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Fab Semiconductor Equipment-Stepper

Semiconductor Equipment

Category: Stepper

Description

Description

Please contact us if you are interested in the following items. These items are only for end users and are subject to prior sale without notice. Appreciate your time.

1	ASML PAS 5500/300C KrF Stepper
2	Canon FPA-3000iW i-Line Stepper
3	Nikon NSR-4425i i-Line
4	Nikon NSR-2205EX14C KrF Stepper
5	Nikon NSR-2205i11D i-line stepper
6	Nikon NSR-2005i10C i line stepper
7	Nikon NSR-4425i i-line Stepper
8	Nikon NSR-SF130 Stepper
9	Canon FPA-3000i4 Photo
10	Canon FPA-3000iW i-Line Stepper
11	Canon FPA-5500iZa Stepper
12	Nikon NSR-SF120 i-Line stepper
13	Nikon NSR-2005i9C i line stepper
14	Nikon NSR-2005i9C i line stepper
15	ASML PAS 5500/100D i-Line
16	Karl SUSS MA200 Aligner2018-05-02
17	Karl SUSS MA200 Aligner2018-05-02
18	Karl SUSS MA200 Aligner2018-05-02
19	Karl SUSS MA150 Aligner2018-02-09
20	Nikon NSR-2205EX12B KrF Stepper2018-02-09
21	Nikon NSR-2205EX12B KrF Stepper2018-01-18
22	NIKON FX601F Stepper For sale2018-01-11
23	Wanted Ultratech 1500 Stepper2018-01-05
24	ASML PAS 5500/250C i-line Stepper2018-01-05
25	Nikon i8 Stepper2017-12-28
26	SUSS MA300PLUS Mask Exposure2017-12-06
27	Wanted Nikon i11D/i12 Stepper2017-12-01
28	Canon MPA6000 Stepper2017-11-30
29	Nikon i10C / i8 steppers2017-11-30
30	Wanted Nikon I12 Wafer Steppers2017-11-16
31	Nikon NES1-H04 Mini stepper
32	Karl SUSS MA150 Aligner
33	Exposure (USIO)
34	Ultratech 1500 Lithography
35	ASML PAS 2500/40 Lithography
36	ASML PAS 2500/40 Lithography
37	ASML PAS 2500/30 Lithography
38	Nikon NSR-2205EX14C KrF Stepper
39	Wanted Ultratech Sapphire 100E Stepper
40	Mask Aligner (KARLSUSS / MA-6)
41	Exposure (ORC)
42	Exposure USIO CE-600CH
43	UV Exposure SEM LIGHTS Model HCT2B28HEX-3 (4 sets)
44	Exposure Toray TE2538APY
45	Ultratech, Stepper, Unity-AP3000
46	Canon, Stepper, FPA-5500iZ+
47	Nikon NSR-2005i9C
48	Nikon NSR-2005i10D
49	Ultratech 1500 Lithography
50	Ultratech 1500 Lithography

ss380surplusclobal

All used equipment /parts trademarks belongs to the original equipment manufacturer. All rights reserved.

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AlN epitaxial layers,centrotherm c.OXIDATOR , high-temperature oxidation furnace , Rapid Thermal Processing system for silicon and compound semiconductors,c.RAPID 200,fully automatic loading system,centrotherm PECVD,c.PLASMA, c.DIFF,centrotherm highly versatile diffusion,wide band gap,c.CRYSCOO HTA,AP Systems,AP Systems Korea,KORONA RTP-12MP, KORONA RTP-12LPO , KORONA RTP-12LR/LPRR,Seebeck Coefficient / Electric Resistance Measurement System ZEM-3 series，Mini Lamp Annealer MILA-5050， Atmospheric Thermoelectric Module Evaluation System F-PEM，