Description
Please contact us for the availability of the used semiconductor equipment Parts-Front-End.
[Pls use “CTRL+F “key button to search the model/key word you are interested in]
The items are subject to prior sale without notice. These items are only for end users. Appreciate your time.
Item | Maker | Category | Model | Process | Vintage | Wafer Size |
1 | ADE | Metrology | WaferSight | Wafer Flatness Measurement | 2006 | 12 |
2 | AG Associates | RTP | HeatPulse 4100 | RTP | 1989 | 6 |
3 | AG Associates | RTP | HeatPulse 8800 | RTP | 2000 | 8 |
4 | Alcatel | Etch | Alcatel Gir | Dry Etch | – | 5 |
5 | AMAT | CVD | Centura TAO | Ta2O5 CVD | 2006 | 8 |
6 | AMAT | CVD | NLighten | Epi MOCVD | 2012 | 4 |
7 | AMAT | CVD | P5000 | 2CH/ WCVD | – | 6 |
8 | AMAT | CVD | P5000 | CVD | 1993 | 8 |
9 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
10 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
11 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1995 | 8 |
12 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
13 | AMAT | CVD | P5000 | LTO CVD, TEOS | 1996 | 8 |
14 | AMAT | CVD | P5000 | Oxide | 1996 | 8 |
15 | AMAT | CVD | P5000 | PECVD | – | 4 |
16 | AMAT | CVD | P5000 | PECVD | – | 4 |
17 | AMAT | CVD | P5000 | PECVD | – | 4 |
18 | AMAT | CVD | P5000 | PECVD | – | 5 |
19 | AMAT | CVD | P5000 | TEOS | 1988 | 6 |
20 | AMAT | CVD | P5000 | TEOS | 1990 | 6 |
21 | AMAT | CVD | P5000 | TEOS | 1991 | 6 |
22 | AMAT | CVD | Producer | SA BPSG | 2004 | 8 |
23 | AMAT | CVD | Producer SE | HARP-USG | 2003 | 12 |
24 | AMAT | CVD | Producer SE | HT ACL | 2007 | 12 |
25 | AMAT | CVD | Producer SE | ULK | 2006 | 12 |
26 | AMAT | Etch | Centura DPS | Metal | 1998 | 8 |
27 | AMAT | Etch | Centura DPS | Metal | 1997 | 8 |
28 | AMAT | Etch | Centura DPS G5 | Poly | 2006 | 12 |
29 | AMAT | Etch | Centura DPS G5 | Poly | 2007 | 12 |
30 | AMAT | Etch | Centura DPS G5 MESA | Poly | 2007 | 12 |
31 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
32 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
33 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
34 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
35 | AMAT | Etch | Centura DPS2 | Metal | 2005 | 12 |
36 | AMAT | Etch | Centura DPS2 | Poly | – | 12 |
37 | AMAT | Etch | Centura DPS2 | Poly | 2005 | 12 |
38 | AMAT | Etch | Centura DPS2 | Poly | 2005 | 12 |
39 | AMAT | Etch | Centura DPS532 | Metal | 2006 | 12 |
40 | AMAT | Etch | Centura eMax CT | Oxide | 2004 | 12 |
41 | AMAT | Etch | Centura eMax CT+ | Oxide | 2006 | 12 |
42 | AMAT | Etch | Centura Enabler | Oxide | 2010 | 12 |
43 | AMAT | Etch | Centura Enabler | Oxide | 2007 | 12 |
44 | AMAT | Etch | Centura Enabler | Oxide | 2008 | 12 |
45 | AMAT | Etch | Centura Enabler | Oxide | 2010 | 12 |
46 | AMAT | Etch | Centura Enabler | Oxide | 2006 | 12 |
47 | AMAT | Etch | Centura MXP | Metal | 1998 | 6 |
48 | AMAT | Etch | Centura MXP | Poly | 1996 | 6 |
49 | AMAT | Etch | P5000 | Metal | 1998 | 6 |
50 | AMAT | Etch | P5000 | Metal | 1997 | 6 |
51 | AMAT | Etch | P5000 | Metal | 1992 | 6 |
52 | AMAT | Etch | P5000 | Poly | 1995 | 5 |
53 | AMAT | Etch | P5000 | Poly | 1996 | 6 |
54 | AMAT | Etch | P5000 | Poly | 1995 | 8 |
