Description
The items are subject to prior sale without notice. These items are only for end users.
| 1 | ADE | Metrology | WaferSight | Wafer Flatness Measurement | 12 |
| 2 | Alcatel | Etch | Alcatel Gir | Dry Etch | 5 |
| 3 | AMAT | CMP | Reflexion | Oxide CMP | 12 |
| 4 | AMAT | CVD | Centura DxZ | PESiON | 8 |
| 5 | AMAT | CVD | Centura DxZ | PESiON | 8 |
| 6 | AMAT | CVD | Centura UltimaX | IMD FSG/USG HDP | 12 |
| 7 | AMAT | CVD | Centura UltimaX | IMD FSG/USG HDP | 12 |
| 8 | AMAT | CVD | P5000 | CVD | 8 |
| 9 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
| 10 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
| 11 | AMAT | CVD | P5000 | LTO CVD, TEOS | 8 |
| 12 | AMAT | CVD | P5000 | Oxide | 8 |
| 13 | AMAT | CVD | P5000 | PECVD | 4 |
| 14 | AMAT | CVD | P5000 | PECVD | 4 |
| 15 | AMAT | CVD | P5000 | PECVD | 4 |
| 16 | AMAT | CVD | P5000 | PECVD | 5 |
| 17 | AMAT | CVD | P5000 | TEOS | 6 |
| 18 | AMAT | CVD | P5000 | TEOS | 6 |
| 19 | AMAT | CVD | P5000 Optima | LP-CVD | 8 |
| 20 | AMAT | CVD | Producer GT Chamber | Low K | – |
| 21 | AMAT | CVD | Producer SE | ACL | 12 |
| 22 | AMAT | CVD | Producer SE | SA BPSG | 12 |
| 23 | AMAT | Etch | Centura DPS2 Metal | Metal | 12 |
| 24 | AMAT | Etch | Centura DPS2 Poly | Poly | 12 |
| 25 | AMAT | Etch | Centura DPS2 Poly | Poly | 12 |
| 26 | AMAT | Etch | Centura2 eMAX | Oxide | 8 |
| 27 | AMAT | Etch | P5000 | Metal | 6 |
| 28 | AMAT | Etch | P5000 | Metal | 6 |
| 29 | AMAT | Etch | P5000 | Metal | 6 |
| 30 | AMAT | Etch | P5000 | Poly | 6 |
| 31 | AMAT | Etch | P5000 | Poly | 5 |
| 32 | AMAT | Etch | P5000 | Poly | 6 |
| 33 | AMAT | Metrology | Orbot WF720 | Metrology | 5 |
| 34 | AMAT | Metrology | SEMVision G3 | – | 12 |
| 35 | AMAT | Metrology | SEMVision G3 FIB | DR SEM | 12 |
| 36 | AMAT | Metrology | UVision 4 | Bright field inspection | 12 |
| 37 | AMAT | Metrology | WF720 | Metrology | 6 |
| 38 | AMAT | Metrology | WF730 | Metrology | 6 |
| 39 | AMAT | PVD | Endura 2 | METAL | 12 |
| 40 | AMAT | PVD | Endura CL | PVD | 12 |
| 41 | AMAT | RTP | AMC7800RPX | EPI | 6 |
| 42 | AMAT | RTP | AMC7811 | EPI | 6 |
| 43 | AMAT | RTP | AMC7821 | EPI | 6 |
| 44 | AMAT | RTP | AMC7821 | EPI | 6 |
| 45 | AMAT | RTP | Centura XE | Anneal | 8 |
| 46 | ASM | CVD | Dragon 2300 | PECVD Equipment for Barrier | 12 |
| 47 | ASM | CVD | Eagle10 | DARC | 8 |
| 48 | ASM | CVD | Eagle10 | PETEOS | 8 |
| 49 | ASM | CVD | Eagle12 | Curing | 12 |
| 50 | ASML | Scanner | AT850T | Twin Scanner | 12 |
| 51 | ASML | Scanner | XT1250D | Arf twinscan | 12 |
| 52 | ASML | Scanner | XT1400F | ArF, twinscan | 12 |
| 53 | ASML | Stepper | PAS 2500/30 | Lithography | 5 |
| 54 | ASML | Stepper | PAS 2500/40 | Lithography | 5 |
| 55 | ASML | Stepper | PAS 2500/40 | Lithography | 5 |
| 56 | ASML | Stepper | PAS 5500/100D | i-Line | 6 |
| 57 | ASML | Stepper | PAS 5500/400D | i-line Scanner | 8 |
| 58 | Asyst | FAB ETC | LPT2000 | SMIF, LEFT | 8 |
| 59 | Asyst | FAB ETC | LPT2200 | SMIF, RIGHT | 8 |
| 60 | Aviza/SVG | Furnace | 10K | Diffusion | 5 |
| 61 | Aviza/SVG | Furnace | 10K | Diffusion | 5 |
| 62 | Axcelis | Asher | Microlite | Lithography | 5 |
| 63 | Axcelis | Track | RapidCure 320FC | UV anneal Unit | 12 |
| 64 | Blue M | FAB ETC | DCC 606 EMP550 | – | 12 |
| 65 | BMR | Etch | ICP Etcher | ICP Etch | 4 |
| 66 | BMR | Etch | ICP Etcher | ICP Etch | 4 |
| 67 | Canon | Scanner | FPA-5000ES3 | KrF Scanner | 8 |
