Description
1 | Electron Beam Lithography | E-Beam Lithography | Elionix ELS-G100 Electron Beam Lithography System |
2 | Electron Beam Lithography | E-Beam Lithography | FEI Sirion 400 SEM / JC Nabity NPGS E-Beam Lithography |
3 | Electron Beam Lithography | E-Beam Lithography | FEI Sirion 400 SEM / JC Nabity NPGS E-Beam Lithography |
4 | Electron Beam Lithography | E-Beam Lithography | FEI Sirion 600 SEM / JC Nabity NPGS E-Beam Lithography |
5 | Electron Beam Lithography | E-Beam Lithography | FEI Sirion 600 SEM / JC Nabity NPGS E-Beam Lithography |
6 | Electron-Beam Lithography | Hotplate | E-Beam Lithography Hot Plates |
7 | Electron-Beam Lithography | Coater | E-Beam Lithography Resist Spinners |
8 | Electron-Beam Lithography | E-Beam Lithography | JEOL 6300 |
9 | Electron-Beam Lithography | E-Beam Lithography | JEOL 9500 |
10 | Electron-Beam Lithography | E-Beam Lithography | Nabity Nanometer Pattern Generator System (NPGS) |
11 | Etching | Ion Mill | AJA Ion Mill |
12 | Etching | Asher | Anatech Resist Strip |
13 | Etching | Etcher | Applied Materials Plasma II Plasma Etching |
14 | Etching | Etcher | AW-901eR |
15 | Etching | Etcher | AW-903eR |
16 | Etching | DRIE | Bosch Etcher for deep silicon etching, Unaxis 770 Deep Silicon Etcher |
17 | Etching | Asher | Branson 3000 Barrel |
18 | Etching | Asher | Branson IPC 3000 |
19 | Etching | Asher | Branson S3003 |
20 | Etching | Asher | Branson/IPC 2000 |
21 | Etching | Asher | Branson/IPC 3000 |
22 | Etching | Asher | Branson/IPC 3000 |
23 | Etching | Asher | Branson/IPC 4000 |
24 | Etching | Asher | Branson/IPC 4150 |
25 | Etching | Ion Mill | Commonwealth Scientific Ion Mill |
26 | Etching | Ion Mill | Commonwealth Scientific Ion Mill |
27 | Etching | Etcher | Gasoncis AE 2001 |
28 | Etching | Asher | Gasoncis Aura 2000LL |
29 | Etching | Asher | Gasoncis L3510 |
30 | Etching | Asher | Gasonics Aura 1000 |
31 | Etching | Asher | Gasonics Aura 2000LL |
32 | Etching | Asher | Gasonics L3500 |
33 | Etching | Asher | Gasonics L3510 |
34 | Etching | Asher | Glen 1000 Resist Strip |
35 | Etching | Wet | Hamatech Hot Piranha |
36 | Etching | Wet | Hot Phosphoric Tank |
37 | Etching | Asher | IPC Barrel Etcher |
38 | Etching | Etcher | Lam Auto Etch 590 |
39 | Etching | Etcher | Lam AutoEtch 590 |
40 | Etching | RIE | Lam Rainbow 4420 Envision ver1.5.1 |
41 | Etching | Etcher | Lam Rainbow 4728 |
42 | Etching | Asher | LFE PP-151-9 |
43 | Etching | Asher | Matrix 105 |
44 | Etching | Asher | Matrix 105 |
45 | Etching | Asher | Matrix 105 |
46 | Etching | Asher | Matrix 106 |
47 | Etching | Asher | Matrix 205 |
48 | Etching | Etcher | Matrix 302 |
49 | Etching | Etcher | Matrix 302 |
50 | Etching | Etcher | Matrix 303 |
51 | Etching | Etcher | Matrix 303 |
52 | Etching | Asher | Matrix Bobcat 209S |
53 | Etching | Asher | Matrix Bobcat 209S |
54 | Etching | Asher | Matrix System One Stripper |
55 | Etching | FIB | Micrion 2500 Focused Ion Beam System |
56 | Etching | Wet | Nanostrip Tank |
57 | Etching | RIE | Oxford PlasmaLab 80+ |
58 | Etching | RIE | Oxford PlasmaLab 80+ |
59 | Etching | RIE | Oxford Plasmalab System 133 |