55 | AMAT | Etch | P5000 | W | 1995 | 6 |
56 | AMAT | Metrology | COMPASS 300 | Patterned Wafer Inspection | 2000 | 8 |
57 | AMAT | Metrology | ComPlus MP | Wafer Inspection | 2004 | 8 |
58 | AMAT | Metrology | Orbot WF720 | Metrology | – | 5 |
59 | AMAT | Metrology | SEMVision CX | Defect Review SEM | 2003 | 8 |
60 | AMAT | Metrology | SEMVision G2 | Defect Review SEM | 2003 | 12 |
61 | AMAT | Metrology | SEMVision G3 | Defect Review SEM | 2006 | 12 |
62 | AMAT | Metrology | WF720 | Metrology | 1997 | 6 |
63 | AMAT | Metrology | WF730 | Metrology | 1996 | 6 |
64 | AMAT | PVD | Endura CL | PVD | 2000 | 12 |
65 | AMAT | RTP | AMC7800RPX | EPI | 1982 | 6 |
66 | AMAT | RTP | AMC7811 | EPI | 1990 | 6 |
67 | AMAT | RTP | AMC7821 | EPI | 2001 | 6 |
68 | AMAT | RTP | AMC7821 | EPI | 1983 | 6 |
69 | ASM | CVD | Dragon 2300 | PECVD Equipment for Barrier | 2003 | 12 |
70 | ASM | CVD | Eagle10 | DARC | – | 8 |
71 | ASM | CVD | Eagle10 | PETEOS | – | 8 |
72 | ASM | CVD | Eagle12 | Curing | 2010 | 12 |
73 | ASM | CVD | PXJ-200 | PECVD | 1989 | 6 |
74 | ASML | Stepper | PAS 2500/30 | Lithography | – | 5 |
75 | ASML | Stepper | PAS 2500/40 | Lithography | – | 5 |
76 | ASML | Stepper | PAS 2500/40 | Lithography | – | 5 |
77 | ASML | Stepper | PAS 5500/100D | i-Line | 1995 | 6 |
78 | ASML | Stepper | PAS 5500/300 | Stepper | 2000 | 8 |
79 | Aviza/SVG | Furnace | 10K | Diffusion | – | 5 |
80 | Aviza/SVG | Furnace | 10K | Diffusion | – | 5 |
81 | Axcelis | Asher | Microlite | Lithography | – | 5 |
82 | Axcelis | Track | RapidCure 320FC | UV anneal Unit | 2007 | 12 |
83 | Blue M | Others | DCC 606 EMP550 | – | 2005 | 12 |
84 | Brooks | Metrology | Bright light 200 | UV Inspection | 2002 | 8 |
85 | Brooks | Metrology | PRI7500 | Pod Stocker | 1997 | 8 |
86 | Canon | Asher | MAS-801HR | PR Stripper | – | 6 |
87 | Canon | Asher | MAS-801HR | PR Stripper | – | 6 |
88 | Canon | CVD | APT-4800 | BPSG | 2000 | 8 |
89 | Canon | Stepper | FPA-3000iW | i-Line Stepper | – | 8 |
90 | Canon | Stepper | FPA-5500iZ | i-Line Stepper | 2002 | 12 |
91 | CI Science | Etch | TORUS200 | Bevel Etching | 2007 | 8 |
92 | CI Science | Track | Charm2000 | Final Cure | 2001 | 8 |
93 | Cymer | Scanner | ELS-5400 | KrF Laser | 1997 | – |
94 | Cymer | Scanner | ELS-5410 | KrF Laser | 1998 | – |
95 | DNS | RTP | LA-820 | Anneal | 2000 | 8 |
96 | DNS | RTP | LA-820 | Lamp Anneal | 1996 | 8 |
97 | DNS | RTP | LA-W820-A | Lamp Anneal | 1996 | 8 |
98 | DNS | Track | RF-300A | Track | – | 8 |
99 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
100 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
101 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2006 | 12 |
102 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
103 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2007 | 12 |
104 | DNS | Track | SS-3000-A | 4 Front Scrubber | 2006 | 12 |
105 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2007 | 12 |
106 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2006 | 12 |
107 | DNS | Track | SS-3000-AR | Double Side Scrubber | 2006 | 12 |
108 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
109 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
