2003 Oxford PlasmaLab System 133+ RIE Reactive Ion Etcher
Location: Nanjing, Jiangsu, China
OXFORD Plasmalab 133 RIE (CL)
Model Year : 2003
Quantity : 1
Condition : Refurbished with OEM specifications ,crating, warranty, installation if necessary at different prices.
Serial No : 417718
Lead time: 12-16 weeks after payment.
Availability : Subject to prior sale without notice.
Supports wafer sizes up to 300mm (330mm Platen)
RIE set up for GaN Etch
RF Power: 600W, 13.56MHz
Water cooled electrode 10C-80C
Load Lock with turbo pump
End point detection: Verity Optical emission spectroscopy (200-800nm)
Gas pod with 6 lines including following MFCs:
Ar – 100sccm
CL – 100sccm
BCL3 – 100sccm
N2O – 100sccm
Windows PC, User friendly interface
This tool was removed from production October 2014.
Chiller, Pump are not included.