Description
Please contact us for the availability of the Plasma-Therm 790 RIE Reactive Ion Etch System used Semiconductor Equipment.
| Manufacturer | Plasma-Therm |
| Model | 790 11 RIE |
| Wafer Size Range |  |
| Minimum | 50 mm |
| Maximum | 200 mm |
| Process | Reactive Ion Etch System |
| Controller Type | PC Controller Type |
The items are subject to prior sale without notice. These items are only for end users.
SS5732
