Description
Please contact us if you are interested in the following Semiconductor equipment in Bay Area,California,USA. These items are only for end users and are subject to sale without notice. Appreciate your time.
| 1 | Alcatel | Alcatel, AMS 4200, Deep Reactive Ion Etch (DRIE) | AMS 4200 | Deep RIE | Alcatel |
| 2 | Angstrom | Angstrom Sun Technologies Transmission | Spectroscopic Ellipsometer | Metrology | Angstrom |
| 3 | Applied Material | AMAT Applied Materials Precision 5000 Nitride PARC, 4 chamber, CVD tool, 8 inch, | P-5000 | USG, SiN | AMAT |
| 4 | Applied Material | AMAT P5000 SACVD tool, 8 inch, 3 chamber, Robot, Storage Elevator, 3 Ozone Generator, 3 RF Generator, Chemical gas Cabinet, PLIS system | P-5000 | USG, BPSG | AMAT |
| 5 | Applied Material | 8115 AMAT | 8115 | Oxide Etch | AMAT |
| 6 | Applied Material | 8310 PLASMA ETCHER | 8310 | Metal Etch | AMAT |
| 7 | Applied Material | 8330 (AMAT METAL ETCHER) | 8330 | Metal Etch | AMAT |
| 8 | Applied Material | 8330 (AMAT METAL ETCHER) | 8330 | Metal Etch | AMAT |
| 9 | ASM International | ASM Eagle XP12 Rapid-Fire PECVD tool, 3 Chamber, 300 mm | Eagle XP12 Rapid-Fire | PECVD Oxide | ASM International |
| 10 | ASM International | ASM Eagle XP12 Rapid-Fire PECVD tool, 3 Chamber, 300 mm | Eagle XP12 Rapid-Fire | PECVD Oxide | ASM International |
| 11 | ASML SVG Track | SVG 90 S Coat and Develop Track System, Size: 6” and can run 8” Wafers, (4) Chill Plates, (5) Hot Plates, Full Enclosure, HDMS Module, Microbar Trackmate 4-Port Chemical Delivery Cabinet Manual Control Unit. | SVG 90 S | Resist Coater, Developer | ASML / SVG |
| 12 | ATMI | VECTOR Scrubber, facility tool | SCRUBBER | Facility | ATMI |
| 13 | AXIC | AXIC 1000 XRF, Metal Thickness measurement tool | 1000 XRF | Metrology | AXIC |
| 14 | Chemcut | Chemcut’s Model 2315D Spray Resist Develop system | Model 2315D | Litho | Chemcut |
| 15 | Chemcut | Chemcut’s Model 2315S Spray Resist Strip system | Model 2315S | Litho | Chemcut |
| 16 | Cincinnati Sub-Zero | CSZ Cincinnati Sub-Zero Temperature Environmental Chamber ZHS-8-1-1-H/AC | ZHS-8-1-1-H/AC | Chip, PCB Testing | Cincinnati Sub-Zero |
| 17 | CPA | Sputtering, PVD tool, 4 target chamber, 2 Loadlock | CPA | PVD, Sputter | CPA |
| 18 | Credence | Credence STS 4020 chip test system | STS 4020 | test | Credence |
| 19 | Delatech | Delatech 858 V-2 scrubber | 858 | Facility | Delatech |
| 20 | Delta Design | Delta Design Summit ATC 1909177 P&P Handler w/ Affinity Chiller PWG-060K-BE44CBD2 | Summit ATC | Chip Testing | Delta Design |
| 21 | DNS | Track, developer tool, Developer rack, power rack | DNS 80A | Litho | DNS |
| 22 | ESMO FAM Cart | ESMO FAM Cart Failure Analytical Manipulator Cart adapted for Advantest T2000 | ESMO FAM Cart | Tester Cart | ESMO FAM |
| 23 | Fusion | Fusion Semiconductor G03 Ozone Asher. Dual chamber, Dual robot arm | G03 | Asher | Fusion |
| 24 | Gasonics | Gasonic IPC Asher 2000LL Plasma Asher Etch System cassette to Cassette Automatic | 2000LL | Asher | Gasonics |
