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Nanomaster SWC4000 mask cleaner

Nanomaster SWC4000 mask cleaner, Semiconductor Equipment

Categories: Asher, Stepper Aligner

Description

Description

Nanomaster SWC4000 single wafer- mask cleaner with megasonic spray for max 300mm wafers

APPLICATIONS:

• Patterned and Un-patterned Masks and Wafers

• Ge, GaAs and InP Wafer Cleaning

• Post CMP Wafer Cleaning

• Cleaning of Diced Chips on Wafer Frame

• Cleaning after Plasma Etch or Photoresist Stripping

• Mask Blanks or Contact Mask Cleaning

• Cleaning of X-ray and EUV Masks

• Optical Lens Cleaning • Cleaning of ITO Coated Display Panels

• Megasonic Assisted Lift-off Process FEATURES:

• maximum wafer size 12” OD, masks up to 7” x 7”

• Stand Alone Unit

• Venturi Powered Vacuum

• Damage Free Megasonic

• Independent Chemical Dispenses

• Spin Dry and Heated N2

• Microprocessor Controlled

• Chemical Dispense Unit

• Dual Drain for Acids and Solvents

• Suck Back Valves to Prevent Drips

• Safery Interlocks

• 28”x32” Footprint

OPTIONS:

• PVA Brush Cleaning (100 RPM)

• Post CMP Brush (up to 400 RPM)

• Nitogen Ionizer

• Bottom Side DIW and Dry

• CO2 Inject with DIW Resistivity Monitor

• In-Line Heaters for DIW or Chemical

• Fill Sensors for Chemical

• FM 4910 Materials

Please contact us if you are interested in the item. This item is only for end users and are subject to sale without notice. Appreciate your time.

SS7270

All used equipment /parts trademarks belongs to the original equipment manufacturer. All rights reserved.

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