Description
Please contact us for the availability of the Plasma-Therm Wafer Batch 740/740 RIE Plasma Etch System used Semiconductor Equipment.
| Manufacturer | Plasma-Therm |
| Model | Wafer Batch 740/740 |
| Wafer Size Range |  |
| Minimum | 100 mm |
| Maximum | 200 mm |
| Process | Plasma and Reactive Ion Etch |
| Controller Type | Microprocessor Controller Type |
The items are subject to prior sale without notice. These items are only for end users.
SS5732