| 25 | Gasonics | GaSonics 9104 Quartz Chamber Plasma Asher 15698-02, ENI OEM-12B-06 RF Generator | 9104 | Etch / Asher | Gasonics |
| 26 | Jandel | Jandel Four Point Probe | RM 3000 | Metrology | Jandel |
| 27 | Kaijo | Wire Bonder | Chip Assembly | Kaijo | |
| 28 | Karl Suss MA 200 | Karl Suss MA 200 Litho Mask Aligner 200mm wafer 210AA057-03, Suss Microtec | MA 200 | Litho | Karl Suss |
| 29 | Karl Suss PA 200 | PA 200 Prober manipulator | PA 200 | Prober | Karl Suss |
| 30 | Keithley | Keithley Digital Source Meter 2400 | Keithley #2400 | Metrology | Keithley |
| 31 | KLA | KLA Tencor 5107 Overlay Inspection System, KLA 5100 series | KLA | Metrology | KLA |
| 32 | KLA Tencor | KLA Tencor Flex2320 Stress measurement, | 2320 | Metrology | KLA |
| 33 | Kullicke & Soffa | 1488 plus, Wire Bonder | 1488 | Chip Assembly | Kullicke & Soffa |
| 34 | LAM | 4400 (LAM RAINBOW POLY ETCH) | ETCHER | Poly Etch | LAM |
| 35 | LAM | 4500 (LAM RAINBOW OXIDE ETCH) | ETCHER | Oxide Etch | LAM |
| 36 | LAM | 4500 (LAM RAINBOW OXIDE ETCH) | ETCHER | Oxide Etch | LAM |
| 37 | LAM | 490 (LAM AUTO ETCHER) | AUTO ETCH | Metal Etch | LAM |
| 38 | LAM | 490 (LAM AUTO ETCHER) | AUTO ETCH | Metal Etch | LAM |
| 39 | LAM | 495 (LAM AUTO ETCHER) | AUTO ETCH | Metal Etch | LAM |
| 40 | LAM | 495 (LAM AUTO ETCHER), computer Base, RF Generator, Chiller | AUTO ETCH | Metal Etch | LAM |
| 41 | Laurel | Laurel Spin Coater (200 mm wafer) | Laurel Spin Coater 200mm | Litho | Laurel |
| 42 | Leica | Leica INM20 Trinocular Microscope Wafer Inspection & 5 objective W/ DIC Optics | INM20 | Metrology | Leica |
| 43 | Mattson | Process chambers Module with LF10 and RF30S RF generators qty =8 | Chamber | Etch/deposition | Mattson |
| 44 | Mattson | Process chambers Module with New power plasma RPS Qty = 2 | Chamber | Etch/deposition | Mattson |
| 45 | Metara | Metara LMS-300 TCA Trace Contaminant Analysis Tool | LMS 300 | Metrology | Metara |
| 46 | Micro Tech Screen Printer | Micro tech printer | Screen Printer | Micro Tech Screen Printer | |
| 47 | Modo | Modo LS-200F-10 UV Light Source | Modo LS-200F-10 | Metrology | Modo |
| 48 | Modutek | Modutek 6′ WPS Wet Processing Bench, Station, C14506-9500, C14506-8000, PVDF | WPS | Wafer Cleaning | Modutek |
| 49 | MTS MARANGONI | MTS MARANGONI Dryer | MTS MARANGONI | MTS MARANGONI | |
| 50 | MTS Wet Bench | MTS Wet Bench (Texture) | 8 ft – 3 process tanks | Wet Bench | MTS Wet Bench |
| 51 | MTS Wet Bench | MTS Wet Bench (Final Clean) | 8 ft – 4 process tanks | Wet Bench | MTS Wet Bench |
| 52 | Nanometrics | Nanometrics 50-2 CD Measurement System, 3″ to 6″ Wafers, 10x Eyepieces – 5x, 10x, 40x Objectives, Includes Nanoline Computer Controller, Monitor, Keyboard | 50-2 CD | CD Measurement | Nanometrics |
| 53 | Nanometrics | Nanometrics NANOSPEC 8300X Wafer thickness measurement tool | 8300 | Metrology | NANOSPEC |
| 54 | Nikon | Nikon NSR-2005i8A , some missing PCB | NSR-2005i8A | Litho Stepper | Nikon |
| 55 | Pacific western Systems | P5MS Wafer Prober, tester, power supply | P5MS | Metrology | PWS |