110 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
111 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
112 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
113 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
114 | DNS | Track | SS-W80A-A | Scrubber | – | 8 |
115 | DNS | WET | FC-3000 | Wet Station | 2003 | 12 |
116 | DNS | WET | MP-3000 | Wet Cleaning Equipment | 2003 | 12 |
117 | Dong-A | Metrology | LCM Inspector | Pattern Generator (Cameleon) | 2008 | 8 |
118 | EBARA | CMP | EPO-222 | WCMP | 1996 | 8 |
119 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
120 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
121 | EBARA | CMP | EPO-222 | WCMP | 1997 | 8 |
122 | EBARA | CMP | EPO-222 | WCMP | 1996 | 8 |
123 | EBARA | CMP | EPO-2228 | CMP | 1998 | 8 |
124 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
125 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
126 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
127 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
128 | EBARA | CMP | EPO-222A | W | 2000 | 8 |
129 | EBARA | CMP | EPO-222A | W | 1999 | 8 |
130 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
131 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
132 | EBARA | CMP | EPO-223 | W | 1997 | 8 |
133 | EBARA | CMP | F-REX300S | W | 2006 | 12 |
134 | EBARA | CMP | F-REX300S | W | 2004 | 12 |
135 | EBARA | CMP | F-REX300S | W | 2003 | 12 |
136 | Fusion | Track | M150 | Dry Etch | – | 5 |
137 | Fusion | Track | M150PC | Lithography | – | 6 |
138 | Fusion | Track | M150PC | Lithography | – | 6 |
139 | Fusion | Track | M150PC | UV cure | – | 6 |
140 | Fusion | Track | M150PC | UV cure | – | 5 |
141 | Fusion | Track | M150PCJ | UV cure | – | 5 |
142 | Hirayama | Metrology | PC-304R7 | PCT System | 1998 | 8 |
143 | Hitachi | Etch | DM421P | Etch | 1995 | 8 |
144 | Hitachi | Others | UTS2020 | Lithography | – | 6 |
145 | Hitachi | Metrology | I6300 | Defect Inspection | – | 12 |
146 | Hitachi | Metrology | I6300 | Defect Inspection | – | 12 |
147 | Hitachi | Metrology | IS2700 | Dark Field inspection | 2005 | 12 |
148 | Hitachi | Metrology | RS3000 | Review SEM | 2003 | 8, 12 |
149 | Hitachi | Metrology | RS3000T | Review SEM | 2007 | 12 |
150 | Hitachi | Metrology | RS4000 | Review SEM | 2006 | 12 |
151 | Hitachi | Metrology | S-4700 | FE SEM | 2002 | 12 |
152 | Hitachi | Metrology | S-5200 | FE SEM | 2001 | – |
153 | Hitachi | Metrology | S-9300T | CD SEM | 2002 | 12 |
154 | Hitachi | Metrology | S-9360 | CD SEM | 2003 | 12 |
155 | Hitachi | Metrology | S-9380 | CD SEM | 2004 | 12 |
156 | Hitachi | Metrology | S-9380II | CD SEM | 2007 | 12 |
157 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
158 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
159 | Hitachi Kokusai | Asher | RAM-8500II | Asher | 1994 | 8 |
160 | Hitachi Kokusai | Asher | RAM-8500ZX | Asher | 1996 | 8 |
161 | Hitachi Kokusai | Metrology | VR-120SD | Resistivity Measurement | – | 12 |
162 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 2006 | 6 |
163 | Horiba | Metrology | PR-PD2 | Reticle/Mask Particle Detection System | 2005 | 6 |
164 | Hugle | WET | CRD-1000 | Auto Cassette Cleaner | – | 6 |
