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Edwards Auto 500 Turbo

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Edwards Auto 500 Turbo Three Target RF Sputtering System Thin Film Deposition

The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction.

The chamber is mounted on a pedestal, housing the pumping stack.

A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories.

Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia.

Rotating Substrate Carrier: 11 in. dia.

Includes RF etch.

Crystal film thickness monitor.

Turbo pump with controller and roughing pump.

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