka kogyo |
TVC-8011 | Vacuum UV hardening Equipment |
| 286 | tokyo ohaka kogyo |
TVC-8022 | Vacuum UV hardening Equipment |
| 287 | tokyo seimitsu | E-ST-VS21A-1 | Surface Roughness Measuring Equipment |
| 288 | TOMOE SHOKAI | MAK-025 | Abatement device |
| 289 | TOPCON | VI-4302 | Visual inspecting Equipment |
| 290 | Toray | HS-830 | Metrology |
| 291 | TORAY ENGINEERING |
SP-500BW | Surface Roughness Measuring Equipment |
| 292 | TORAY ENGINEERING |
SP-500BW300 | Surface Roughness Measuring Equipment |
| 293 | TOYO Corporation | SE-4000 | Roughness Measurement |
| 294 | TOYO SYSTEM | TOSCAT-3100 | Charge/Discharge Evaluation Equipment |
| 295 | True Refrigerator | S-72-SCI-HC | Component |
| 296 | True Refrigerator | TS-72-SCI-HC | Component |
| 297 | TSK | UF300A | Wafer Prober |
| 298 | ULVAC | ei-7L | Vapor Deposition System |
| 299 | ULVAC | EX-400-C08 | Vapor Deposition System |
| 300 | ULVAC | EX-550-C10 | Vapor Deposition System |
| 301 | ULVAC | MiniLab | Vapor Deposition System |
| 302 | ULVAC | MCS-3000S | Vapor Deposition System |
| 303 | ULVAC | EX-400 | Vapor Deposition System |
| 304 | ULVAC | EBX-8C | Vapor Deposition System |
| 305 | ULVAC | EBX-1000 | Vapor Deposition System |
| 306 | ULVAC | SATELLA | Organic Evaporation System |
| 307 | ULVAC | EBX-1000 | Vapor Deposition System |
| 308 | ULVAC | EBX-1000 | Vapor Deposition System |
| 309 | ULVAC | MiniLab | Vapor Deposition System |
| 310 | ULVAC | EX-1300-C20 | Vapor Deposition System |
| 311 | ULVAC | EX-550-T10 | Vapor Deposition System |
| 312 | ULVAC | MBE-BC2400 | MBE Equipment |
| 313 | ULVAC | Laser-heated gas-in- gas evaporator |
Laser-heated gas-in-gas Evaporator |
| 314 | ULVAC | EX-650 | Evaporation System |
| 315 | ULVAC | UEP-6000 | Evaporation System |
| 316 | ULVAC | Heat Treatment System |
Heat Treatment System |
| 317 | ULVAC | EBX-10C | Evaporation System |
| 318 | ULVAC | EBX-10C | Evaporation System |
| 319 | ULVAC | EBX-2000C | Vapor Deposition System |
| 320 | ULVAC | EBX-1000 | Vapor Deposition System |
| 321 | ULVAC | BCS-2000 | Thin Film Evaporator |
| 322 | ULVAC | VEP-1000 | Evaporation System |
| 323 | ULVAC | EBX-6D | Evaporation System |
| 324 | ULVAC | ei-Opt | Evaporation System |
| 325 | ULVAC | ei-Opt | Evaporation System |
| 326 | ULVAC | ei-7L | Vapor Deposition System |
| 327 | ULVAC | CERAUS Z-1000 | Multi chamber Type Sputtering Equipment |
| 328 | ULVAC | IBS-6000 | Load lock Type Sputtering Equipment |
| 329 | ULVAC | SH-450-C10 | Batch Type Sputtering Equipment |
| 330 | ULVAC | MLX-3000N | Multi chamber Type Sputtering Equipment |
| 331 | ULVAC | CS-200 | Sputtering Equipment |
| 332 | ULVAC | MLX-3000N | Multi chamber Type Sputtering Equipment |
| 333 | ULVAC | CERAUS Z-1000 | Multi chamber Type Sputtering Equipment |
| 334 | ULVAC | SH-450-C12 | Sputtering Equipment |
| 335 | ULVAC | ULDiS-200UCP | Carousel Type Sputtering Equipment |
| 336 | ULVAC | SPW-030 | Roll Coater Sputtering |
| 337 | ULVAC | CERAUS Zi-1000N | Multi chamber Type Sputtering Equipment |
| 338 | ULVAC | SH-450 | Batch Type Sputtering Equipment |
| 339 | ULVAC | MUE-ECO | Sputtering Equipment |