165 | Hypervision | Metrology | CHIP UNZIP | Chip Unzip Process | 1996 | 8 |
166 | JEOL | Metrology | JSM-7401F | FE SEM | 2006 | 12 |
167 | Karl SUSS | Stepper | MA150 | Aligner | 1994 | 6 |
168 | Karl SUSS | Stepper | MA150 | Aligner | 1995 | 6 |
169 | Karl SUSS | Stepper | MA200 | Aligner | 1989 | 8 |
170 | Karl SUSS | Stepper | MA200 | Aligner | 1992 | 8 |
171 | KLA-Tencor | Metrology | AIT Fusion | Dark Field inspection | 2003 | 12 |
172 | KLA-Tencor | Metrology | AIT Fusion XUV | Dark Field inspection | 2004 | 12 |
173 | KLA-Tencor | Metrology | AIT UV | Dark Field inspection | 2002 | 8 |
174 | KLA-Tencor | Metrology | AIT UV | Dark Field inspection | 2003 | 8 |
175 | KLA-Tencor | Metrology | Aleris HX8500 | Thickness Measurement | 2008 | 12 |
176 | KLA-Tencor | Metrology | Archer 10 AIM+ | Overlay | 2002 | 12 |
177 | KLA-Tencor | Metrology | Archer AIM MPX | Overlay | 2005 | 12 |
178 | KLA-Tencor | Metrology | Archer AIM+ | Overlay | 2006 | 12 |
179 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 2003 | 8 |
180 | KLA-Tencor | Metrology | AWIS-3110 | Particle counter | 2001 | 8 |
181 | KLA-Tencor | Metrology | AWIS-3110 | Wafer Inspection System | – | 8 |
182 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | – | 12 |
183 | KLA-Tencor | Metrology | EDR5210 | Defect Review SEM | 2010 | 12 |
184 | KLA-Tencor | Metrology | Ergolux | Metrology | – | 6 |
185 | KLA-Tencor | Metrology | INM100+INS10 | Metrology | – | 6 |
186 | KLA-Tencor | Metrology | INS3300G1 | Macro inspection | 2001 | 12 |
187 | KLA-Tencor | Metrology | KLA2552 | Data Review Station | 1996 | 8 |
188 | KLA-Tencor | Metrology | KLA2800 | Bright Field Inspection | 2007 | 12 |
189 | KLA-Tencor | Metrology | KLA5100 | Metrology | – | 8 |
190 | KLA-Tencor | Metrology | KLA5200XP | Overlay | 1998 | 6, 8 |
191 | KLA-Tencor | Metrology | LDS3300M | Macro inspection | – | 8 |
192 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | – | 5 |
193 | KLA-Tencor | Metrology | MPV CD2 AMC | Metrology | – | 5 |
194 | KLA-Tencor | Metrology | MPV-CD | Metrology | – | 5 |
195 | KLA-Tencor | Metrology | NANOMAPPER | Wafer Inspection | 2006 | 12 |
196 | KLA-Tencor | Metrology | OP-5240 | Thickness measurement | 2000 | 8 |
197 | KLA-Tencor | Metrology | P11 | Profiler | – | 6 |
198 | KLA-Tencor | Metrology | Puma 9000S | Dark Field inspection | 2005 | 12 |
199 | KLA-Tencor | Metrology | Puma 9130 | Dark Field inspection | 2005 | 12 |
200 | KLA-Tencor | Metrology | SFS7700 | Particle Counter | – | 5 |
201 | KLA-Tencor | Metrology | SP2-XP | Particle Counter | 2014 | 12 |
202 | KLA-Tencor | Metrology | Surfscan 2.1 | Particle Counter | – | 5 |
203 | Komatsu | Scanner | G20K2-1 | KrF Laser | 1999 | – |
204 | Komatsu | Scanner | G20K2-1 | KrF Laser | 1999 | – |
205 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2002 | – |
206 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2001 | – |
207 | Komatsu | Scanner | G20K4-1 | KrF Laser | 2002 | – |
208 | Lam | Etch | 2300 Versys | Poly | 2003 | 12 |
209 | Lam | Etch | 9600 | Etch | 1996 | 8 |
210 | Lam | Etch | 9600SE | Al | – | 8 |
211 | Lam | Etch | 9600SE | Al | – | 8 |
212 | Lam | Etch | 9600SE | Al | – | 8 |
213 | Lam | Etch | R4420 | Poly | 2004 | 8 |
