Description
Plasmatherm Versaline LACVD Etch System
Plasmatherm Versaline LACVD Etch System 6″ – See link below (A# 69481)
– 2x loadlock Ports
– 2x Process Chambers
– DMC / OCR Reader
– Gases and maximum flows in positions 1 to 8 respectively are:
– CF4 (84 sccm)
– O2 (1000 sccm)
– He (50sccm)
– Ar (50 sccm)
– O2 (50 sccm)
– CHF3 (100 sccm)
– N2 (200 sccm)
– H2 (100 sccm)
– Operating system : Windows 7 Professional SP1 OS
– Tool software: Plasma-Therm Cortex
– OES Software: Plasma-Therm EndpointWorks
– ICP source 2 MHz up to 2000 W with temperature control
– Substrate temperature control via bipolar Johnsen-Rahbek electrostatic chuck
– With backside Helium cooling
CCP source 13.56 MHz up to 600 W
thermally managed chamber liner and pump train
– Optical emission spectroscopy
Single loadlock port:
– 2x Process Chambers: Yes, PM2 & PM3
– DMC / OCR Reader configured for DMC
Gas Configuration”
PM2 Gas
– Gas1Name: “CF4″ Gas1Size=”84”
– Gas2Name: “O2a” Gas2Size=”1000″
– Gas3Name: “He” Gas3Size=”50″
– Gas4Name: “Ar” Gas4Size=”50″
– Gas5Name: “O2b” Gas5Size=”50″
– Gas6Name: “CHF3″
– Gas6Size=”100”
– Gas7Name: “N2″ Gas7Size=”200″
– Gas8Name:”H2″ Gas8Size=”100″
PM3 Gas
– Gas1Name:”CF4″ Gas1Size=”84″
– Gas2Name:”O2a” Gas2Size=”1000″
– Gas3Name:”He” Gas3Size=”50″
– Gas4Name:”Ar” Gas4Size=”50″
– Gas5Name:”O2b” Gas5Size=”50″
– Gas6Name:”CHF3″ Gas6Size=”100″
– Gas7Name:”N2″ Gas7Size=”200″
– Gas8Name:”H2″
– Gas8Size: “100”
– Tool also has an interface for Gas Abatement
Valid : It is only for end users and is subject to prior sale without notice. Appreciate your time!
SemiStar Corp. may provide certain information related to equipment offered for sale. Any and all such information is unverified and, therefore, supplied for information purposes only without guarantees or warranties of any kind. This picture is representative of the STS available.
SS5816-2024-2
