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AJA ORION 8

Main Refurbished Equipment

Category: Sold Items

Description

Description

Please contact us for the availability of the AJA ORION 8 REACTIVE RF SPUTTER DEPOSITION SYSTEM.

AJA ATC ORION 8 REACTIVE RF SPUTTER DEPOSITION SYSTEM

The AJA Orion Sputtering System is a load-locked sputtering system capable of depositing metal and dielectric films over a substrate up to 6 inches in diameter. It is equipped with seven AJA high vacuum magnetron sputtering sources that are powered by two RF generators (300W) and three DC generators (750W) for single or multi-layer deposition or co-sputtering. Computer control provides recipe generation and process data storage. The max substrate is 6” with rotation 0-40RPM, radiant heating to 850˚C, and RF/DC biasing with 100W RF generator for substrate pre cleaning. Process gasses listed below are also available for reactive sputter deposition.

The items are subject to prior sale without notice. These items are only for end users.

SSEB380

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Main Refurbished Equipment

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