Used Semiconductor Equipment

Description

Condition: Used. We sell them at AS IS

Valid: Subject to prior payment/sale without notice. This is only for end users. Appreciate your time!

The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers.

1	ASM AMERICA INC	EAGLE 12	ILD TOOL, CU
2	ASM AMERICA INC	EAGLE XP8	4DC1, 3LP ALD TOOL
3	ASM AMERICA INC	XP	DEP TOOL
4	ASML US, LLC	MDR-100	Mount/Demount/Remount Tool
5	ASML US, LLC	RWT-100	Stud Removal/Detach Tool
6	ASML US, LLC	SFT-100	Stud Fixation Tool
7	ASML US, LLC	YIELDSTAR-S375	METROLOGY
8	AXCELIS TECHNOLOGIES, INC.	PS3	CURE, DUAL CHAMBER
9	CAMECA	SHALLOW PROBE	EPI DOPANT CONCENT, NC PF-12
10	CARL ZEISS SBE, LLC	PROVE	REGISTRATION & OPTICAL CD
11	ECI TECHNOLOGY	QL10	Cu monitoring w/CVS and opt. titration
12	ENTEGRIS	A7000AD	OPTICAL PARTICLE SIZE ANALYZER
13	FORTREND ENGINEERING CORP	LAMINA 203	MASK HANDLING TOOL
14	HITACHI HIGH-TECH AMERICA, INC	CG4000	CD SEM
15	HITACHI HIGH-TECH AMERICA, INC	CG5000	ADVANCED CD SEM, CU
16	HITACHI HIGH-TECH AMERICA, INC	LS-9300	BW INSPECTION
17	HORIBA INSTRUMENTS INCORPORATE	PR-PD2-BLI	HIGH SENSITIVITY/THRUPUT BLANKS INSP SYS
18	KLA CORPORATION	A200	REG TOOL, CU
19	KLA CORPORATION	A500	ADVANCED REG TOOL, CU
20	KLA CORPORATION	LCM-2	ADV. LI SCATTEROMETRY TOOL
21	KLA CORPORATION	M62DD	PATTERN INSPECTION A
22	KLA CORPORATION	SLF17	RETICLE INSPECTION
23	KLA CORPORATION	ZSS ATL150I	ADVANCED REG TOOL, IBO
24	KOKUSAI SEMICONDUCTOR EQUIPMENT	QUIXACE II	1 TUBE LPCVD CSOD 300MM, CU
25	LAM RESEARCH CORPORATION	GAMMA 2130	RESIST CLEAN, CU
26	LAM RESEARCH CORPORATION	SABRE VPM	ELECTROPLATER
27	LAM RESEARCH CORPORATION	VECTOR	CVD, CU
28	LASERTEC U.S.A., INC.	BC10	EUV MASK BACKSIDE REPAIR SYSTEM
29	LASERTEC U.S.A., INC.	BD100	RETICLE VISUALIZATION HANDLER
30	METTLER TOLEDO INC	DSC 2+	Thermal Analysis System Flash
31	NBS TECHNOLOGIES SAS	WPC EVO2	Automatic wafer packing system
32	NIKON INSTRUMENTS INC	OPTI VII	MICRO/MACRO INS SCOPE, C4, BOW
33	NIKON METROLOGY, INC	VMZ-K6555	Probe Card Inspection
34	NITTO DENKO CORPORATION	HR8500III-TW	De-tape Little Wafer, 3in
35	NUFLARE TECHNOLOGY, INC	EBM-8000	EBEAM 8000
36	ONTO INNOVATION INC (DBA NANOMETRICS)	ATLAS XP	METROLOGY TOOL
37	ONTO INNOVATION INC (DBA NANOMETRICS)	FLX-9010B	POLISH THICKNESS MEASURE
38	ONTO INNOVATION INC (DBA NANOMETRICS)	NANOSPEC 8300X	TF MEASURE TOOL
39	REVASUM, INC	6EG	POLISHER
40	RITE TRACK EQUIPMENT SERVICES	CV9812	FOUP METROLOGY
41	RUDOLPH TECHNOLOGIES, INC.	METAPULSE 300	FILM THICKNESS
42	RUDOLPH TECHNOLOGIES, INC.	NSX330	Probe Tool, CU
43	RUDOLPH TECHNOLOGIES, INC.	S-300	THICKNESS MEASURE
44	SCREEN SPE USA LLC	SS3000	SCRUBBER
45	SCREEN SPE USA LLC	SU3200	Sublimation Tool
46	SCREEN SPE USA LLC	SU3800S	FE WE PARTICLE/FILM REMOVAL TOOL
47	TOKYO ELECTRON LIMITED	ACT M	DEVELOPER
48	TOKYO ELECTRON LIMITED	ACT12	STAND ALONE TRACK, CU
49	TOKYO ELECTRON LIMITED	CELLESTA	CLEANS, C4
50	TOKYO ELECTRON LIMITED	CELLICIA+	MULTI PROBE W/MWB FLOW AT COLD AND HOT
51	TOKYO ELECTRON LIMITED	LITHIUS	TRACK
52	TOKYO ELECTRON LIMITED	LITHIUS PRO Z	300MM 193NM IMMERSION W/MLR
53	TOKYO ELECTRON LIMITED	L-PRO V	IMMERSION TRACK FOR NXT1950
54	TOKYO ELECTRON LIMITED	MZETA EP1	4 CHAMBER NIT, CU
55	TOKYO ELECTRON LIMITED	P12XL	PROBER, WAFER, IN-LINE E-TEST
56	TOKYO ELECTRON LIMITED	TACTRAS	ETCHER
57	TOKYO ELECTRON LIMITED	TELIUS	ETCHER
58	TOKYO ELECTRON LIMITED	TELIUS SP	4-CHAMBER ETCH OXIDE 300MM, CU
59	TOKYO ELECTRON LIMITED	TRIAS	4 CHAMBER ASFD, CU
60	TOKYO SEIMITSU CO., LTD.	UF3000EX	MGMXVLT with AGV
61	ULVAC TECHNOLOGIES, INC.	ENTRON EX	MATX, CU
62	ULVAC TECHNOLOGIES, INC.	ZEM-3(M8)	Coefficient and Electrical
63	VEECO PROCESS EQUIPMENT INC.	UNITY AP300-IW	C4 EXPOSE, WIDEFIELD