Description
Please contact us for the availability of the Ulvac NE 7800 Ferroelectric Etcher 200mm used Semiconductor Equipment.
| Manufacturer | Ulvac |
| Model | NE 7800 Ferroelectric Etcher |
| Wafer Size Range |  |
| Minimum | 150 mm |
| Maximum | 200 mm |
| Set Size | 200 mm |
| Number of Chambers | 4 |
| Process Capabilities | Ta, FeRAM, RRAM, MRAM |
| Chamber 1 Description | Preheat Chamber IR heater Range: 200 to 600 deg C |
| Chamber 2 Description | ISM ICP Etch ESD Chuck, 450C, He BS Cooling Bias power: 2000W, 400 KHz Antenna power: 3000W, 13.56 MHZ UTM 1400FW/DIK Turbo Pump Ebara ESR20N Dry Pump Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3 |
| Chamber 3 Description | ISM ICP Etch ESD Chuck, He BS Cooling Bias power: 2000W, 400 KHz Antenna power: 3000W, 13.56 MHZ UTM 1400FW/DIK Turbo Pump Ebara ESR20N Dry Pump Gases: Ar, O2, SF6, C4F8, HBr, CL2, BCl3, CHF3 |
| Chamber 4 Description | Microwave Ashing Chamber Heated Chuck, 280C Bias power: 600W, 13.56 MHz Microwave power: 3000W, 2.45 GHz Endpoint detection Ebara ESR200WN Dry Pump Gases: 02, 02, H2/N2, CF4, N2 |
| External Cooling | Water Cooled |
| Other Information | (3) Cassette load ports (2) SMC Corp Model HRZ002 Chiller-Etch Chambers (1) Ebara ESR20N dry pump, loadlock/xfer mod |
| Extended Description | Details at NE7800_BK1_CHP02.pdf |
| Power Requirements | 208 V 220.0 A 60 Hz 3 Phase |
The items are subject to prior sale without notice. These items are only for end users.
SS5732
