Description
Please contact us for the availability of the Mill Lane Eng Dual Chamber Research Sputtering System used Semiconductor Equipment.
System Consist of Two Chambers Segregated by a rectangular Gate Valve With a Specimen Transfer System
Chamber ‘A’ Ion Milling Turbo Pumped
Chamber size: 23″W x 28.5″D x 9″H
Chamber Access: Doors on Front and Side of Chamber
Two vacant 6″ ports top of chamber,one KF 40 rear of chamber,
Specimen Transfer: Gear Driven Chamber to Chamber
Ion Mill: Commonwealth 3CM Ion Source
Turbo Pump: Varian TV 250
Vacuum Gauges: Ion and Thermocouple
Chamber Heat: 1000 Watt Quartz Heater
Chamber view port: 3″
Specimen Rotation
Specimen Platten #1 18.5″ Diameter,Four 5″ Wafers Plus four detents for 4″, 2.5″ and 3″ Wafers
Specimen Platten #2 18.5″ Diameter, Four 6″ Wafers
Two above platens supplied with system
Chamber ‘B’ Sputtering Cryo Pumped
Chamber size: 23″W x 28.5″D x 9″H
Chamber Access: Doors on Front and Side of Chamber
Two Vacant KF 40 Ports top of Chamber,Four 1″Dia. ports bottom of chamber
Chamber view port: 3″
Specimen Rotation
Motorized Shutter
Vacuum Gauges: Ion and Thermocouple
Cryo Pump: CTI Cryogenics Cryo Torr 8
Compressor: CTI Cryogenics 8200
Cathodes: Five Siera Applied Sciences 6″ DC Magnetron
Control Components
Commonwealth IBS 250 Ion Source Controller
Varian Dual Gauge Controller
Varian V250 Turbo Pump Controller
Pinnacle DC Magnatron Drive
The items are subject to prior sale without notice. These items are only for end users.
SS5732