214 | Lam | Etch | R4520 | Oxide | 1998 | 8 |
215 | Lam | Etch | R4520 | Oxide | 1998 | 8 |
216 | Lam | Etch | R4720 | Oxide | – | 8 |
217 | LTK | Asher | 200 Photomask | PR Stripper | – | 8 |
218 | Mattson | Asher | Aspen 3 | Light etch, 3LP + 2 chamber | 2006 | 12 |
219 | Mattson | Etch | Paradigme SP | Light Etch | 2010 | 12 |
220 | Mattson | Etch | Paradigme SP | Light Etch | 2010 | 12 |
221 | Mattson | RTP | AST3000 | RTP | 2004 | 12 |
222 | Mattson | RTP | AST3000 | RTP | 1998 | 8 |
223 | Mattson | RTP | AST3000 | RTP | 2003 | 12 |
224 | Mattson | RTP | AST3000 | RTP | 2002 | 8 |
225 | Mattson | RTP | AST3000 | RTP | 2004 | 12 |
226 | Mattson | RTP | AST3000 plus | RTP | 2003 | 12 |
227 | Mattson | RTP | Helios | RTP | 2005 | 12 |
228 | Mattson | RTP | Helios | RTP | 2007 | 12 |
229 | Mattson | RTP | Helios | RTP | 2004 | 12 |
230 | Met One | Metrology | DE712AF-5 | Surface Particle Counter | – | 8 |
231 | MKS | CVD | GHW50A-13DF3H0-10 | HDP for STI | 2015 | – |
232 | Montair | Etch | Prefurnace clean | General | – | 5 |
233 | Montair | Etch | Wafer etch | General | – | 5 |
234 | MSP | Metrology | 2110 | Particle Sampler | – | 8 |
235 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2005 | 12 |
236 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2002 | 12 |
237 | Nanometrics | Metrology | Caliper Mosaic | Overlay | 2009 | 12 |
238 | Nanometrics | Metrology | CDS-200 | Optical CD SEM | 2003 | 8 |
239 | Nanometrics | Metrology | METRA 2200M | Overlay | 1996 | 8 |
240 | Nanometrics | Metrology | METRA-7200 | Overlay | – | 8 |
241 | Nanometrics | Metrology | NanoSpec 210 | Metrology | – | 5 |
242 | Nanometrics | Metrology | NanoSpec AFT400 | Film Thickness Measurement | 1997 | 8 |
243 | Nanometrics | Metrology | SIPHER | EPI Slip and Defect | 2002 | 8 |
244 | Nikon | Metrology | OPTIPHOT 66 | Microscope | – | 6 |
245 | Nikon | Metrology | SMZ-U | Sterescopic Zoom Microscope | 1996 | 8 |
246 | Nikon | Metrology | SMZ-U | Sterescopic Zoom Microscope | 1996 | 8 |
247 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
248 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
249 | Nikon | Scanner | NSR-S204B | KrF Scanner | 2001 | 8 |
250 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
251 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
252 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
253 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
254 | Nikon | Scanner | NSR-S205C | KrF Scanner | – | 8 |
255 | Nikon | Scanner | NSR-S306C | ArF Scanner | 2002 | 8 |
256 | Nikon | Stepper | NES1-H04 | Mini stepper | 2011 | 4 |
257 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
258 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
259 | Nikon | Stepper | NSR-2205EX12B | KrF Stepper | – | 8 |
260 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 1997 | 8 |
261 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 1999 | 8 |
262 | Nikon | Stepper | NSR-2205EX14C | KrF Stepper | 2001 | 6 |
263 | Nikon | Stepper | NSR-2205i11D | i line stepper | 1995 | 4 |
264 | Novellus | Asher | Gamma Express | Asher | 2005 | 12 |
265 | Novellus | CVD | C2 Altus | WCVD | 1994 | 8 |