| 340 | ULVAC | CERAUS ZX-1000 | Multi chamber Type Sputtering Equipment |
| 341 | ULVAC | SH-100B | Batch Type Sputtering Equipment |
| 342 | ULVAC | BC6643 | Sputtering Equipment |
| 343 | ULVAC | ULDiS-903CHL | Carousel Type Sputtering Equipment |
| 344 | ULVAC | SX-400 | Batch Type Sputtering Equipment |
| 345 | ULVAC | ENTRON-EX W200S | Multi chamber Type Sputtering Equipment |
| 346 | ULVAC | SH-700L-C16 | Batch Type Sputtering Equipment |
| 347 | ULVAC | SH-450 Type | Batch Type Sputtering Equipment |
| 348 | ULVAC | SIH-3040 | Interback Type Sputtering Equipment |
| 349 | ULVAC | SMD-450 | Sputtering Equipment |
| 350 | ULVAC | SH-350H | Batch Type Sputtering Equipment |
| 351 | ULVAC | SPZ-1000 | Multi chamber Type Sputtering Equipment |
| 352 | ULVAC | Utech-4543 | Sputtering Equipment |
| 353 | ULVAC | CERAUS Z-1000 | Multi chamber Type Sputtering Equipment |
| 354 | ULVAC | SME-200J | Sputtering Equipment |
| 355 | ULVAC | SME-200J | Sputtering Equipment |
| 356 | ULVAC | SME-200J | Sputtering Equipment |
| 357 | ULVAC | SIV-200S | Sputtering Equipment |
| 358 | ULVAC | SIV-200S | Sputtering Equipment |
| 359 | ULVAC | SRH-420MC | Sputtering Equipment |
| 360 | ULVAC | SV-4540 | Carousel Type Sputtering Equipment |
| 361 | ULVAC | MPS-4000-L4 | Sputtering Equipment |
| 362 | ULVAC | MLX-3000N | Multi chamber Type Sputtering Equipment |
| 363 | ULVAC | MPS-4000-C4 | Ultra High Vacuum Sputtering Equipment |
| 364 | ULVAC | MPS-6000-C4S1 | Sputtering Equipment |
| 365 | ULVAC | SIH-450 | Sputtering Equipment |
| 366 | ULVAC | SH-450H-C10 | Sputtering Equipment |
| 367 | ULVAC | ENTRON-EX W300 | Sputtering Equipment |
| 368 | ULVAC | MPS-6000-C1S300 | Sputtering Equipment |
| 369 | ULVAC | SMD-1800X | Sputtering Equipment |
| 370 | ULVAC | Magest S200 | Sputtering Equipment |
| 371 | ULVAC | SCH-135A | Sputtering Equipment |
| 372 | ULVAC | SCH-135T | Sputtering Equipment |
| 373 | ULVAC | SRH-530 | Sputtering Equipment |
| 374 | ULVAC | STD-1500VR | Sputtering Equipment |
| 375 | ULVAC | SPW-165C2 | Sputtering Equipment |
| 376 | ULVAC | SDH-4550L | Sputtering Equipment |
| 377 | ULVAC | CS-500 | Sputtering Equipment |
| 378 | ULVAC | ULDiS-900CH | Sputtering Equipment |
| 379 | ULVAC | SIV-3545 | Sputtering Equipment |
| 380 | ULVAC | ENTRON W300T | Multi chamber Type Sputtering Equipment |
| 381 | ULVAC | ENTRON N300 | Multi chamber Type Sputtering Equipment |
| 382 | ULVAC | ENTRON-EX2 W300 | Multi chamber Type Sputtering Equipment |
| 383 | ULVAC | ENTRON N300 | Multi chamber Type Sputtering Equipment |
| 384 | ULVAC | ENTRON-EX2 W300 | Multi chamber Type Sputtering Equipment |
| 385 | ULVAC | NE-5000N | Dry Etching Equipment |
| 386 | ULVAC | NE-550C | Dry Etching Equipment |
| 387 | ULVAC | NE-950EX | Dry Etching Equipment |
| 388 | ULVAC | NE-950EX | Dry Etching Equipment |
| 389 | ULVAC | NE-950EX | Dry Etching Equipment |
| 390 | ULVAC | NE-550C | Dry Etching Equipment |
| 391 | ULVAC | NE-950EXK | Dry Etching Equipment |
| 392 | ULVAC | NE-5700 | Dry Etching Equipment |
| 393 | ULVAC | CME-200 | Plasma CVD System |
| 394 | ULVAC | UNA-2000 | Ashing System |
| 395 | ULVAC | NA-8000 | Ashing System |
