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ATC-UHV 2200

Main Refurbished Equipment

Category: Sold Items

Description

Description

ATC-UHV 2200 AJA International Sputtering Tool

Condition: Believe fully functional and complete before turnoff.

Location: CA,USA

Photos: Download

Info on the system from the owner.

Vintage: 2007
a UHV Sputtering system
Equipped with a 17″ x 22″ vacuum chamber
7 magnetron sputtering sources with in-situ tilt,
two AJA 750w DC power supplies,
two AJA RF power supplies (100w and 300w)
a Pinnacle Plus 5k pulsed DC supply.
The main chamber was pumped with a 1080 1/s Shimadzu wide range, magnetically levitated, compound turbopump, and roughed by an Edwards dry pump. There is a suite of 3 vacuum gauges controlled by a Granville Philips gauge controller. Processes are fed by 3 mass flow controllers for precise introduction of inert and reactive gases.
There is a load lock for substrate insertion/removal which is pumped with a separate turbo and roughing pump. The system also includes a 7 substrate cassette in the load-lock to boost throughput.

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