| 68 | Canon | Scanner | FPA-6000ES6a | 90nm,KrF) Scanner | 12 |
| 69 | Canon | Stepper | FPA-3000i4 | i-line | 8 |
| 70 | Canon | Stepper | FPA-5500iZ+ | i-Line Stepper | 12 |
| 71 | Cymer | Scanner | ELS-5400 | KrF Laser | – |
| 72 | Cymer | Scanner | ELS-5410 | KrF Laser | – |
| 73 | DNS | CMP | AS2000 | – | 8 |
| 74 | DNS | CMP | AS2000 | [Part] AS2000 | 8 |
| 75 | DNS | CMP | AS2000 | [Part]AS2000 | 8 |
| 76 | DNS | CMP | AS2000 | Oxide | 8 |
| 77 | DNS | RTP | LA-820 | Lamp Anneal | 8 |
| 78 | DNS | RTP | LA-W820-A | Lamp Anneal | 8 |
| 79 | DNS | Track | RF-300A | Track | 8 |
| 80 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 81 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 82 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 83 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 84 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 85 | DNS | Track | SS-3000-A | SCRUBBER | 12 |
| 86 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
| 87 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
| 88 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
| 89 | DNS | Track | SS-3000-AR | SCRUBBER | 12 |
| 90 | DNS | Track | SS-W80A-A | Scrubber | 8 |
| 91 | DNS | Track | SS-W80A-A | Scrubber | 8 |
| 92 | DNS | Track | SS-W80A-A | Scrubber | 8 |
| 93 | DNS | Track | SS-W80A-A | Scrubber | 8 |
| 94 | DNS | Track | SS-W80A-A | Scrubber | 8 |
| 95 | DNS | WET | FC-3000 | Wet Station | 12 |
| 96 | DNS | WET | SU-3100 | CLN | 12 |
| 97 | DNS | WET | WS-820C | Wet Etching | 8 |
| 98 | EBARA | CMP | EPO-222 | WCMP | 8 |
| 99 | EBARA | CMP | EPO-222A | W | 8 |
| 100 | EBARA | CMP | EPO-222A | W | 8 |
| 101 | EBARA | CMP | EPO-222A | W | 8 |
| 102 | EBARA | CMP | EPO-222A | W | 8 |
| 103 | EBARA | CMP | EPO-222A | W | 8 |
| 104 | EBARA | CMP | EPO-223 | W | 8 |
| 105 | EBARA | CMP | EPO-223 | W | 8 |
| 106 | EBARA | CMP | EPO-223 | W | 8 |
| 107 | EBARA | CMP | F-REX200 | ox | 8 |
| 108 | EBARA | CMP | F-REX300S | W | 12 |
| 109 | EBARA | CMP | F-REX300S | W | 12 |
| 110 | EBARA | CMP | F-REX300S | W | 12 |
| 111 | Fusion | Track | M150 | Dry Etch | 5 |
| 112 | Fusion | Track | M150PC | Lithography | 6 |
| 113 | Fusion | Track | M150PC | Lithography | 6 |
| 114 | GES | CVD | CAYMAN | PESiON | 12 |
| 115 | GES | CVD | CAYMAN | PESiON | 12 |
| 116 | GES | CVD | CAYMAN | PESiON | 12 |
| 117 | GES | CVD | CAYMAN | PESiON | 12 |
| 118 | GES | CVD | CAYMAN | PESiON | 12 |
| 119 | Hitachi | Etch | DM421P | Etch | 8 |
| 120 | Hitachi | FAB ETC | UTS2020 | Lithography | 6 |
| 121 | Hitachi | Metrology | I6300 | Defect Inspection | 12 |
| 122 | Hitachi | Metrology | I6300 | Defect Inspection | 12 |
| 123 | Hitachi | Metrology | IS2700 | Dark Field inspection | 12 |
| 124 | Hitachi | Metrology | RS3000 | DR SEM | 8, 12 |
| 125 | Hitachi | Metrology | RS3000T | DR SEM | 12 |
| 126 | Hitachi | Metrology | RS4000 | DR SEM | 12 |
| 127 | Hitachi | Metrology | RS4000 | DR SEM | 12 |
| 128 | Hitachi | Metrology | RS5000 | DR SEM | 12 |
| 129 | Hitachi | Metrology | S-5200 | FE SEM | – |
| 130 | Hitachi | Metrology | S-9220 | METRO | 8 |
| 131 | Hitachi | Metrology | S-9380II | CD SEM | 12 |
| 132 | Hitachi | Metrology | S-9380II | CD SEM | 12 |
| 133 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
| 134 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
