Description
High purity Evaporation materials, Sputtering Targets,Sapphire single crystal substrate, Sapphire wafers
These are subject to prior sale. Appreciate your time.
| 1 | Al-Cu 99/1 wt% Alloy Sputtering Target |
| 2 | Aluminum doped Zinc Oxide-AZO- Sputtering Target |
| 3 | Aluminum Oxide, Al2O3 – Evaporation Material – 99.99% Purity- 3-6 mm size Granul |
| 4 | Aluminum Zinc Oxide, AZO – Evaporation Material – 99.99% purity – 3-6 mm Pieces |
| 5 | Aluminum Zinc Oxide, AZO – Evaporation Material – 99.99% purity – 3-6 mm Pieces |
| 6 | Aluminum, Al – Sputtering Target |
| 7 | Aluminum, Al Pellets – Evaporation Material -99.999% purity -3 x 3 mm |
| 8 | Aluminum, Al Prefabricated Slugs – Evaporation Material – 99.999% purity |
| 9 | Aluminum, Al Prefabricated Slugs – Evaporation Material – 99.999% purity |
| 10 | Barium Fluoride, single crystal substrates |
| 11 | Barium Titanate, BTO – Sputtering Target |
| 12 | Bismuth , Bi Pieces – Evaporation Material – 99.99% purity- 1-6mm pieces |
| 13 | Bismuth , Bi Pieces – Evaporation Material – 99.99% purity- 1-6mm pieces |
| 14 | Bismuth Selenide , Bi2Se3 – Sputtering Target |
| 15 | Bismuth Telluride, Bi2Te3 – Sputtering Target |
| 16 | Boron, B – Sputtering Target |
| 17 | Calcium Fluoride, CaF2 single crystal substrates |
| 18 | Calcium Manganate, CaMnO3 – Sputtering Target |
| 19 | Calcium Ruthenate, CaRuO3 – Sputtering Target |
| 20 | Calcium Titanate, CaTiO3 – Sputtering Target |
| 21 | Carbon, C – Sputtering Target |
| 22 | Cerium Oxide, CeO – Sputtering Target – 99.99% purity |
| 23 | Cerium, Ce – Sputtering Target – 99.99% purity |
| 24 | Chromium Oxide, Cr2O3 – Sputtering Target – 99.99% purity |
| 25 | Chromium, Cr – Evaporation Material – 99.95% purity-3-6 mm Pieces |
| 26 | Chromium, Cr – Sputtering Target |
| 27 | Chromium, Cr Prefabricated Slugs – Evaporation Material – 99.95% purity |
| 28 | Chromium, Cr Prefabricated Slugs – Evaporation Material – 99.95% purity |
| 29 | Chromium-Silicon, CrSi2 – Sputtering Target |
| 30 | CIGS – Sputtering Target – for solar cells |
| 31 | Cobalt, Co – Sputtering Target |
| 32 | Cobalt, Co Pellets – Evaporation Material – 99.95% purity 1-6mm size |
| 33 | Copper Oxide, Cu2O – Sputtering Target |
| 34 | Copper, Cu – Sputtering Target |
| 35 | Copper, Cu Pieces – Evaporation Material – 99.999% purity- 3 x 3 mm |
| 36 | Copper, Cu Pieces – Evaporation Material – 99.999% purity- 3 x 3 mm |
| 37 | CuGa – Sputtering Target – 99.99% purity |
| 38 | CZTS & CZTS-Se- Copper-Zinc-Tin-Sulfur-Selenium Sputtering Targets |
| 39 | Dysprosium Scandate, DyScO3- single crystal substrates |
| 40 | Evaporation Material- Aluminum prefabricated slugs 99.999% purity |
| 41 | Evaporation Material- Aluminum prefabricated slugs 99.999% purity |
| 42 | Ga2TeO3 – Sputtering Target – 99.99% purity |
| 43 | Gadolinium Scandate, GdScO3 single crystal substrates |
| 44 | Gadolinium, Gd – Sputtering Target – 99.99% purity |
| 45 | Gadolinium, Gd – Sputtering Target – 99.99% purity |
| 46 | Gadolinium, Gd – Sputtering Target – 99.99% purity |
| 47 | Garnet single crystal substrates |
| 48 | Ga-ZnO – Sputtering Target – 99.99% purity |
| 49 | Germanium , Ge Pieces – Evaporation Material – 99.999% purity- 1-3 mm pieces |
| 50 | Germanium, Ge – Sputtering Target – 99.999% purity |
| 51 | Germanium, Ge single crystal substrates |
| 52 | Hafnium Oxide, HfO2 – Evaporation Material- 99.99% purity – 3-6 mm pieces |
| 53 | Hafnium Oxide, HfO2 – Evaporation Material- 99.99% purity – 3-6 mm pieces |