266 | Novellus | CVD | C2 Altus Shrink | WCVD(PNL) | 1996 | 8 |
267 | Novellus | CVD | C2 Speed Shrink | HDP | 2000 | 8 |
268 | Novellus | CVD | C2 Speed Shrink | HDP | 1999 | 8 |
269 | Novellus | CVD | C2 Speed Shrink | HDP | 2001 | 8 |
270 | Novellus | CVD | C3 Speed MAX | HDP | 2006 | 12 |
271 | Novellus | CVD | C3 Speed NEXT | HDP | 2004 | 12 |
272 | Novellus | CVD | C3 Speed XT | ILD, IMD | 2008 | 12 |
273 | Novellus | CVD | Concept One | CVD | – | 8 |
274 | Novellus | CVD | Concept One | CVD | – | 8 |
275 | Novellus | CVD | Concept One | CVD | – | 5 |
276 | Novellus | CVD | Concept One | CVD | – | 5 |
277 | Novellus | CVD | Concept One | CVD | – | 5 |
278 | Novellus | CVD | Vector | CVD | – | 12 |
279 | Novellus | CVD | Vector | CVD | – | 12 |
280 | Novellus | CVD | Vector | CVD | – | 12 |
281 | Novellus | CVD | Vector | CVD | – | 12 |
282 | Novellus | CVD | Vector | CVD | – | 12 |
283 | Novellus | CVD | Vector | CVD | 2004 | 12 |
284 | Novellus | CVD | Vector Extreme | CVD | 2010 | 12 |
285 | Novellus | WET | Sabre XT | Electro Copper Plating | 2000 | 8 |
286 | Novellus | WET | Sabre XT | Electro Copper Plating | 2001 | 8 |
287 | Novellus | WET | Sabre XT | Electro Copper Plating | 1999 | 8 |
288 | Novellus | WET | Sabre XT | Electro Copper Plating | 2001 | 8 |
289 | Novellus | WET | Sabre XT | Electro Copper Plating | 1999 | 8 |
290 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
291 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
292 | OAI | Metrology | 358 | Stepper Exposure Analyzer | – | 6 |
293 | Olympus | Metrology | BHMJL | Microscope | – | 6 |
294 | Olympus | Metrology | BHMJL | Microscope | – | 6 |
295 | Oshitari | Others | SCOV-8594 | Hard Bake Oven | 1996 | 8 |
296 | PSK | Asher | DES-212-304AVL | PR Stripper | – | 4, 5 |
297 | PSK | Asher | Tera 21 | PR Ashing | 2008 | 12 |
298 | Rigaku | Metrology | TXRF3750 | X-Ray Fluorescence | 2007 | 8 |
299 | Rudolph/August | Metrology | 3Di8500 | Wafer Inspection | 2008 | 12 |
300 | Rudolph/August | Metrology | Axi-S | Macro inspection | 2005 | 12 |
301 | Rudolph/August | Metrology | Axi-S | Macro Wafer Inspection | 2005 | 8 |
302 | Rudolph/August | Metrology | FE-IV | Inspection | 1995 | 8 |
303 | Rudolph/August | Metrology | FE-VII | Ellipsometer | – | 8 |
304 | Rudolph/August | Metrology | FE-VII | Focus Ellipsometer | 1993 | 8 |
305 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | – | 8 |
306 | Rudolph/August | Metrology | FE-VII-D | Focus Ellipsometer | 1997 | 8 |
307 | Rudolph/August | Metrology | MetaPULSE 300 | Thickness Measurement | 2004 | 12 |
308 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 2004 | 8 |
309 | Rudolph/August | Metrology | NSX105 | Macro Inspection | 2003 | 8 |
310 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2004 | 8 |
311 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2002 | 8 |
312 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2003 | 8 |
313 | Semitel | WET | Parts Cleaner | Parts Cleaner | 2003 | 8 |
314 | Semitool | WET | Raider ECD | Electroplating | 2004 | 8 |
315 | Semitool | WET | Raider ECD | Electroplating | 2009 | 12 |
316 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 1996 | 6 |
