Applied Materials P5000 PECVD

Description

Please contact us for the availability of the Applied Materials P5000 PECVD used Semiconductor Equipment.

Manufacturer	Applied Materials
Model	P5000
Wafer Size Range
Minimum	100 mm
Maximum	200 mm
Set Size	100 mm
Number of Chambers	3
Process Capabilities	Can be configured to your specifications
Chamber 1 Description	MxP Etch chamber configured for 100mm clamped Oxide process. Leybold Mag lev Turbo pump Phase IV RF match Heated gate valve/throttle valve ENI OEM 12 RF Generator Can be configured from 100-200mm.<
Chamber 2 Description	MxP Etch chamber configured for 100mm clamped Poly process. Leybold Mag lev Turbo pump Phase IV RF match Heated gate valve/throttle valve ENI OEM 12 RF Generator. Can be configured from 100-200mm.
Chamber 3 Description	N/A
Chamber 4 Description	Standard Lamp Heated (100-150mm capable) Configured for 100mm Nitride Process. Includes DPA and DPA generator Phase IV RF match ENI OEM 12 RF Generator Can be configured from 100-150mm.
Chamber 5 Description	N/A
Chamber 6 Description	N/A
Controller Type	VME
Elevator Type	8 Slot
Reduced Pressure	YES
Accessories	Includes Modular Remote Frame.
Power Requirements	240 V     200.0 A     50/60 Hz     3 Phase

The items are subject to prior sale without notice. These items are only for end users.

SS5732