| 135 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 8 |
| 136 | Hitachi Kokusai | Asher | RAM-8500ZX | Asher | 8 |
| 137 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
| 138 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
| 139 | Hitachi Kokusai | Furnace | DD-1206V-DF | Gate OX | 12 |
| 140 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 141 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 142 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 143 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 144 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 145 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 146 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 147 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 148 | Hitachi Kokusai | Furnace | DD-1206V-DF | Oxide undope | 12 |
| 149 | Hitachi Kokusai | Furnace | DD-1206VN-DF | BPSG-ANL | 12 |
| 150 | Hitachi Kokusai | Furnace | DD-1206VN-DF | Oxide undope | 12 |
| 151 | Hitachi Kokusai | Metrology | VR-120SD | Resistivity Measurement | 12 |
| 152 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 6 |
| 153 | JEOL | Metrology | JSM-7401F | FE SEM | 12 |
| 154 | Karl SUSS | Stepper | MA150 | Aligner | 6 |
| 155 | Karl SUSS | Stepper | MA150 | Aligner | 6 |
| 156 | Karl SUSS | Stepper | MA200 | Aligner | 8 |
| 157 | Karl SUSS | Stepper | MA200 | Aligner | 6, 8 |
| 158 | Karl SUSS | Stepper | MA200 | Aligner | 6, 8 |
| 159 | KLA-Tencor | Metrology | AIT Fusion | Dark Field inspection | 8 |
| 160 | KLA-Tencor | Metrology | AIT XUV | Dark Field inspection | 12 |
| 161 | KLA-Tencor | Metrology | Aleris CX | Film thickness measurements | 12 |
| 162 | KLA-Tencor | Metrology | Aleris HX8500 | Thickness Mesurement | 12 |
| 163 | KLA-Tencor | Metrology | Archer 10 AIM+ | Overlay | 12 |
| 164 | KLA-Tencor | Metrology | Archer AIM MPX | Overlay | 12 |
| 165 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
| 166 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
| 167 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 12 |
| 168 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 8 |
| 169 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 8 |
| 170 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 12 |
| 171 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 12 |
| 172 | KLA-Tencor | Metrology | Ergolux | Metrology | 6 |
| 173 | KLA-Tencor | Metrology | INM100+INS10 | Metrology | 6 |
| 174 | KLA-Tencor | Metrology | KLA2371 | Inspection | 8 |
| 175 | KLA-Tencor | Metrology | KLA2552 | Data Review Station | 8 |
| 176 | KLA-Tencor | Metrology | KLA2800 | Bright Filed inspection | 12 |
| 177 | KLA-Tencor | Metrology | KLA5100 | Metrology | 8 |
| 178 | KLA-Tencor | Metrology | LDS3300M | Macro inspection | 8 |
| 179 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | 5 |
| 180 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | 5 |
| 181 | KLA-Tencor | Metrology | MPV-CD | Metrology | 5 |
| 182 | KLA-Tencor | Metrology | NANOMAPPER | Nanotopography | 12 |
| 183 | KLA-Tencor | Metrology | P11 | Profiler | 6 |
| 184 | KLA-Tencor | Metrology | Puma 9000 | Dark field defect Inspection | 12 |
| 185 | KLA-Tencor | Metrology | Puma 9130 | Dark field defect Inspection | 12 |
| 186 | KLA-Tencor | Metrology | SFS7700 | Particle Counter | 5 |
| 187 | KLA-Tencor | Metrology | Surfscan 2.1 | Particle Counter | 5 |
| 188 | Komatsu | Scanner | G20K2-1 | KrF Laser | – |