60 | Etching | RIE | Oxford Plasmalab System 133 |
61 | Etching | RIE | Oxford Plasmalab System 133 |
62 | Etching | RIE | Oxford Plasmalab System 133 |
63 | Etching | ICP | Oxford Plasmalab100 |
64 | Etching | ICP | Oxford PlasmaPro 100-380,Oxford Cobra ICP Etcher |
65 | Etching | Asher | Plasma Etch BT1 |
66 | Etching | Etcher | Plasma Etch BT1 |
67 | Etching | Etcher | Plasma Etch PE-100 Series |
68 | Etching | RIE | Plasma Therm 700 |
69 | Etching | RIE | PlasmaTherm 72 Fluorine based Reactive Ion Etcher |
70 | Etching | ICP | PlasmaTherm 770 inductively coupled plasma etching system for III-V based materials. |
71 | Etching | ICP | PlasmaTherm 770 metal ICP etch |
72 | Etching | RIE | Plasmatherm 790 |
73 | Etching | RIE | Plasma-Therm 790 RIE |
74 | Etching | DRIE | Plasma-Therm Deep Silicon Etcher,DRIE silicon etch |
75 | Etching | RIE | Plasmatherm SLR 720 |
76 | Etching | ICP | Plasma-Therm Versaline ICP RIE |
77 | Etching | RIE | PlasmaTherm720/740 is a dual chamber RIE |
78 | Etching | RIE | PlasmaTherm720/740 is a dual chamber RIE |
79 | Etching | HF Etcher | Primaxx Vapor HF Etcher,Vapor HF Isotropic Release Etching |
80 | Etching | Asher | PVA Tepla M4L |
81 | Etching | Clean | SAMCO UV-1 UV/Ozone |
82 | Etching | Clean | Samco UV-1 Ozone Cleaner |
83 | Etching | ICP | STS Aspect AOE |
84 | Etching | ICP | STS Aspect ICP |
85 | Etching | ICP | STS MESC Multiplex ICP |
86 | Etching | ICP | STS multi-chamber Cluster |
87 | Etching | DRIE | STS Multiplex DRIE |
88 | Etching | DRIE | STS Multiplex ICP MACS |
89 | Etching | ICP | STS Multiplex ICP RIE |
90 | Etching | ICP | STS Mutiplex ICP |
91 | Etching | ICP | STS PRO ICP Etcher |
92 | Etching | Asher | Technics Macro Series 2000 |
93 | Etching | Etcher | Technics PE-11A |
94 | Etching | Etcher | Tegal 901e |
95 | Etching | Etcher | Tegal 903e |
96 | Etching | RIE | Tegal 903e Plasma Etch |
97 | Etching | RIE | Tegal 903e Plasma Etch |
98 | Etching | RIE | Tegal 903e Plasma Etch |
99 | Etching | ICP | Trion Minilock III ICP Etcher |
100 | Etching | RIE | Trion Phantom II RIE |
101 | Etching | XeF2 | Xactix XeF2 Isotropic silicon etch system,Xactix Xenon Difluoride Etcher |
102 | Etching | Asher | YES CV200RFS Oxygen Plasma Asher |
103 | Etching | Asher | YES EcoClean Asher |
104 | Etching | Asher | YES R1 |
105 | Etching | Asher | YES R3 |
106 | Facility | CDA | Beacon Madeas Lab Air system |
107 | Facility | Wet | Bottle Washer |
108 | Facility | DIW | Deionized water |
109 | Facility | Wet | Dishwasher |
110 | Facility | Wet | Dishwasher |
111 | Facility | Wet | General Chemistry Hoods,Acid/Base Fume Hoods for General Wet Chemistry Steps |
112 | Facility | N2 | Nitrogen gas 99.9% |
113 | Facility | N2 | Nitrogen gas 99.9999% |
114 | Facility | Wet | Spin Rinse Dryers |
115 | Facility | Wet | Wet Scrubber |
116 | Metrology | 4-point probe | Everbeing 4-Point Probe |
117 | Metrology | Probe | Everbeing EB-6 DC Probe Station |
118 | Metrology | Tester | Keithley 4200A – IVCV Testing Station |
119 | Metrology | Probe | Zyvex Nanoprobes for Ultra SEM |
