Description
Please contact us for the availability of the MRC 903M RF Sputter, Etch, 3 Target used Semiconductor Equipment.
| Manufacturer | MRC |
| Model | 903M |
| Description | RF Sputter, Etch, 3 Target |
| Vacuum System | Cryo Pumped |
| Vacuum System | CTI Cryotorr 8 |
| Load Lock Included | Yes |
| Target Size | 5″ x 15″ |
| Quantity of RF Cathodes | 3 |
| Number of RF Etch Cathodes | 1 |
| Substrate Heaters | No |
| Other Information | MKS 252 Exhaust valve controller. RGA not included(optional) |
| Power Requirements | 208 V 100.0 A 60 Hz 3 Phase |
The items are subject to prior sale without notice. These items are only for end users.
SS5732
