Description
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Edwards Auto 500 Turbo Three Target RF Sputtering System Thin Film Deposition
The Auto 500 box chamber system is a versatile front loading thin film system for Research & Development or preproduction.
The chamber is mounted on a pedestal, housing the pumping stack.
A rack panel next to the vacuum pedestal houses controls for vacuum and all thin film processes accessories.
Three RF magnetron cathodes, two are 4 in. dia. and one is 3 in. dia.
Rotating Substrate Carrier: 11 in. dia.
Includes RF etch.
Crystal film thickness monitor.
Turbo pump with controller and roughing pump.
SS262424293891