| 189 | Komatsu | Scanner | G20K2-1 | KrF Laser | – |
| 190 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
| 191 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
| 192 | Komatsu | Scanner | G20K4-1 | KrF Laser | – |
| 193 | Lam | Etch | 2300 Exelan | Oxide | 12 |
| 194 | Lam | Etch | 2300 Exelan Flex | Oxide | 12 |
| 195 | Lam | Etch | R4420 | Oxide | 8 |
| 196 | Lam | Etch | R4420 | Poly | 8 |
| 197 | Lam | Etch | R4520 | Oxide | 8 |
| 198 | Lam | Etch | R4520 | Oxide | 8 |
| 199 | Lam | Etch | TCP9600SE | Metal | 8 |
| 200 | Mattson | Asher | Aspen 2 | Photoresist Stripper | 8 |
| 201 | Mattson | Asher | Aspen 2 | Photoresist Stripper | 8 |
| 202 | Mattson | Asher | Aspen 3 | Light etch, 3LP + 2 chamber | 12 |
| 203 | Mattson | Etch | Paradigme SP | Light Etch | 12 |
| 204 | Mattson | Etch | Paradigme SP | Light Etch | 12 |
| 205 | Mattson | RTP | AST3000 | RTP | 8 |
| 206 | Mattson | RTP | AST3000 | RTP | 12 |
| 207 | Mattson | RTP | AST3000 | RTP | 12 |
| 208 | Mattson | RTP | AST3000 | RTP | 8 |
| 209 | Mattson | RTP | AST3000 | RTP | 12 |
| 210 | Mattson | RTP | AST3000 plus | RTP | 12 |
| 211 | Mattson | RTP | Helios | RTP | 12 |
| 212 | Mattson | RTP | Helios | RTP | 12 |
| 213 | Mattson | RTP | Helios | RTP | 12 |
| 214 | Montair | Etch | Prefurnace clean | General | 5 |
| 215 | Montair | Etch | Wafer etch | General | 5 |
| 216 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
| 217 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
| 218 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 12 |
| 219 | Nanometrics | Metrology | Metra2200M | Overlay | 8 |
| 220 | Nanometrics | Metrology | Metra7200 | Overlay | 8 |
| 221 | Nanometrics | Metrology | NanoSpec 210 | Metrology | 5 |
| 222 | Nikon | Metrology | OPTIPHOT 66 | Microscope | 6 |
| 223 | Nikon | Scanner | NSR-S204B | KrF Scanner | 8 |
| 224 | Nikon | Scanner | NSR-S204B | KrF Scanner | 8 |
| 225 | Nikon | Scanner | NSR-S205C | KrF Scanner | 8 |
| 226 | Nikon | Scanner | NSR-S609B | Scanner | 12 |
| 227 | Nikon | Stepper | NES1-H04 | Mini stepper | 4 |
| 228 | Nikon | Stepper | NSR-2005i10C | i line stepper | 2 |
| 229 | Nikon | Stepper | NSR-2005i9C | i line stepper | 8 |
| 230 | Nikon | Stepper | NSR-2005i9C | i line stepper | 8 |
| 231 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | 8 |
| 232 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | 8 |
| 233 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 8 |
| 234 | Nikon | Stepper | NSR-2205i11D | i-Line stepper | 4 |
| 235 | Nikon | Stepper | NSR-4425i | i-Line | 8 |
| 236 | Nikon | Stepper | NSR-SF120 | i-Line stepper | 12 |
| 237 | Nikon | Stepper | NSR-SF130 | Stepper | 12 |
| 238 | Nikon | Stepper | NSR-TFHEX14C | KrF Stepper | 6 |
| 239 | Novellus | Asher | Gamma2130 | Asher | 12 |
| 240 | Novellus | CVD | C2 Altus | WCVD | 8 |
| 241 | Novellus | CVD | C2 Speed Shrink | HDP | 8 |
| 242 | Novellus | CVD | C2 Speed Shrink | HDP | 8 |
| 243 | Novellus | CVD | C3 Speed MAX | HDP | 12 |
| 244 | Novellus | CVD | C3 Speed NEXT | HDP | 12 |
| 245 | Novellus | CVD | C3 Speed XT | ILD, IMD | 12 |
| 246 | Novellus | CVD | Vector | Passivation SiO2/SiN, BL ARC | 12 |
| 247 | Novellus | CVD | Vector | PESiN/PETEOS | 12 |
| 248 | Novellus | CVD | Vector Express | PESiN/PETEOS | 12 |
| 249 | Novellus | CVD | Vector Extreme | CVD | 12 |
| 250 | Novellus | PVD | Inova | PVD | 8 |
