Description

150mm STS Multiplex ICP AOE Pro

Info from the owner:

USA based end-user customer.
De-installed STS Multiplex ICP AOE Pro.
The system was in normal operation in an R&D capacity for shallow and deep etching.
The tool had no known issues when taken out of service a couple months ago when their new tool arrived.
STS Multiplex ICP AOE Pro Advanced Oxide Etcher (AOE)
Configured: 100mm, 150mm
Etched: SiO2, quartz, Pyrex, fused silica, Si3N4, bulk silicon
Masks: Si, PR & Metals (Cr, Ti, Ni)
3000W 13.56MHz AE – Coil
1000W 13.56MHz ENI
Platen Backside Helium Cooling with Standard 8-pin clamp & lip seal
C4F8, SF6, O2, H2, CF4, two open gas slots
2-80mT Process Pressure
Platen -20°C to 120°C, Walls 100°C, Lid 120°C
2.5µm isolated trenches on 8-10µm TEOS
Etch rate greater than 2000Å/min SiO2, greater than 4:1 selectivity SiO2: PR, etch rate variability intra- and inter-wafer ±3%, sidewalls 85-90°
5µm features on 3-10µm SiO2
Etch rate greater than 3000Å/min SiO2, greater than 7.5:1 selectivity SiO2:PR, etch rate variability intra- and inter-wafer ±2%, sidewalls 89-90°
Converted to 100mm w/ ceramic parts (from quartz)
Condition: Complete / Working at removal
Status: De-installed

OEM-40