| 56 | Pacific western Systems | P5MS Wafer Prober, tester, power supply | P5MS | Metrology | PWS |
| 57 | PAL Custom Bench Plating | Cu/Sn Plating tool | PAL Custom Bench | Sn Marking | PAL Custom Bench Plating |
| 58 | Perk-Elmer 4450 | Perk-Elmer 4450 Sputtering System (Delta target) | PE 4450 | PVD. Sputter | Perk-Elmer |
| 59 | Plasmatherm | Plasmatherm SL-730 PECVD equipment, SL730 CVD processing tool | SL-730 | USG | Plasmatherm |
| 60 | Quincy | Quincy Compressor Model QGS-30 | Model QGS-30 | Facility | Quincy |
| 61 | Ransco | Ransco Despatch Fast Rate Cycling Chamber Oven with LN2 low pressure injection | Temp Cycle Oven | Chip, PCB Testing | Ransco |
| 62 | Rofin | Rofin Laser scribe-EasyScribe F20 | EasyScribe F20 | Laser Marking | Rofin |
| 63 | Rudolph | Rudolph FE-3 Focus Ellipsometer, 4″ 6″ 8″ capable | FE-3 | Metrology | Rudolph |
| 64 | RUDOLPH | Rudolph Technologies AutoEL Automatic Ellipsometer Model IV-NIR-3, SS1, 4E, | AUTO EL | Metrology | RUDOLPH TECH. |
| 65 | Semiconductor Diagnostics SDI 210 | Semiconductor Diagnostics SDI 210, 210E-SPV, FAaST, Wafer Measurement. | SDI 210, 210E-SPV, FAaST, | Metrology | Semiconductor Diagnostics SDI |
| 66 | SEMITOOL | SEMITOOL Polymer Remover, 2 chamber, chemical cabinet, Fire Suppression system | SSTC742280K | Polymer Remover | SEMITOOL |
| 67 | SEMITOOL | Semitool SST408 Solvent Chemical Stripping Resist Remover Tool, SST, 6 inch wafer, 2 chemcial tank | SST408 | Resist Remove | SEMITOOL |
| 68 | SEMITOOL | Semitool SSTF42120F Solvent Chemical Stripping Resist Remover Tool, 6 Inc wafer, 2 chemical tank | SSTF42120F | Resist Remove | SEMITOOL |
| 69 | Signatone/Alessy | Signatone LYI S 250-6 Prober manipulator with Alessi microscope | LYI-S250-6 | Metrology | Signatone |
| 70 | Sinton | Sinton Lifetime/SunsVoc tester System | Sinton WCT-120 ( Suns-Voc) | Metrology | Sinton |
| 71 | Technical Instruments | AMS 310 Mask Inspection tool | AMS 310 | Metrology | |
| 72 | Testequity | Temperature cycling chamber | Model 115 | cycling Marking | Testequity |
| 73 | Testequity | Temperature/Humidity Chamber Testequity 123H | Model TH123H | Humidity Marking | Testequity |
| 74 | THERMO SCIENTIFIC | THERMO SCIENTIFIC 6700 FTIR | MEASURE | Metrology | THERMO SCIENTIFIC |
| 75 | VAC Glove BOX | VAC Glove box (8 ft) | VAC Nexus | VAC Glove BOX | |
| 76 | Vacuum Oven | Vacuum Oven WC-01 | Vacuum Oven | Vacuum Oven | |
| 77 | VBS | Auto Dewar system | ADF10B | Facilities | VBS europe |
| 78 | Vecco DEKTAK | Vecco DEKTAK SXM Atomic Force Microscope | SXM Atomic Force Microscope | Metrology | Vecco DEKTAK |
| 79 | Wentworth Lab | Wentworth Lab 0-043-0001 Prober, Lamp, 8″ Wafer Chuck Temptronic TP03000A-2300-1 | 0-043-0001 | Prober | Wentworth Lab |
| 80 | ZEISS AIMS | ZEISS AIMS 193 Mask Qualification System w/Coherent LDU ESI 500Hz FT 193nm | AIMS 193 | Metrology | Karl Zeuss |
| 81 | Zygo | Zygo KMS 450i Mask Inspection tool | KMS 450i | Metrology | Zygo |
SS6305
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