Description
Refurbished Oxford Plasmalab 80 Plus RIE Reactive Ion Etch System
SemiStar Corp. offers one refurbished Oxford Plasmalab 80 Plus RIE Reactive Ion Etch System located at our Morgan Hill, California, USA facility. This system is available in refurbished condition with OEM specifications, subject to final inspection, configuration confirmation, and prior sale.
The Oxford Plasmalab 80 Plus is a compact open-load RIE plasma etching system designed for research, prototyping, university cleanrooms, MEMS, semiconductor R&D, compound semiconductor, and advanced materials processing. OEM and university reference information indicate Plasmalab 80 Plus platforms are commonly configured for up to 200 mm / 8 inch wafer capability, with 13.56 MHz RF plasma processing and turbo-pumped RIE operation.
Product photos are for reference only. Actual system configuration, accessories, cosmetic condition, utilities, installed options, and software configuration should be confirmed by SemiStar’s final quotation and inspection report.
Availability
| Equipment Model | Oxford Plasmalab 80 Plus RIE |
| Equipment Type | Reactive Ion Etch Plasma Etching System |
| Category | RIE / Plasma Etcher / Dry Etch System |
| Manufacturer / OEM | Oxford Instruments / Oxford Plasma Technology |
| Condition | Refurbished, used good condition |
| Chuck / Susceptor | Customer listed 11 inch chuck; reference systems commonly list 8 inch / 200 mm wafer capability or 10 inch susceptor. Final chuck size should be confirmed during inspection. |
| Wafer Capability | Up to 200 mm / 8 inch wafer capability, depending on installed hardware |
| Quantity | 1 set |
| Location | Morgan Hill, California, USA |
| Lead Time | Estimated 6–10 weeks depending on PO timing and final PO conditions |
| Warranty | 6 months after shipment, subject to final quotation terms |
| Installation / Training | Available if necessary; scope and cost to be confirmed |
| Price | Contact SemiStar by filling out the inquiry form below |
| Validity | Subject to prior sale without notice |
System Description
The Oxford Plasmalab 80 Plus RIE is an open-load reactive ion etching system designed for flexible plasma etching process development. The platform is commonly used for dielectric etching, silicon-based etching, photoresist descum, surface treatment, MEMS processing, compound semiconductor research, and advanced materials dry etch applications.
Reference information from Oxford and university cleanroom installations describes the Plasmalab 80 / 80 Plus platform as a compact RIE system with fast open loading, good etch control, wafer temperature control, and up to 200 mm wafer capability.
Current Configuration
- Oxford Plasmalab 80 Plus RIE system
- Open-load single chamber RIE configuration
- Customer listed gases: CF4, Ar, and N2
- Customer listed chuck: 11 inch; final chuck size to be verified
- RIE plasma etching capability
- Compact cleanroom footprint
- Research and pilot production capability
Installed Gas Configuration
| Gas | MFC Range |
|---|---|
| CF4 | 100 SCCM |
| Ar | 100 SCCM |
| N2 | 100 SCCM |
Other Plasmalab 80 Plus reference configurations may include gases such as O2, CHF3, SF6, He, BCl3, or Cl2, depending on the original configuration. The actual installed gas lines and MFC ranges on this specific system should be confirmed during final inspection.
RF Power and Process Information
- Typical RIE RF frequency: 13.56 MHz
- Reference configurations commonly list 300 W RF or 30/300 W RF generator options
- Parallel plate RIE plasma processing architecture
- Turbo-pumped vacuum configuration commonly used on Plasmalab 80 Plus systems
- Final RF generator, matching network, and pump configuration should be confirmed during inspection
Typical Applications
- Reactive ion etching (RIE)
- Dielectric etching
- SiO2 etching
- SiNx etching
- Silicon and polysilicon plasma etching
- Photoresist descum
- Plasma surface treatment
- MEMS process development
- Compound semiconductor research
- University and R&D cleanroom dry etch applications
Wafer / Chuck Capability
- Customer listed chuck size: 11 inch
- Reference Plasmalab 80 Plus systems commonly support up to 200 mm / 8 inch wafers
- Some reference systems list 10 inch diameter susceptor / platen configurations
- Final chuck diameter, wafer carrier, and substrate handling capability should be confirmed before quotation
Facility Requirements
- Electrical power requirements to be confirmed during final configuration review
- Process gas cabinets and gas delivery systems required
- Vacuum pump and exhaust requirements to be reviewed
- Cooling water/chiller requirements to be confirmed
- Facility exhaust and scrubber compatibility required
- Customer responsible for utilities, facility preparation, gas safety systems, exhaust, abatement, and local code compliance unless specifically included in quotation
Refurbishment and Support
SemiStar can provide the equipment in refurbished condition with OEM specifications. Refurbishment scope, functional testing, installation, training, utilities integration, and warranty scope will be confirmed based on the final purchase order and customer requirements.
The standard offering includes a 6-month warranty after shipment unless otherwise stated in the official quotation. Installation and training can be quoted separately if required.
RFQ Information Requested
To help us recommend the best final configuration and support scope, please provide:
- Substrate size and material
- Target etch material and process application
- Required process gases and chemistry
- Required etch profile, rate, and selectivity targets
- Expected process pressure and RF power range if known
- Need for installation, startup, or training support
- Facility readiness and utility information
- Expected purchase timeline and budget range
Important Notes
- Subject to prior sale without notice.
- Final specifications subject to SemiStar official quotation and inspection confirmation.
- All OEM names, trademarks, and model names belong to their respective owners.
- SemiStar is not the OEM. Product information is provided for reference only and should not be used as final purchase specifications.
- Final purchase specifications, refurbishment scope, warranty terms, installation scope, and commercial terms must follow SemiStar’s official quotation.
Contact SemiStar
SS380-MSP-125