120 | Metrology | Ellipsometer | Accurion EP3 Imaging Ellipsometer |
121 | Metrology | 4-point probe | CDE ResMap Resistivity 4-pt Probe |
122 | Metrology | Profilometer | Dektak 6M profilometer |
123 | Metrology | Probe | EG 1034 |
124 | Metrology | Probe | EG 2001X with NAVITAR |
125 | Metrology | Probe | EG 3001X |
126 | Metrology | Probe | EG4090u+ 8 inch wafer probe |
127 | Metrology | Probe | Electroglas 2001X 3 sets |
128 | Metrology | Probe | Electroglas Model 3001X |
129 | Metrology | film thickness measurement | FilMetrics F20 , FilMetrics 205-0082 Film Measurement Systems |
130 | Metrology | film thickness measurement | FilMetrics F40,Optical Measurement Systems for transparent thin film measurement |
131 | Metrology | film thickness measurement | FilMetrics F40-UV, Optical Measurement Systems for transparent thin film measurement |
132 | Metrology | Stress/ curvature Measurement | FleXus Film Stress Measurement |
133 | Metrology | Tester | Hewlett Packard 4061A |
134 | Metrology | Tester | HP 4062 and Testers |
135 | Metrology | Profilometer | KLA Tencor P-15 Profilometer |
136 | Metrology | Profilometer | KLA-Tencor P10 Profilometer |
137 | Metrology | Profilometer | KLA-Tencor P7 Profilometer |
138 | Metrology | film thickness measurement | Leitz Film Thickness Measurement System |
139 | Metrology | 4-point probe | Lucas Signatone SP4 4-pt probe and a Keithley 2100 multimeter |
140 | Metrology | Tester | Lucas Signatone SP4 4-pt probe and a Keithley 2100 multimeter |
141 | Metrology | Particle | Malvern Nano ZS Zetasizer |
142 | Metrology | Particle | Malvern NS300 NanoSight |
143 | Metrology | film thickness measurement | Metricon Model 2010/M Prism Coupler |
144 | Metrology | refractometer | Metricon Model 2010/M Prism Coupler |
145 | Metrology | refractometer | Mettler Hand-held Refractometer |
146 | Metrology | Probe | Micromanipulator Probe Stations |
147 | Metrology | film thickness measurement | Nanoline CD Measurement |
148 | Metrology | thin film | Nanometrics 210 Nanospec AFT |
149 | Metrology | film thickness measurement | Nanometrics Nanospec 210XP |
150 | Metrology | Microscope | Olympus BH Inspection Microscope |
151 | Metrology | Microscope | Olympus MX80 Inspection Microscope |
152 | Metrology | Microscope | Olympus Widefield Zoom Microscope |
153 | Metrology | film thickness measurement | Optical Measurement Systems for transparent thin film measurement |
154 | Metrology | Diffractometer | PANalytical X’Pert Pro MRD X-ray Diffraction System |
155 | Metrology | Goniometer | Rame-Hart 500 Goniometer |
156 | Metrology | Tester | Relay Tester With APC Smart-UPS , HP Compaq Pickering Interfaces 40-914-001 |
157 | Metrology | Tester | Relay Tester With HP Compaq ,TDK Lambda |
158 | Metrology | Tester | Relay Tester With HP Compaq Pickering Interfaces 40-914-001 |
159 | Metrology | film thickness measurement | Rudolph FTM |
160 | Metrology | Microscope | Schott IR Inspector |
161 | Metrology | Profilometer | Tencor Alpha-Step 200 Profilometer |
162 | Metrology | film thickness measurement | Tencor M-Gage 200 |
163 | Metrology | Profilometer | Tencor P-2 Profilometer |
