Description
Cambridge Nanotech Model fiji F200
- Atomic layer deposition system with load lock
- Any substrate up to 200 mm wafer
- Plasma enhanced ALD available with O2, Ar, and N2 gases
- Thermal ALD with temperatures up to 300°C
- Turbo pump with APC
Please contact us if you are interested in the Cambridge Nanotech Model fiji F200. We do not own the items. These items are only for end user. They are subject to prior sales without notice. First come, first serviced. Appreciate your time.
