Description
Oxford Instruments 133 ICP with 380 Source – Ion Couple Plasma Etching System
Oxford Instruments 133 ICP – Ion Couple Plasma Etching System with 380 ICP Source, Manual Load Lock, Ceramic Clamp style ICP system, Alcatel Turbo pump with controller, VAT Gate Valve with PM5 cotroller, Endpoint Detector, RF power supply with match work and tuner, Currently eight Mass Flow Controllers
SS182081685033
