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Branson IPC 3000

The Branson IPC 3000 Plasma Systems generate a low pressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The Branson/IPC 3000 comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.

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Product Description

Model: Branson IPC 3000  semiconductor process equipment

Category:  Plasma Asher Plasma Descum

Original Equipment ManufacturerBranson/IPC 

Condition: Complete, Working condition.The system was de-installed from a Fab in USA in May, 2016.

Wafer Size: 2-8 inch capability

Controller: Allwin21 PC controller

Gas line: O2 with MFC. Three gas lines capability.

Valid Time: Subject to prior sale

Lead Time: Ready to go

Location: Silicon Valley, CA, U.S.A.

Warranty: N/A

Installation and training: Available at extra charge at refurbish condition

Service Contract: Available at extra charge at refurbish condition

Branson IPC 3000 description for reference

 
The Branson IPC 3000 Plasma Systems generate a low pressure, low temperature gaseous plasma. In this machine plasma reactions, such as ashing, etching, and polymer surface modification can be performed quickly and reproducibly. The Branson/IPC 3000 comprises a source of RF electrical power, means for coupling the RF power into the plasma treatment chambers, and a system to control the flow of reactant plasma gases.

The reactor treatment chambers vary from model to model in this series. Each chamber has a hinged access door through which samples are inserted or removed. The door is sealed with a bell jar gasket. The RF generator in this series provides RF power, dynamically regulated to maintain constant level into a normal load or to limit power output if the load is removed. 

Two seperate units are provided which are interconnected by gas hoses and electrical cables. These are the RF GENERATOR and the REACTOR CENTER. The REACTOR CENiER contains the Reactor Chambers, the Gas Controls, RF Power Matching Controls, and Timer. 

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All the Branson/IPC 3100S Plasma Asher Plasma Descum  semiconductor process equipment trademarks belongs to Branson/IPC, the original equipment manufacturer. All rights reserved. 

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