Description
Semiconductor Equipment Spare Parts
Valid: These are only for end users. Subject to prior sale without notice. Appreciate your time!
The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.
| Supplier Name | Model | Description |
| ADVANTEST AMERICA INCORPORATED | E5610 | DEFECT REVIEW SEM |
| ADVANTEST AMERICA INCORPORATED | E3630 | SCANNING ELECTRON MICROSCOPE |
| APPLIED MATERIALS INC | 5500 ENDURA | DEP, CU |
| APPLIED MATERIALS INC | 5500 ENDURA | DEP, CU |
| APPLIED MATERIALS INC | EPI 300 CENTURA | DEP |
| APPLIED MATERIALS INC | EPI 300 CENTURA | DEP |
| APPLIED MATERIALS INC | UVISION 5 | BRIGHTFIELD WAFER INSPECTION, CU |
| APPLIED MATERIALS INC | PRODUCER | FILL 3 |
| APPLIED MATERIALS INC | PRODUCER | RTP |
| APPLIED MATERIALS INC | ALTA4700I | DUV LASER WRITER |
| APPLIED MATERIALS INC | P3I | Plasma Implanter |
| APPLIED MATERIALS INC | REFLEXION DESI | POLISHER |
| APPLIED MATERIALS INC | VANTAGE | RTP |
| APPLIED MATERIALS INC | 5500 ENDURA | SPUTTER |
| APPLIED MATERIALS INC | ULTIMA X 300MM | DEP TOOL-2 CHAMBER |
| APPLIED MATERIALS INC | 5500 ENDURA | DEP TOOL |
| APPLIED MATERIALS INC | VERITY 6I | CDSEM 300MM CU |
| APPLIED MATERIALS INC | 5500 ENDURA | DUAL ALD |
| ASML US, LLC | YIELDSTAR-S375 | METROLOGY |
| ASML US, LLC | MDR-100 | Mount/Demount/Remount Tool |
| ASML US, LLC | RWT-100 | Stud Removal/Detach Tool |
| ASML US, LLC | SFT-100 | Stud Fixation Tool |
| AXCELIS TECHNOLOGIES, INC. | PS3 | CURE , DUAL CHAMBER |
| BRUKER NANO INC. | MERLIN | NANO TIP REPAIR |
| BUEHLER LIMITED | ECOMETIII | LAB POLISH LAPPING WHEELS 1265 |
| CARL ZEISS SBE, LLC | PROVE | REGISTRATION & OPTICAL CD |
| COHERENT INC | POWERLINE E10IC | Advanced Laser Marking System |
| CYBER TECHNOLOGIES GMBH | CT350 | INVAR NONCONTACT CHROMATIC CONFOCAL,TEST |
| DISCO HI TEC AMERICA INC | TBD | DISCO FRONTSIDE GRIND, Cu |
| E.A. FISCHIONE INSTRUMENTS, IN | 1020 | Plasma Cleaner – TEM Sample Prep |
| ECSAL TECHNOLOGIES PTE LTD | FC5600S | BA DEFLUX CLEANING TOOL |
| EMITECH PRODUCTS INC | K-950X | CARBON COATER |
| EO TECHNICS INTERNATIONAL INC. | BSM2264 | LASER MARK BASE SFL2264LMF NANO IR LASER |
| FEI COMPANY | 460F1 | Small Chamber DIB |
| FEI COMPANY | TECNAIG2 STWIN | FIELD EMISSION HIGH VOLUME TEM |
| FEI COMPANY | VERIOS 460L | SEM |
| FORTREND ENGINEERING CORP | PLUS 500T-RET | RETICLE HANDLER (IMO SC) |
| FORTREND ENGINEERING CORP | LAMINA 203 | MASK HANDLING TOOL |
| HITACHI HIGH-TECH AMERICA, INC | IS5100 | DFIELD INSPECTION |
| HITACHI HIGH-TECH AMERICA, INC | LS-9300 | BW INSPECTION |
| HORIBA INSTRUMENTS INCORPORATE | PR-PD2-BLI | HIGH SENSITIVITY/THRUPUT BLANKS INSP SYS |
| KEYSIGHT TECHNOLOGIES SINGAPOR | 81160A | Pulse Generator |
| KLA CORPORATION | M62DD | PATTERN INSPECTION A |
| KLA CORPORATION | A200 | REG TOOL, CU |
| KLA CORPORATION | ZSS ATL150I | ADVANCED REG TOOL, IBO |
| KLA CORPORATION | EAIM+ | OVERLAY REGISTRATION TOOL, CU OMTcu 1268 |