164 | Metrology | Goniometer | VCA Optima Contact Angle |
165 | Metrology | Viscometer | Vibro SV-10 Viscometer |
166 | Metrology | Ellipsometer | Woollam Spectroscopic Ellipsometer |
167 | Metrology | Profilometer | Zygo Optical Profilometer,no contact |
168 | Packaging & Misc Processing | Critical Point Dryer | Bal-Tec CPD 408 |
169 | Packaging & Misc Processing | Hotplate | Brewer Science 300 mm Hot Plate |
170 | Packaging & Misc Processing | Coater | Brewer Science 300 mm Spinner |
171 | Packaging & Misc Processing | Picker | Clone Screening Colony Picker |
172 | Packaging & Misc Processing | Electroplating | Copper Electroplating Bath |
173 | Packaging & Misc Processing | Probe | CorSolutions Microfluidic Probe Station |
174 | Packaging & Misc Processing | Critical Point Dryer | Critical Point Dryer – Tousimis |
175 | Packaging & Misc Processing | Drill | Custom made drill for microfluidic through holes |
176 | Packaging & Misc Processing | Laminator | Dicing Tape Frame Applicator |
177 | Packaging & Misc Processing | Printer | Dimatix Printer |
178 | Packaging & Misc Processing | Dicing Saw | DISCO Dicing Saw |
179 | Packaging & Misc Processing | Scribing Tool | FlipScribe Back Side Scribing Tool |
180 | Packaging & Misc Processing | Clean | Hamatech Post CMP Brushcleaner |
181 | Packaging & Misc Processing | Harrick Plasma Generator | |
182 | Packaging & Misc Processing | Harrick Plasma Generator | |
183 | Packaging & Misc Processing | Oven | High-temperature PDMS Curing Oven |
184 | Packaging & Misc Processing | Hot Press | |
185 | Packaging & Misc Processing | Bonder | K&S Gold Ball Bonder |
186 | Packaging & Misc Processing | Wet | KOH Hood and Bath |
187 | Packaging & Misc Processing | Bonder | Kulicke & Soffa (K&S) Triton RDA Auto Wedge Bonder |
188 | Packaging & Misc Processing | Dicing Saw | Kulicke & Soffa 782-6 Dicing Saw |
189 | Packaging & Misc Processing | Bonder | Kulicke & Soffa K&S 8028 Auto Gold Ball Bonder |
190 | Packaging & Misc Processing | Coater | Laurell WS-400A spin coater |
191 | Packaging & Misc Processing | Critical Point Dryer | Leica CPD300 critical point dryer |
192 | Packaging & Misc Processing | CMP | Logitech Orbis CMP (Chemical Mechanical Polishing) |
193 | Packaging & Misc Processing | Oven | Low-temp PDMS Vacuum Oven |
194 | Packaging & Misc Processing | Oven | Low-temp PDMS Vacuum Oven |
195 | Packaging & Misc Processing | Oven | Low-temp PDMS Vacuum Oven |
196 | Packaging & Misc Processing | Dicing Saw | Micromech Diamond Saw |
197 | Packaging & Misc Processing | Printer | MVD100 Molecular Vapor Deposition Tool for Surface Modification |
198 | Packaging & Misc Processing | Printer | Objet30 Pro 3D Printer |
199 | Packaging & Misc Processing | Bonder | Pico MA FinePlacer FlipChip Bonder |
200 | Packaging & Misc Processing | RTP | Rapid Thermal Anneal – AG Associates Model 610 |
201 | Packaging & Misc Processing | RTP | Rapid Thermal Anneal – AG Associates Model 610 |
202 | Packaging & Misc Processing | Wet | Semitool 270 Spin Rinser/Dryer |
203 | Packaging & Misc Processing | Wet | Semitool 870 Spin Rinser/Dryer |
