Description
The items are subject to prior sale without notice. These items are only for end users.
LAM RAINBOW 4428XL, 200mm, POLY/NITRIDE ETCHER
Tool Status :WARM SHUTDOWN
Process: Nitride Etch/LAM Research Nitride Etcher
Software Version:Version E1.5
Vintage: 1996
Main chamber:
ESC 1 unit
Bias RF Match 1 unit
RF generator 1 unit
MFC 1 (Gas type / size sccm) CL2 / 500
MFC 2 HBR / 50
MFC 3 O2 / 15
MFC 4 CHF3 / 50
MFC 5 HE_500 / 500
MFC 6 SF6 / 200
MFC 7 HE_50/ 50
MFC 8 CF4 / 200
Transport:
Integrated SMIF 2 unit
Wafer notch aligner with spatula 1 unit
Harmonic arm drive assembly 2 unit
Hardware Parameters
Gap (type/size) MOVED / 15cm
Bot RF gen power (Watt) 0-1250
Chamber Temp (Wall) Deg. 60
Chamber Temp (Upper electrode) Deg. 40
Chamber Temp (Lower electrode) Deg. 40
Edge Helium cooling ( Pressure, Flow ) 0-50Torr / 0-50sccm
Turbo pump size (Liters/sec.) / Type STPH200C/EBARA
Rough Pump type Ebara
Non-Critical to Process
Wafer Chuck type / Coating Material ESC
Focus Ring Thickness (Initial) Focus Ring
MTBC 13000RF MINS
Setup Specification
PC Particles: Level / Size 0.1 / >0.16um
PC Etch Rate (A/min) 1037-1199 / 2750-3050
The items are subject to prior sale without notice. These items are only for end users.
SS4781-PNIT-07
