Description
SOLD
TYSTAR RESEARCH GRADE TYTAN 1600 LP-CVD FURNACE
TYSTAR RESEARCH GRADE TYTAN 1600 LP-CVD FURNACE 6″ WAFER w QUARTZ CHAMBER (NANO)
TYSTAR CHEMICAL VAPOUR DEPOSITION CVD CHAMBER
Research Grade Chemical Vapor Deposition Furnace.
Excellent for University Research NanoLab installations.
The TyStar Tytan Mini Furnace Systems are designed for diffusion, oxidation and LPCVD applications. The systems require considerably less floor space and electrical power than conventional furnaces of equal capacity. The Mini tools are used both in the semiconductor / MEMS industry and in the R&D University community. They offer superior performance and process uniformity. The design incorporates several of the most advanced concepts required for high performance wafer processing tools.
6″ Wafer Size
1 Tube
100ATM / 50LPCVD Wafers Per Tube (wafers not included)
18″ Flat Zone
18 kVA Max Power
The following components are included in this sale:
- Tytan 1600 Mini Furnace
- FCS 10 Process Controller
- MFS-460 Electronic Gas Control System
- Quartz Chamber
- Spare 907203-001 Tube Computer Board PCB Assembly
- Connection Cables
- Manuals
- Schematics
- Reference Guide
Valid Time: Subject to prior sale without notice.
SS32201940008