204 | Packaging & Misc Processing | Wet | Semitool 880 Spin Rinser/Dryer |
205 | Packaging & Misc Processing | CMP | Strasbaugh 6EC CMP |
206 | Packaging & Misc Processing | Suss Microtech – DSM8 Suss Backside Alignment Measurement | |
207 | Packaging & Misc Processing | Bonder | Suss SB8e Substrate Bonder |
208 | Packaging & Misc Processing | Critical Point Dryer | Tousimis Critical Point Dryer |
209 | Packaging & Misc Processing | Versalaser Engraver/Cutter Tool,CO2 (Infrared wavelength) laser cutter/engraver | |
210 | Packaging & Misc Processing | Bonder | Westbond 7400A Ultrasonic Wire Bonder |
211 | Photolithography | mask making | ABM mask making |
212 | Photolithography | exposing | ASML 5500/80 i-Line Wafer Stepper |
213 | Photolithography | exposing | ASML PAS 5500/300C DUV Wafer Stepper |
214 | Photolithography | Hotplate | BLE 150 Hotplate |
215 | Photolithography | Oven | Blue M Oven – 120 ºC |
216 | Photolithography | Mask Aligner | Canon / Neutronix PLA501 Front & Back Aligner |
217 | Photolithography | mask making | Canon 501 |
218 | Photolithography | Mask Aligner | Canon PLA-501 F crated-8 |
219 | Photolithography | Mask Aligner | Canon PLA-501 F crated-9 |
220 | Photolithography | Mask Aligner | Canon PLA-501 F Parallel Light Mask Aligner 2 sets |
221 | Photolithography | developing | CEE 100 Spray Developer |
222 | Photolithography | Coater | CEE 100CB Bench Mount Spinner/Hotplate |
223 | Photolithography | Coater | CEE 100CB Table Top Spinner/Hotplate |
224 | Photolithography | Coater | Class II Resist Spinners (SU-8) |
225 | Photolithography | Oven | Despatch Convection Oven – 90 ºC |
226 | Photolithography | Coater | Edge Bead Removal System EBR |
227 | Photolithography | mask making | EVG EV620 |
228 | Photolithography | exposing | GCA 6300 DSW 5X g-line Wafer Stepper |
229 | Photolithography | exposing | GCA AutoStep 200 DSW i-line Wafer Stepper |
230 | Photolithography | Coater | GYRSET System RC8 spinner |
231 | Photolithography | developing | Hamatech-Steag HMP900 mask developing and chrome etching |
232 | Photolithography | developing | Hamatech-Steag wafer processors for developing |
233 | Photolithography | Laser Lithography System | Heidelberg DWL 66 Laser Lithography System |
234 | Photolithography | Laser Lithography System | Heidelberg DWL 66FS Laser Lithography System |
235 | Photolithography | developing | Heidelberg Mask Writer – DWL2000 |
236 | Photolithography | developing | Heidelberg Mask Writer – DWL66FS |
237 | Photolithography | Cleaner | Jelight 144AX UVO-Cleaner |
238 | Photolithography | Mask Aligner | Karl Süss MA56 Contact Aligner |
239 | Photolithography | Mask Aligner | Karl Süss MA6/BA6 Contact Aligner |
240 | Photolithography | Mask Aligner | Karl Süss MJB3 Contact Aligner |
241 | Photolithography | developing | Nanoimprint NX-2500 |
242 | Photolithography | developing | NanoScribe GT2 Laser Lithography System |
243 | Photolithography | Mask Aligner | Neutronix NV2 Canon PLA 500/501 Wafer Mask Aligner |
244 | Photolithography | Mask Aligner | Neutronix PLA-545 UV Mask Aligner |
