Description
2004 Oxford Plasmalab 133+ RIE CL Reactive Ion Etcher
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2004
Quantity : 1
Condition : Complete system
Serial No : 417728
Availability : immediate
Configuration:
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm
Windows PC, user friendly interface
This tool was removed from production October 2014.
