Description
SOLD
Please contact us for the availability of the Plasmatherm 790 RIE used semiconductor equipment.
Reactive Ion Etcher. Computer controlled plasma processing tool. Substrate electrode 7 in. dia. holds a 6 in. wafer. Shower head gas introduction. 500W, 13.56 MHz RF generator. Turbo pumped vacuum system. Includes roughing pump. 7 gas inputs controlled via MFC. 208V, 3 Ph, 60 Hz
The items are subject to prior sale without notice. These items are only for end users.
SS5626