245 | Photolithography | Stepper | Nikon NSR-1505G4 Stepper |
246 | Photolithography | Hotplate | Photolithography Hotplates |
247 | Photolithography | Coater | Photolithography Spinners |
248 | Photolithography | Photoresist Refrigerator | |
249 | Photolithography | stripping | Resist Hot Strip Bath |
250 | Photolithography | Coater | Solitec Photoresist Spinner |
251 | Photolithography | Hotplate | SU-8 Hotplates |
252 | Photolithography | Laminator | SUEX / ADEX Laminator |
253 | Photolithography | Coater | SUSS MicroTec Gamma |
254 | Photolithography | developing | SUSS MicroTec Gamma |
255 | Photolithography | mask making | Suss/Karl Suss MJB4 MJB4 |
256 | Photolithography | Oven | YES 450PB Polyimide Bake Oven |
257 | Photolithography | Oven | YES HMDS Vapor Prime Vacuum Oven |
258 | Photolithography | Oven | YES Image Reversal Oven |
259 | Photolithography | Oven | YES Vapor Prime Oven LP-III vacuum oven hexamethyldisilazane (HMDS) |
260 | SEM&Microscope | Sputter | Anatech Hummer Gold Coater |
261 | SEM&Microscope | Spectrometer | Bruker Energy-dispersive X-ray Spectrometer (EDS) |
262 | SEM&Microscope | FIB | Focused Ion Beam – Hitachi FB-2000A |
263 | SEM&Microscope | SEM | Hitachi S-900 SEM |
264 | SEM&Microscope | SEM | Hitachi TM3000 SEM |
265 | SEM&Microscope | Sputter | Hummer Au/Pd Sputtering System |
266 | SEM&Microscope | Microscope | JEOL Alignment Microscope |
267 | SEM&Microscope | Microscope | Nikon Digital Sight DS-5M-L1 Optical Microscope |
268 | SEM&Microscope | Microscope | Nikon L200 Eclipse Microscope |
269 | SEM&Microscope | Microscope | Olympus BX-51 Fluorescence Microscope |
270 | SEM&Microscope | Microscope | Olympus BX60 Confocal Microscope |
271 | SEM&Microscope | Microscope | Olympus IX-71 Inverted Fluorescence Microscope |
272 | SEM&Microscope | Microscope | Olympus MX-50 Microscope |
273 | SEM&Microscope | Microscope | PAMS JEOL 9500 Pre-Alignment Microscope |
274 | SEM&Microscope | Sputter | Polaron Gold Sputtering System |
275 | SEM&Microscope | AFM | Veeco Icon Atomic Force Microscope |
276 | SEM&Microscope | SEM | Zeiss Supra SEM |
277 | SEM&Microscope | SEM | Zeiss Ultra-55 SEM |
278 | Thermal Processing | Furnace | 2″ Tube Annealing Furnace |
279 | Thermal Processing | RTP | AccuThermo AW 410 |
280 | Thermal Processing | RTP | AccuThermo AW 610 |
281 | Thermal Processing | RTP | AccuThermo AW 610 |
282 | Thermal Processing | RTP | AccuThermo AW 810 |
283 | Thermal Processing | RTP | AG Associates HeatPulse 210 |
284 | Thermal Processing | RTP | AG Associates HeatPulse 310 |
285 | Thermal Processing | RTP | AG Associates HeatPulse 410 |
286 | Thermal Processing | RTP | AG Associates HeatPulse 610 |
287 | Thermal Processing | RTP | AG Heat Pulse 610i Rapid Thermal Annealer |
288 | Thermal Processing | Oven | Blue M Variable Temp Ovens |
289 | Thermal Processing | silicon oxide | CMOS Gate Oxide |
290 | Thermal Processing | polysilicon | CMOS P+ Polysilicon |
291 | Thermal Processing | Diffusion | First Nano Carbon Nanotube and Graphene Furnace |
292 | Thermal Processing | Oven | Hotpack Vacuum Oven |
