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Oxford Plasmalab System 133

2004 Oxford Plasmalab System 133+ RIE FL Reactive Ion Etcher

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Description

2004 Oxford Plasmalab System 133+ RIE FL Reactive Ion Etcher

OXFORD Plasmalab 133 RIE (FL) For Sale

Model Year : 2004
Quantity :    1
Condition : Complete system
Serial No : 417729
Availability : Immediate

Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for SiO2 Etch
RF Generator:  Advanced Energy RFX 600A ;  600W, 13.56MHz,
Chamber Turbo pump: Alcatel ATH 400M  w/ ACT 600M controller
Blue color PLC type

Water cooled electrode 10C-80C

Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
N2     – 200sccm
CHF3 – 200sccm
NF3   – 200sccm
N2O  – 200sccm

Windows PC, user friendly interface

This tool was removed from production October 2014.

Ebara Roughing pumps were utilized by previous user (Not included, sold separately)

Lauda WK1200 Chiller was utilized by previous user (Not included, sold separately)

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