Description
Model: LAM TCP9408 SE SOLD
Category: Plasma Etch
Original Equipment Manufacturer: Lam Research
Condition: Online
Process: POLY ETCHER
Wafer Size: 8-inch
Valid Time: Subject to prior sale
Vintage: 1997
Serial Number:4554
Software Version: 1.5.1
Main System:LAM POLY ETCHER
SMIF System: ASSYST (2 Units)
Handler System: SHUTTLE LEAD SCREW TYPE(1 Unit)
Process Chamber: POLY ETCHER (1 Unit)
Inspection: Against appointment after PO and payment.
Equipment Configuration:
- Machine Serial Number :4431
- Chamber config Type TCP 9400SE
- TCP RF Match Part No. 853-032294-002
- Bias RF Match 853-025083-001
- ESC Power Supply 810-017086-010
- Chamber manometer. MKS Make (All) 853-031457-001
- Turbo Manometer MKS Make (All) 625A11TDE
- Ref Manometer MKS Make (All) 625A11TDE
- Turbo Pump ATH 1300M
- TCP RF Gen. -AE Make(All) 660-024637-006 RFDS
- BIAS RF Gen.AE Make( All) 660-024637-013 HALO
- Wafer Drag Back DISABLE
- Wafer Offset alignment Alignment 210
- Gas Ring Capacitance 1050+/- 15 pf
- Software Version 1.5.1
- MFC Config.CL2-200 sccm 200
- MFC Config.O2-20 sccm 100
- MFC Config.HE/O2-200 sccm 21
- MFC Config.CF4-100 sccm 100
- MFC Config.HBR-500/300sccm 510
- MFC Config.SF6-100 sccm 100
- MFC Config.HE-500 sccm 515
- MFC Config.CL2-30 sccm 31.5
- TCP Coil position 8 O’CLK
- Chiller used BOC 40/80
- Vat Vale/Pendulum Valve VAT -64 Valve
- PC Pump A30WN
- Load Lock Pump A10S
- Turbo Pump capacity 1300L
- TCP RF AO Setting 1250
- TCP AI Setting 1250
- TCP REF PWR AI Setting 250
- BIAS AO Setting 1250
- BIAS AI Setting 1220
- BIAS REF PWR AI Setting 250
- WAC/NonWAC NonWAC
All the Lam Plasma Etcher equipment trademarks belongs to Lam Research , the original equipment manufacturer. All rights reserved.
