Description
Overview
Vertical furnace with small footprint for high-quality processing. Nano Therm’s vertical furnaces are compact and requires only a small installation area and can process wide range of wafer diameters.
Applications
- annealing
- thermal oxide
- LPCVD
- wet oxidation
- dry oxidation
Specifications
| Operational Temperature range | Up to 1300 c deg |
| Supported wafer sizes | 75mm to 200mm |
| Maximum lot size | 12 wafer boat standard (50 wafers optional ) |
| Gases used | N2, Ar & N2 ,(other gasses available upon request) |
| Applications | Annealing Thermal oxide LPCVD Wet oxidation Dry oxidation
SiC power devices |
| Element Section Dimensions | Configurable |
The Nanotherm Fabline can process 75mm – 200mm wafers up to 50 at a time. Carefully selected hardware and control system features enable continuous high temperature wafer processing. The Nanotherm Fabline vertical Furnace’s also has the option to be capable of 1300C operation. The Nanotherm’s Primary Heating and Controls are manufactured by a proprietary source that has been producing high temperature furnaces heating systems up to 1300 °C since 1982.