| 54 | Hafnium Oxide, HfO2 – Sputtering Target – 99.95% purity |
| 55 | Holmium, Ho – Sputtering Target – 99.99% purity |
| 56 | Holmium, Ho – Sputtering Target – 99.99% purity |
| 57 | Indium Oxide, In2O3 – Sputtering Target – 99.99% purity |
| 58 | Indium Tin Oxide, ITO – Evaporation Material – 99.99% purity – 3-6mm Pieces |
| 59 | Indium Tin Oxide, ITO – Sputtering Target – 99.99% purity |
| 60 | Indium, In – Sputtering Target – 99.999% & 99.99% purity |
| 61 | Indium, In pieces – Evaporation Material – 99.999% purity |
| 62 | InGaZnO4 – Bonded Target, – Sputtering Target – 99.99% purity |
| 63 | Iron Silicon Boron , FeSiB – Sputtering Target – 99.9% purity |
| 64 | Iron, Fe -Pieces -Evaporation Material – 99.95% purity |
| 65 | KNN- Pottasium Sodium Niobate- Sputtering Target |
| 66 | KNN-Li – Potassium Sodium Niobate Li doped – Sputtering Target |
| 67 | Langasite, La3Ga5SiO14 – LGS single crystal substrates |
| 68 | Lanthanum Aluminate, LaAlO3 single crystal substrates |
| 69 | Lithium Niobate (SAW grade), LiNbO3 single crystal substrates |
| 70 | Lithium Niobate, LiNbO3 – Sputtering Target – 99.99% purity |
| 71 | Lithium Tantalate, LiTaO3 single crystal substrates |
| 72 | LSAT, Lanthanum-Strontium Aluminium Tantalate single crystal substrates |
| 73 | LSMO – La0.7Sr0.3MnO3 Sputtering Target – 99.9% purity |
| 74 | Lutetium, Lu – Sputtering Target – 99.99% purity |
| 75 | Magnesium Fluoride, MgF2 – Sputtering Target – 99.99% purity |
| 76 | Magnesium Fluoride, MgF2 Granules – Evaporation Material – 99.99% purity |
| 77 | Magnesium Oxide, MgO – Sputtering Target – 99.99% purity |
| 78 | Magnesium Oxide, MgO single crystal substrates |
| 79 | Manganese, Mn – Sputtering Target – 99.9% purity |
| 80 | Manganese-Germanium, Mn3Ge – Sputtering Target – 99.9% purity |
| 81 | Manganese-Tin, Mn3Sn- Sputtering Target – 99.9% purity |
| 82 | Molybdenum di sulfide, MoS2 – Sputtering Target – 99.5% purity |
| 83 | Molybdenum silicide-Sputter Target – 99.5% |
| 84 | Molybdenum trioxide, MoO3 – Sputtering Target – 99.99% purity |
| 85 | Molybdenum, Mo – Sputtering Target |
| 86 | Molybdenum, Mo Pellets – Evaporation Material – 99.95% purity 3mm x 3mm |
| 87 | NdGaO3- Neodymium Gallate single crystal substrates |
| 88 | Nickel Oxide, NiO – Sputtering Target – 99.99% purity |
| 89 | Nickel Sulfide, Ni3S2- Sputtering Target – 99.5% purity |
| 90 | Nickel Vanadium(93:7 wt%), Ni-V – Sputtering Target – 99.95% purity |
| 91 | Nickel Vanadium(93:7 wt%), Ni-V – Sputtering Target – 99.95% purity |
| 92 | Nickel, Ni – Sputtering Target – 99.99%, 99.999% purity |
| 93 | Nickel, Ni Pellets – Evaporation Material – 99.995% purity- 6mm x 6mm |
| 94 | Nickel, Ni Pellets – Evaporation Material – 99.995% purity- 6mm x 6mm |
| 95 | Nickel, Ni Prefabricated Slugs – Evaporation Material – 99.995% purity |
| 96 | Niobium Selenide, NbSe – Sputtering Target – 99.9% purity |
| 97 | Niobium, Nb – Sputtering Target – 99.95% purity |
| 98 | Niobium, Nb – Sputtering Target – 99.95% purity |
| 99 | Niobium, Nb Pellets – Evaporation Material – 99.95% purity- 6mm x 6mm |
| 100 | Niobium, Nb Pellets – Evaporation Material – 99.95% purity- 6mm x 6mm |
| 101 | PbWO4- Lead Tungstate single crystal substrates |
| 102 | Permalloy, Ni:Fe – Sputtering Target – 99.95% purity |
| 103 | PMN-PT – Sputtering Target – 99.9% purity |
| 104 | Potassium Tantalate, KTaO3 single crystal substrates |
| 105 | PZT – Sputtering Target – 99.99% purity |