| KLA CORPORATION | HRP340-E | HIGH RESOLUTION PROFILOMETER,CU |
| KLA CORPORATION | SLF17 | RETICLE INSPECTION |
| KLA CORPORATION | LCM-2 | ADV. LI SCATTEROMETRY TOOL |
| KULICKE AND SOFFA INDUSTRIES I | ICONNMEMPLUSELA | WIRE BONDER + SOFTWARE + PROCU LOOP |
| LAM RESEARCH CORPORATION | VECTOR | CVD |
| LAM RESEARCH CORPORATION | VECTOR | CVD, CU |
| LAM RESEARCH CORPORATION | SABRE | ELECTROPLATER, CU |
| LAM RESEARCH CORPORATION | SABRE VPM | ELECTROPLATER |
| LAM RESEARCH CORPORATION | GAMMA 2130 | RESIST CLEAN, CU |
| LAM RESEARCH CORPORATION | GAMMA 2130 | CLEAN |
| LASERTEC U.S.A., INC. | BC10 | EUV MASK BACKSIDE REPAIR SYSTEM |
| LASERTEC U.S.A., INC. | M8351 | RESIST PATTERNED AND BLANK INSPECTION B |
| LASERTEC U.S.A., INC. | BD100 | RETICLE VISUALIZATION HANDLER |
| MITUTOYO (MALAYSIA) SDN BHD | QV 606 | WAFER INSPECT AND DEFECT MEASUREMENT |
| MSP CORPORATION | 2300NPT-2 | SPHERE DEP TOOL 30NM, COPPER |
| MSP CORPORATION | 2300NPT-2 | SPHERE DEP TOOL 30NM |
| NUFLARE TECHNOLOGY, INC | EBM-8000 | EBEAM 8000 |
| ONTO INNOVATION INC (DBA NANOM | ATLAS XP | METROLOGY TOOL |
| PLASMA THERM EUROPE | GEN4 MASK IV | DRY ETCHER C |
| REVASUM, INC | 6EG | POLISHER |
| RIGAKU CORPORATION | MFM310 | XRR/XRD, CU |
| RTEC-INSTRUMENTS INC | COPM-3000 | PROFILE MICROSCOPE |
| SCREEN SPE USA LLC | SS3000 | SCRUBBER |
| SIGMAMELTEC LTD | SFB 3000 PEB | Post Exposure Bake |
| SIMPLIMATIC AUTOMATION, LLC | 10003502 | 3661 JDC TRAY STACK/DESTACK,SL,TRAY CVR |
| SIMPLIMATIC AUTOMATION, LLC | 10003587 | 3231S STRIP LUL, I/O LEFT, SEMI-AUTO, SO |
| SOUTH BAY TECHNOLOGY INC | D500I | DIMPLER |
| SOUTH BAY TECHNOLOGY INC | 650 | DIAMOND WAFER SAW LYA 1265 |
| SUPPLIER TBD | 3481MD | THERMO LAB-LINE OVEN |
| SUSS MICROTEC,INC | MABA8 GEN3 | WET LAB MASK ALIGNER |
| TEKTRONIX INC | 707B | Switch Matrix |
| TEKTRONIX INC | DPO7254C | OSCILLOSCOPE |
| THERMO ELECTRON MANUFACTURING | IS50 FT-IR | SPECTROMETER RAMAN |
| TOKYO ELECTRON LIMITED | TACTRAS | ETCHER |
| TOKYO ELECTRON LIMITED | TACTRAS | ETCHER |
| TOKYO ELECTRON LIMITED | CELLESTA | CLEANS, C4 |
| TOKYO ELECTRON LIMITED | P12XL | PROBER, WAFER, IN-LINE E-TEST |
| TOKYO ELECTRON LIMITED | P12XL | Prober, wafer, Mag2 tester |
| TOKYO ELECTRON LIMITED | PRECIO XL | MWBES |
| TOKYO ELECTRON LIMITED | P12XL | PROBER, KEITHLEY |
| TOKYO ELECTRON LIMITED | P12XL | PROBER, MAGII |
| TOKYO ELECTRON LIMITED | NGT | SNGLE BLCK FOR ASML XT1400 |
| TOKYO ELECTRON LIMITED | L-PRO V | TRACK BARC |
| TOKYO ELECTRON LIMITED | LITHIUS | TRACK |
| TOKYO ELECTRON LIMITED | NGT | SINGLE BLOCK FOR NIKON S205, CU |
| TOKYO ELECTRON LIMITED | LITHIUS | Lithius Dual Blk i+ for S610i, cu |
| TOKYO ELECTRON LIMITED | L-PRO V | IMMERSION TRACK FOR S620I |
| TOKYO ELECTRON LIMITED | LITHIUS | SINGLE BLOCK FOR NIKON S208 |
| TOKYO SEIMITSU CO., LTD. | UF3000EX | Prober (PQA Magnum 2 linked) |
| TRION TECHNOLOGIES INC | PHANTOM III | REACTIVE ION ETCHER |
| ULVAC TECHNOLOGIES, INC. | ENTRON EX | MATX, CU |
SS2544-3-1-1
