Oxford Instruments Plasmalab 80 Plus Reactive Ion Etch RIE System

Oxford Instruments Plasmalab 80 Plus Reactive Ion Etch RIE System, Refurbished system, Morgan Hill, CA USA, RF Generator Dressler HiLight 133 – 300 Watt

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Description

Model: Oxford Instruments Plasmalab 80 Plus Reactive Ion Etch RIE System

Category: RIE

Original Equipment Manufacturer: Oxford

Condition:Refurbished

Price: Please contact us.

Valid Time: Subject to prior sale without notice

Lead Time: 8-12 weeks depending on PO time

Location: U.S.A.

Warranty: 7 months

Oxford Instruments Plasmalab 80 Plus Reactive Ion Etch RIE System

Specifications:

Process: Reactive Ion Etch
RF Generator Dressler HiLight 133 – 300 Watt, 13.56 MHz
Automatch Text: Oxford OPT AMU
Neslab RTE 7 Chiller or equivalent,No warranty
Vacuum Pump Package: Leybold WSU 251 and Leybold D40BCS or equivalent,No warranty
Power requirements: 208 V, 26 A, 50/60 Hz, 3 Phase
Wafer size: 200 mm maximum
Controller type: PC Controller
Software revision level: PC2000 Version 1.7A
Number of gas inputs: 3
Process gases: CF4, O2, Air
Gas Pod: 6 gas inputs (3 inputs in use)