Description
Please contact us for the availability of the Sharon Vacuum Sputtering System used Semiconductor Equipment.
| Manufacturer | Sharon Vacuum |
| Model | Sputtering System |
| Description | Sputtering System |
| Vacuum System | Cryo Pumped |
| Vacuum System | Leybold D40B Mechanical Pump CTI Cryotorr 8 with CTI 8200 Compressor MKS Series 600 Pressure Controller (3) MKS MFC’s: N2 200 SCCM, O2 200 SCCM, Ar 200 SCCM Meivac Model VQ6ASAUSM Throttle Valve MKS 627B 1 Torr range capacitance manometer |
| Load Lock Included | No |
| Number of Cathodes | Three |
| Target Size | 6″ |
| Quantity of DC Cathodes | 2 |
| Quantity of RF Cathodes | 1 |
| Number of RF Etch Cathodes | 0 |
| Gas Inputs | Three |
| Gas Input Control | Mass Flow Controllers |
| Substrate Heaters | No |
| Residual Gas Analyzer | No |
| RF Generator |  |
| Manufacturer | Advanced Energy |
| Model | RFXII 1250 |
| Rated Power Output | 1250 Watts |
| Matching Network | Yes |
| Accessories | All sputtering sources are magnetrons. |
| Other Information | Manual/Automatic pump down control Commonwealth Scientific 8″ gridded ion source. Sycon Model STM-100/MF thickness/rate monitor Lake Shore Modle 818 Cryopump Monitor Advanced Energy MDX 5K Magnetron Drive Advanced Energy AZX 90 Tuner Rotary substrate holder(holds up to 8″ substrate) Interior Chamber Dimensions: 21.5″ x 21.5″ x 21.5″ |
| Power Requirements | 240 V 80.0 A 60 Hz 3 Phase |
The items are subject to prior sale without notice. These items are only for end users.
SS5732
