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Plasma etcher, March plasma, plasma treatment system

Plasma etcher, March plasma, plasma treatment system

Category: DC RF Power Matching

Description

Description

Plasma etcher, March plasma, plasma treatment system

• 20 to 300 watts. 20 watts for gentle processing—high power for more aggressive applications—the design of our tuning network allows for this

• Can set power in one watt increments—the RF generator and match network are tuned to accomplish this. Display to show the actual power going into the chamber as well

• Pressure output display—you have to know your chamber pressure to properly process samples or wafers. A Pirani Gauge is used

• Automatic Tuning—very fast and with extremely low reflected power—very well designed tuning network

• Solid state phase and magnitude detector

• Two adjustable flowmeters for two gases

• CE marked and certified

• Solid state electronics

• Diagnostic LED card

• Adjustable power in one watt increments

• Only one electronics control board in the system

• Proprietary RF matching network and RF generator (made by Glow Research)

• Quartz chamber with gas distribution tube on top of chamber for improved uniformity

• RF power applied metal electrode on top/outside of quartz chamber

• Ground bottom electrode located on bottom/outside of quartz chamber

SS292261820466

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