TRION Phantom II ICP System Plasma Etch System
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TRION Phantom II ICP System Plasma Etch System
Windows 2000
Chamber, 8″
Gases: SF6, He, CHF3, CF4
Power supplies: 230 V, 50/60 Hz, 1 Phase
2000 vintage.
Metrology | Tester | Wafer Carriers
Main Refurbished Equipment
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