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Oxford Plasmalab 133+ RIE

2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1-1 Category: Tags: ,


2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher

Location: Nanjing, Jiangsu, China

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OXFORD Plasmalab 133 RIE (CL)
Model Year : 2004
Quantity :     1 + 1 +1 + 1
Condition : It was complete, working. We did not test it. We will sell it at (1) AS IS WHERE IS; (2) Complete, working, functional test with crating; (3) Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices.
Serial No : 417728
Availability : Immediate. Subject to prior sale without notice.


Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm

Windows PC, user friendly interface
This tool was removed from production October 2014.

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