| 396 | ULVAC | ENTRON-EX2 W300 （Plasma doping） |
Plasma Doping Eequipment |
| 397 | ULVAC | DFM-09A-S | Vacuum Freeze Drying System |
| 398 | ULVAC | DF-020H | Vacuum Freeze Drying System |
| 399 | ULVAC | DFM-09A-S Type | Vacuum Freeze Drying System |
| 400 | ULVAC | Ta wire continuous heat treatment furnace |
Ta wire continuous heat treatment furnace |
| 401 | ULVAC | FHH-45GH | Thermal treatment equipment (RT P、D IFF、LP) [ULVAC] |
| 402 | ULVAC | Catalytic Ray Evaluator Test Bench |
Catalytic Ray Evaluator Test Bench |
| 403 | ULVAC | ECR Ion Source | ECR Ion Source Prototype |
| 404 | ULVAC | QCM2008-PRKIT | AFFINIX QN Pro |
| 405 | ULVAC | UNECS-FP-1850 | Spectral Ellipsometer for Large Substrates |
| 406 | ULVAC | Dektak 6M | Surface Profiler |
| 407 | ULVAC | RHL-P1210CP | Gold Image Furnace |
| 408 | ULVAC | FHT-75S | Resistance Heating Type Vacuum Heat Treatment |
| 409 | UNI-HITE | XVA160 | X-ray 3D-CT System |
| 410 | Universal Plastics | Solvent Bench | Component |
| 411 | Unknown | Parts Clean Box – Exhausted | Component |
| 412 | unknown | Vacuum Anodic Bonding Equipment |
Vacuum Anodic Bonding Equipment |
| 413 | unknown | Spin Dryer | Spin Dry Equipment |
| 414 | unknown | H-180RN | Spin Dry Equipment |
| 415 | unknown | φ100-2 | φ100-2 Stage Rolling Mill |
| 416 | unknown | Remote Plasma System |
Remote Plasma System |
| 417 | unknown | ITO autoprober | ITO autoprober |
| 418 | ushio | UMA-1002-HC93SMV （Casette to Casｓ ette） |
UV Curing |
| 419 | Varian | 3290STQ | Sputter |
| 420 | Varian | 3290STQ | Sputter |
| 421 | Veeco | Dimension X1D | Metrology |
| 422 | Veeco | Dimension X3D | Metrology |
| 423 | Veeco | Dimension X3D | Metrology |
| 424 | Veeco | DUVx210 | Metrology |
| 425 | Veeco | V220SI | Metrology |
| 426 | Verigy | V3300 | Tester |
| 427 | VLSI Standard | PDS-100 | Metrology |
| 428 | VWR Scientific | 1601 | Component |
| 429 | VWR Scientific | 1601 | Component |
| 430 | VWR Scientific | 1610 | Component |
| 431 | VWR Scientific | 1601 | Component |
| 432 | VWR Scientific | 1601 | Component |
| 433 | VWR Scientific | 61161-326 | Component |
| 434 | WACOM | WXZ-90S- L2,AM1.5GMM |
Super Solar Simulator |
| 435 | Waters | 2695 | Component |
| 436 | Wilt Industries | 4106 | Component |
| 437 | Wonik-IPS | AKRA | Metal |
| 438 | Yokogawa | TS670 | Tester |
| 439 | Yokogawa | ST6730 | Tester |
| 440 | Yokogawa | ST6730A | Tester |
| 441 | Yokogawa | AL6095 | Tester |
| 442 | Yokogawa | TS1000 | Tester |
| 443 | ZEISS | AX10 lmgaerA1/M1 | Confocal Microscope Systems |
| 444 | Zephyr | Wind Power Generation Equipment |
Wind Power Generation Equipment |
| 445 | Zephyr | Wind Power Generation Equipment |
Wind Power Generation Equipment |
| 446 | 东丽工程 | Inpectra PL | Luminescence Defect Inspection System |
| 447 | DFL7160 | WBL LASER SAW(DAF SAW) | |
| 448 | HP83000 | TESTER | |
| 449 | CO2 BUBBLER | ||
| 450 | STM6-LM | HIGH POWER SCOPE | |
| 451 | FH-1 Type | Crushing Line Equipment | |
| 452 | FH-1 Type | Crushing Line Equipment | |
| 453 | Stirrer 150 | Stirrer | |
| 454 | Stirrer 150 | Stirrer | |
| 455 | Indium Oxide Powder Recovery Facility |
Indium Oxide Powder Recovery Facility |
ID-SS9145-3-1
