Description
2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher
Location: Nanjing, Jiangsu, China
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2004
Quantity : 1
Condition : Was refurbished with OEM specifications ,crated, 3 month warranty, installation .
Photos: Download
Serial No : 417728
Availability :Subject to prior sale without notice.
Lead time: 1-2 weeks after payment. The system was refurbished one month ago.
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
Mechanical chuck
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 8 lines including following 7 MFCs:
- Ar – 100sccm
- CL2 – 100sccm
- BCL3 – 100sccm
- N2O – 200sccm
- CHF3 – 200sccm
- NH3 -100sccm
- CH4 – 50sccm
Windows PC, user friendly interface GUI
This tool was removed from production October 2014.
ID-OEM-MODULE-1
