Description
Axic Benchmark 800 ICP
OEM: Axic
Model:Benchmark 800
Plasma Enhanced Chemical Vapor Deposition System PECVD. Tool used in research, process development or low volume production for precise etching and deposition on substrates up to 8-inches in diameter. The system can be operated in either a batch or single slice mode. Features single-piece chamber construction, proven process recipes, field proven components, computer control with Windows programming. Previous gases used N2, SF6, He, SiH4, NH3, N2O. Dual Advanced Energy Dressler Cesar RF generators
The items are subject to prior sale without notice. These items are only for end users.
SS5626