| 106 | Ruthenium, Ru – Sputtering Target -99.95% |
| 107 | Sapphire, Al2O3 single crystal substrates |
| 108 | Silicon , Si Pieces – Evaporation Material – 99.999% purity |
| 109 | Silicon dioxide , SiO2 granules – Evaporation Material – 99.99% purity |
| 110 | Silicon dioxide, SiO2 – Sputtering Target – 99.99% purity |
| 111 | Silicon dioxide, SiO2 – Sputtering Target – 99.99% purity |
| 112 | Silicon monoxide , SiO granules – Evaporation Material – 99.99% purity |
| 113 | Silicon monoxide , SiO granules – Evaporation Material – 99.99% purity |
| 114 | Silicon monoxide, SiO – Sputtering Target – 99.99% purity |
| 115 | Silicon Nitride, Si3N4 – Sputtering Target |
| 116 | Silicon, Si – Sputtering Target – 99.999% purity |
| 117 | Silver, Ag – Sputtering Target – 99.999% & 99.99% purity |
| 118 | Silver, Ag Pellets and grains – Evaporation Material – 99.99% purity |
| 119 | Strontium , Sr Pieces – Evaporation Material – 99.5% purity- 1-6mm pieces |
| 120 | Tantalum Oxide, Ta2O5 Pieces – Evaporation Material – 99.99% purity |
| 121 | Tantalum, Ta – Sputtering Target |
| 122 | Tantalum, Ta Pellets – Evaporation Material – 99.95% purity |
| 123 | Tin – Sputtering Target – 99.99% purity |
| 124 | Tin Oxide- Sputtering Target |
| 125 | Tin pieces – Evaporation Material – 99.999% purity |
| 126 | Tin pieces – Evaporation Material – 99.999% purity |
| 127 | TiO2- Rutile Titanium di oxide single crystal substrates |
| 128 | Titanium Oxide- black, TiOx- Sputtering Target – 99.99% purity |
| 129 | Titanium Oxide, TiO2 Pieces – Evaporation Material – 99.99% purity |
| 130 | Titanium, Ti – Sputtering Target – 99.995% purity |
| 131 | Titanium, Ti Prefabricated Slugs – Evaporation Material – 99.995% purity |
| 132 | Titanium, Ti Prefabricated Slugs – Evaporation Material – 99.995% purity |
| 133 | Titanium-Tungsten, TiW- Sputtering Target – 99.99% purity |
| 134 | Tungsten oxide WO3- Sputtering Target |
| 135 | Tungsten oxide WO3- Sputtering Target |
| 136 | Tungsten, W – Sputtering Target – 99.95% purity |
| 137 | Tungsten, W Pellets – Evaporation Material – 99.95% purity |
| 138 | Vanadium, V – Sputtering Target – 99.9% purity |
| 139 | YAP- Yttrium Aluminate single crystal substrates |
| 140 | YSZ – Ytrria stabilized Zirconia single crystal substrates |
| 141 | Ytterbium Oxide, Yb2O3 Granules – Evaporation Material – 99.99% purity |
| 142 | Ytterbium, Yb – Sputtering Target – 99.99% purity |
| 143 | Yttrium , Y Pieces – Evaporation Material – 99.9% purity- 1-6mm pieces |
| 144 | Yttrium Oxide, Y2O3 Granules – Evaporation Material – 99.99% purity |
| 145 | Zinc Aluminum (98:2 wt%) ZnAl – Sputtering Target – 99.99% purity |
| 146 | Zinc Oxide – ZnO – Sputtering Target 99.999% & 99.99% purity |
| 147 | Zinc Oxide, ZnO Sputtering Target MAK4 configuration -99.999% |
| 148 | Zinc Sulfide , ZnS Pieces – Evaporation Material – 99.99% purity |
| 149 | Zinc Sulfide , ZnS Pieces – Evaporation Material – 99.99% purity |
| 150 | Zinc Sulfide, ZnS – Sputtering Target – 99.99% purity |
| 151 | Zinc, Zn – Sputtering Target – 99.99% purity |
| 152 | Zirconia- Yttria stabilized, ZrO2/Y2O3 – Sputtering Target – 99.9% purity |
| 153 | Zirconium Oxide, ZrO2 3-10mm pieces – Evaporation Material – 99.95% purity |
| 154 | Zirconium Oxide, ZrO2 3-10mm pieces – Evaporation Material – 99.95% purity |
| 155 | Zirconium, Zr – Sputtering Target |
| 156 | ZnO- Zinc Oxide single crystal substrates |
| 157 | ZnO/MgO (80:20 wt%) – Sputtering Target – 99.99% purity |
- SS10500 – SS380EB-Morgan Hill