| 251 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
| 252 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
| 253 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
| 254 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
| 255 | Novellus | WET | Sabre XT | Electro Copper Plating | 8 |
| 256 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
| 257 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
| 258 | OAI | Metrology | 358 | Stepper Exposure Analyzer | 6 |
| 259 | Olympus | Metrology | BHMJL | Microscope | 6 |
| 260 | Olympus | Metrology | BHMJL | Microscope | 6 |
| 261 | PSK | Asher | Tera 21 | PR Ashing | 12 |
| 262 | Rudolph/August | Metrology | 3Di8500 | Wafer Inspection | 12 |
| 263 | Rudolph/August | Metrology | Axi-S | Macro inspection | 12 |
| 264 | Rudolph/August | Metrology | Axi-S | Macro Inspection | 12 |
| 265 | Rudolph/August | Metrology | Axi-S | Macro Wafer Inspection | 8 |
| 266 | Rudolph/August | Metrology | FE-IV | Inspection | 8 |
| 267 | Rudolph/August | Metrology | FE-VII | Ellipsometer | 8 |
| 268 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 8 |
| 269 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 8 |
| 270 | Rudolph/August | Metrology | MetaPULSE 300 | Thickness Measurement | 12 |
| 271 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 8 |
| 272 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 8 |
| 273 | SEMES | WET | WS-820L | WET | 8 |
| 274 | Semitool | WET | Raider ECD | Electroplating | 12 |
| 275 | Semitool | WET | Raider ECD | Electroplating | 8 |
| 276 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 5 |
| 277 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 6 |
| 278 | Semitool | WET | SST-F-421-280-FK | Spin Dryer | 6 |
| 279 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 5 |
| 280 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 6 |
| 281 | Semix | Track | TZP | Lithography | 6 |
| 282 | SEZ | WET | SP201 | – | 8 |
| 283 | SEZ | WET | SP201 | – | 8 |
| 284 | SEZ | WET | SP201 | – | 8 |
| 285 | Star | FAB ETC | 2000 Primer | ATV | 5 |
| 286 | Star | FAB ETC | 2000 Primer | General | 5 |
| 287 | Surftens | Metrology | Measurement | Metrology | 6 |
| 288 | SVG | Furnace | 5204 | Diffusion | 5 |
| 289 | SVG | Furnace | 5204 | Diffusion | 5 |
| 290 | TEL | CVD | Trias | ALD TiN | 12 |
| 291 | TEL | CVD | Trias | CVD TiN | 12 |
| 292 | TEL | CVD | Trias | Metal | 12 |
| 293 | TEL | CVD | Trias SPA | CVD | 12 |
| 294 | TEL | CVD | Trias SPA | CVD | 12 |
| 295 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 296 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 297 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 298 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 299 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 300 | TEL | Etch | Telius SCCM Shin | Oxide | 12 |
| 301 | TEL | Furnace | Alpha-303i-H | D-Poly | 12 |
| 302 | TEL | Furnace | Alpha-303i-H | D-Poly | 12 |
| 303 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
| 304 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
| 305 | TEL | Furnace | Alpha-303i-H | MTO | 12 |
| 306 | TEL | Furnace | Alpha-303i-K | DCS MTO | 12 |
| 307 | TEL | Furnace | Alpha-303i-K | HTO/SiN | 12 |
| 308 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
| 309 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