293 | Thermal Processing | Hotplate | Hotplates |
294 | Thermal Processing | silicon nitride | LPCVD CMOS Nitride |
295 | Thermal Processing | Anneal | Micro Magnetics SpinTherm 1000 Magnetic Annealing System |
296 | Thermal Processing | Cleaning | MOS Clean Anneal |
297 | Thermal Processing | Anneal | MOS Metal Anneal |
298 | Thermal Processing | Anneal | MRL Industries Furnace |
299 | Thermal Processing | polysilicon | MRL Industries Furnace |
300 | Thermal Processing | Anneal | MRL Industries Furnace for annealing |
301 | Thermal Processing | silicon oxide | MRL Industries Furnace for low temperature oxide deposition |
302 | Thermal Processing | silicon nitride | MRL Industries Furnace for sililcon nitride |
303 | Thermal Processing | polysilicon | N+/P+ Polysilicon |
304 | Thermal Processing | Diffusion | Phosphorus Doping |
305 | Thermal Processing | Diffusion | Solid Source Boron Diffusion |
306 | Thermal Processing | silicon oxide | TFT Low Temperature |
307 | Thermal Processing | silicon oxide | Wet/Dry Oxide |
308 | Thin Film Deposition | Sputter | 5-Target Nanofab Sputtering System |
309 | Thin Film Deposition | Sputter | 5-Target Nanofab Sputtering System |
310 | Thin Film Deposition | Sputter | 5-Target Nanofab Sputtering System |
311 | Thin Film Deposition | Sputter | 5-Target Nanofab Sputtering System |
312 | Thin Film Deposition | Sputter | 5-Target Nanofab Sputtering System |
313 | Thin Film Deposition | Sputter | 6-Target Nanofab Sputtering System |
314 | Thin Film Deposition | Evaporator | Airco Temescal FC-1800 |
315 | Thin Film Deposition | Evaporator | Airco Temescal FC-1800 |
316 | Thin Film Deposition | Sputter | AJA Sputter Deposition |
317 | Thin Film Deposition | Sputter | AJA Sputter Deposition |
318 | Thin Film Deposition | PECVD | AMAT AMP-3300 PECVD |
319 | Thin Film Deposition | ALD | Arradiance Gemstar-6 ALD system |
320 | Thin Film Deposition | ALD | Cambridge Nanotech Fiji Atomic Layer Deposition System |
321 | Thin Film Deposition | Evaporator | CHA Evaporator 3 Hearth Thermal Evaporator for Metal Films |
322 | Thin Film Deposition | Evaporator | CHA Mark 50 E-beam Evaporator |
323 | Thin Film Deposition | Ion Beam Deposition | Commonwealth Scientific Ion Beam Deposition System |
324 | Thin Film Deposition | Sputter | CVC Connexion Sputtering System |
325 | Thin Film Deposition | Evaporator | CVC SC4500 Combination Thermal/ E-gun Evaporation System for deposition of thin films |
326 | Thin Film Deposition | Evaporator | CVC SC4500 E-gun Evaporation System for deposition of thin films |
327 | Thin Film Deposition | Sputter | CVC AST-601 Sputter |
328 | Thin Film Deposition | Evaporator | Edwards Evaporator |
329 | Thin Film Deposition | Electroplating | Electroplating Hood – Au |
330 | Thin Film Deposition | Electroplating | Electroplating Hood – Ni |
331 | Thin Film Deposition | PECVD | GSI Plasma Enhanced Chemical Vapor Deposition System |
332 | Thin Film Deposition | CVD | GVD iCVD System |
333 | Thin Film Deposition | CVD | GVD oCVD System |
334 | Thin Film Deposition | Evaporator | Kurt J Lesker Dual Thermo |
