Description
The PVA TEPLA ION 100/40Q WB Plasma Barrel Asher is only for end user. Please contact us if you have any questions. Subject to prior sale without notice. Appreciate your time!
Location: USA
Condition: Used
Quantity: 1 set available
Condition: Used. We can sell them at : (1) AS IS condition, (2) Complete, working, functional test condition.
Info from websites on the system for your reference only.
Quartz Barrel photoresist asher and plasma surface treatment system. The Photoresist Ashing IoN 100-40Q Plasma System is a barrel plasma reactor designed for high volume production applications. Customer is responsible for facility , pump and chiller if applicable.
Key Features include:
- Plug and play self installation
- Industrial computer with LCD touch panel and keyboard. Windows based operating system.
- Graphical User Interface (GUI) software complies with CFR Title 21 Part 11 and Semi E95-1101
- Multi-level of user access
Recipe and Software
- Recipe editor for fast and versatile step controls
- Onboard diagnostic features and alarm logging
- Remote process monitoring via Ethernet
Equipment specifications and Process Chamber
- Material: Quartz chamber
- Dimensions: about 12”X20”
- Volume: about 37 L
- Number of MFCs: 3
- Process Pressure: (0.16 to 2.66) mbar (120 to 2000) mTorr
- Base Pressure: 0.07 mbar (50 mTorr)
- Pumping Time: 1 min (Pump dependent)
- Wafer Sizes: Up to 200 mm (8”) Batch size (Boat)
- Wafer Loading: Manual
- Plasma Source Frequency/power: 13.56 MHz/600 W
- 230V, 1Ph, 50/60Hz, 10A, CE
ID-SS380EB-20221001
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