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Oxford PlasmaLab System 133

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

SKU: STS Multiplex ICP -5-1-1-1-1 Category: Tags: ,

Description

2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher

OXFORD Plasmalab 133 RIE (CL)
Model Year : 2003
Quantity :    1
Condition : Complete system
Serial No : 417718

Configuration:

Supports wafer sizes up to 300mm (330mm Platen)

RIE set up for GaN Etch

RF Power: 600W, 13.56MHz

Water cooled electrode 10C-80C

Load Lock with turbo pump

End point detection: Verity Optical emission spectroscopy (200-800nm)

Gas pod with 6 lines including following MFCs:
Ar      – 100sccm
CL     – 100sccm
BCL3 – 100sccm
N2O   – 100sccm

Windows PC, User friendly interface

This tool was removed from production October 2014.

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