335 | Thin Film Deposition | Sputter | Kurt J. Lesker PVD 75 Sputter Deposition |
336 | Thin Film Deposition | Sputter | Kurt Lesker PVD 75 Electron Beam Evaporator |
337 | Thin Film Deposition | Sputter | Kurt Lesker PVD 75 Sputtering System |
338 | Thin Film Deposition | Sputter | Leybold Heraeus Z-400 Sputtering System |
339 | Thin Film Deposition | Sputter | Leybold Heraeus Z-400 Sputtering System #2 |
340 | Thin Film Deposition | Sputter | Leybold Heraeus Z-650 Sputtering System |
341 | Thin Film Deposition | Sputter | MRC 603 MRC 693 TES |
342 | Thin Film Deposition | Sputter | MRC 603 Sputter |
343 | Thin Film Deposition | Sputter | MRC 603 Sputter |
344 | Thin Film Deposition | Sputter | MRC 643 Sputter |
345 | Thin Film Deposition | Sputter | MRC 8671 Sputtering |
346 | Thin Film Deposition | Sputter | OEM Endeavor M1,OEM Aluminum Nitride Sputtering System |
347 | Thin Film Deposition | PECVD | Oxford 100 PECVD System |
348 | Thin Film Deposition | ALD | Oxford ALD FlexAL, Atomic Layer Deposition |
349 | Thin Film Deposition | Parylene Coater | PDS 2010 LABCOTER |
350 | Thin Film Deposition | Parylene Coater | PDS 2010 LABCOTER |
351 | Thin Film Deposition | Sputter | Perkin Elmer 6J Sputtering System |
352 | Thin Film Deposition | Sputter | Perkin Elmer 8L Sputtering System |
353 | Thin Film Deposition | Sputter | Perkin-Elmer 2400 |
354 | Thin Film Deposition | Sputter | Perkin-Elmer 4400 |
355 | Thin Film Deposition | Sputter | Perkin-Elmer 4400 Sputter |
356 | Thin Film Deposition | Sputter | Perkin-Elmer 4400 Sputter |
357 | Thin Film Deposition | Sputter | Perkin-Elmer 4410 |
358 | Thin Film Deposition | Sputter | Perkin-Elmer 4450 |
359 | Thin Film Deposition | Sputter | Perkin-Elmer 4450 Sputter |
360 | Thin Film Deposition | PECVD | Plasma Therm 700 |
361 | Thin Film Deposition | CVD | Plasmalab CVD-2 |
362 | Thin Film Deposition | Polymer Vapor Deposition | ReynoldsTech Polymer Vapor Deposition |
363 | Thin Film Deposition | Sputter | SCS Labcoter 2 Parylene Deposition System |
364 | Thin Film Deposition | Sputter | Tegal AMS Aluminum Nitride Sputtering System |
365 | Thin Film Deposition | Sputter | Temescal BJD-1800 -TES |
366 | Thin Film Deposition | Evaporator | Temescal FC-1800 -TES |
367 | Thin Film Deposition | Evaporator | Temescal FC-1800 |
368 | Thin Film Deposition | Evaporator | Temescal FC-1800 |
369 | Thin Film Deposition | Evaporator | Temescal FC-1800 |
370 | Thin Film Deposition | PECVD | Trion Orion II PECVD |
371 | Thin Film Deposition | Evaporator | Ultek E-Beam Evaporator |
372 | Thin Film Deposition | Evaporator | Varian 3118 E-Beam Thermal |
373 | Thin Film Deposition | Evaporator | Varian 3120 EB Evaporator |
374 | Thin Film Deposition | Evaporator | Varian 3120 Evaporator |
375 | developing | BOLD Technologies INC Batch Develop Station | |
376 | 4-point probe | CDE ResMap 178 Four Point Probe | |
377 | 4-point probe | Lucas/Signatone Corp. Quad Pro Four-Point Probes | |
378 | Coater | Solitec Model 820-ACB Automatic Coat Bake 4 sets | |
379 | developing | Steamboat Semiconductor Developer | |
380 | Coater | SVG-8136 HPO SVG Spin Track |
S