Description
New Semitool 480 Spin Rinse Dryer (SRD) for 8″ / 200mm Wafers
The new Semitool 480 is a brand new, freestanding Spin Rinse Dryer mounted on a mobile wheeled base for flexible deployment and space efficiency. Designed to rinse semiconductor substrates with DI water and dry them using hot nitrogen gas and centrifugal force, the Semitool 480 supports up to 200mm / 8″ wafers. The Semitool 480 is compatible with low-profile 8″ cassettes only. High-profile 8″ cassettes are not supported in this configuration.
Ideal for production environments or labs requiring standalone operation, the new Semitool 480 offers unmatched mobility and functionality with built-in storage potential below the unit.
Each new unit comes equipped with new controller, providing:
- N₂ Saver for reduced nitrogen consumption
- SECS/GEM compatibility
- Built-in troubleshooting and data logging
- Alerts for anti-static, heater, and resistivity issues
The trademarks of all equipment and parts referenced on this page are the property of their respective Original Equipment Manufacturers (OEMs). All photos are provided for reference purposes only and may not represent the actual equipment.
SS5882