| 310 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
| 311 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
| 312 | TEL | Furnace | Alpha-303i-K | MTO | 12 |
| 313 | TEL | Furnace | Alpha-303i-K | PIQ | 12 |
| 314 | TEL | Furnace | Alpha-303i-K | Poly | 12 |
| 315 | TEL | Furnace | Alpha-303i-K | TEOS | 12 |
| 316 | TEL | Furnace | Formula | Nit | 12 |
| 317 | TEL | Furnace | Formula | Nit | 12 |
| 318 | TEL | Furnace | Formula | SiGe-POLY | 12 |
| 319 | TEL | Furnace | Indy-A | DCS Nit | 12 |
| 320 | TEL | Furnace | Indy-A | DCS Nit | 12 |
| 321 | TEL | Furnace | Indy-B | DIFF | 12 |
| 322 | TEL | PVD | MarkIV | Metal sputter | 8 |
| 323 | TEL | Track | ACT12 | COT/DEV | 8 |
| 324 | TEL | Track | ACT12 | COT/DEV | 12 |
| 325 | TEL | Track | ACT12 | COT/DEV | 12 |
| 326 | TEL | Track | ACT12 | COT/DEV | 12 |
| 327 | TEL | Track | ACT8 | COT/DEV | 8 |
| 328 | TEL | Track | ACT8 | COT/DEV | 8 |
| 329 | TEL | Track | ACT8 | COT/DEV | 6 |
| 330 | TEL | Track | LITHIUS | – | 12 |
| 331 | TEL | Track | LITHIUS | – | 12 |
| 332 | TEL | Track | LITHIUS | – | 12 |
| 333 | TEL | Track | LITHIUS | – | 12 |
| 334 | TEL | Track | LITHIUS | – | 12 |
| 335 | TEL | Track | LITHIUS | – | 12 |
| 336 | TEL | Track | LITHIUS | – | 12 |
| 337 | TEL | Track | LITHIUS | – | – |
| 338 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 339 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 340 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 341 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 342 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 343 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 344 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 345 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 346 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 347 | TEL | Track | LITHIUS | COT/DEV | 12 |
| 348 | TEL | Track | LITHIUS i+ | – | 8 |
| 349 | TEL | Track | LITHIUS i+ | COT/DEV | 12 |
| 350 | TEL | Track | Mark7 | COT/DEV | 8 |
| 351 | TEL | Track | Mark7 | COT/DEV | 8 |
| 352 | TEL | Track | NS300 | Scrubber | 12 |
| 353 | TEL | Track | NS300 | Scrubber | 12 |
| 354 | TEL | Track | NS300 | Scrubber | 12 |
| 355 | Ultratech | Stepper | 1500 | Lithography | 6 |
| 356 | Ultratech | Stepper | 1500 | Lithography | 6 |
| 357 | Ultratech | Stepper | 1500 | Lithography | 6 |
| 358 | Ulvac | PVD | Ceraus Z-1000 | PVD | 8 |
| 359 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
| 360 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
| 361 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
| 362 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 8 |
| 363 | Ulvac | PVD | Entron EX | PVD | 12 |
| 364 | Ulvac | PVD | Entron EX W300 | PVD | 12 |
| 365 | Ulvac | PVD | Entron EX W300 | PVD | 12 |
| 366 | Ulvac | PVD | Entron S | PVD | 12 |
| 367 | Ulvac | PVD | Entron T | PVD | 12 |
| 368 | UNAXIS | PVD | LLS900 | PVD | 8 |
| 369 | Ushio | Track | UMA-1002-HC93FS | Stabilizer | 8 |
| 370 | Ushio | Track | UMA-1002-HC93FWL | Stabilizer | 8 |
| 371 | Varian | PVD | 3290 | PVD | 6 |
| 372 | Veeco | Metrology | Dimension X3D | AFM | 12 |
| 373 | WONIK IPS | CVD | MAHA SP | PTEOS | 12 |
| 374 | Yield Engineering System | FAB ETC | YES-5 | Lithography | 6 |
| 375 | Yield Engineering System | FAB ETC | YES-5E | Lithography | 6 |
| 376 | Yield Engineering System | FAB ETC | YES-5E | Lithography | 6 |
SS5684