317 | Semitool | WET | SST-F-421-280-F | Spin Dryer | 1999 | 5 |
318 | Semitool | WET | SST-F-421-280-FK | Spin Dryer | 1998 | 6 |
319 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 2000 | 6 |
320 | Semitool | WET | SST-F-421-280-K | Spin Dryer | 1996 | 5 |
321 | Semix | Track | Semix SOG coater | Lithography | – | 6 |
322 | Semix | Track | TZP | Lithography | – | 6 |
323 | SEN | Implant | NV-GSD-HE | High Energy | 1998 | 8 |
324 | Seojin | Metrology | SSM5200 | Capacitancy-Voltage Tester | 1997 | – |
325 | Shibaura | PVD | SWN5000 | Metal | – | 8 |
326 | Signatone | Metrology | S-1060R-6SND3L | Thermal Probing System | – | 8 |
327 | Silvaco | Metrology | S3245A | Noise Amplifier | 2006 | 8 |
328 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2007 | 12 |
329 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2010 | 12 |
330 | SOSUL | Etch | EXTRIMA6000 | Bevel Etcher | 2007 | 12 |
331 | Soul Brain | WET | Electrolysis water Unit | CLN | 2014 | 12 |
332 | Star | Others | 2000 Primer | ATV | – | 5 |
333 | Star | Others | 2000 Primer | General | – | 5 |
334 | STL | Track | SPARROW | CFA | 2001 | 8 |
335 | STL | Track | SPARROW | Quench | 2000 | 8 |
336 | Sumitomo | WET | KC-200A | Cassette Cleaner | 1995 | 8 |
337 | Sungjin Semitech | WET | F1BC02 | Ultrasonic Cleaner | 2000 | 12 |
338 | Sungjin Semitech | WET | Ultra Sonic | Wet Clean Station | 2001 | 12 |
339 | Surftens | Metrology | Measurement | Metrology | – | 6 |
340 | SVG | Furnace | 5204 | Diffusion | – | 5 |
341 | SVG | Furnace | 5204 | Diffusion | – | 5 |
342 | Taeyangtech | WET | TYT-PC | Wet Clean Station | 2001 | 12 |
343 | TEL | CVD | Trias | CVD Ti | – | 12 |
344 | TEL | CVD | Trias | CVD Ti | – | 12 |
345 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
346 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
347 | TEL | CVD | Trias | CVD Ti | 2016 | 12 |
348 | TEL | CVD | Trias | CVD TiN | 2004 | 12 |
349 | TEL | CVD | Trias | Metal | 2012 | 12 |
350 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
351 | TEL | Etch | Unity SCCM Shin | Etch | 2004 | 12 |
352 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
353 | TEL | Etch | Unity SCCM Shin | Etch | 2007 | 12 |
354 | TEL | Etch | Unity SCCM Shin | Oxide Etch | 2003 | 12 |
355 | TEL | Furnace | Alpha-303i-H | D-Poly | 2001 | 12 |
356 | TEL | Furnace | Alpha-303i-H | D-Poly | 2002 | 12 |
357 | TEL | Furnace | Alpha-303i-H | LP-N2 Anneal | 2002 | 12 |
358 | TEL | Furnace | Alpha-303i-H | MTO | 2002 | 12 |
359 | TEL | Furnace | Alpha-303i-H | MTO | 2002 | 12 |
360 | TEL | Furnace | Alpha-303i-H | MTO | 2001 | 12 |
361 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
362 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
363 | TEL | Furnace | Alpha-303i-K | MTO | 2004 | 12 |
364 | TEL | Furnace | Alpha-8S-C | PAD/LINER/ISO | 1995 | 8 |
365 | TEL | Furnace | Alpha-8S-C | Poly | 1995 | 8 |
366 | TEL | Furnace | Alpha-8S-Z | Dry Oxide, part machine | 1996 | 8 |
367 | TEL | Furnace | Alpha-8S-Z | Pyro, part machine | 1996 | 8 |
368 | TEL | Furnace | Formula | DCS-Sin | 2010 | 12 |
369 | TEL | Furnace | Formula | Nit | 2003 | 12 |
370 | TEL | Furnace | Formula | Nit | 2003 | 12 |
371 | TEL | Furnace | Formula | SiGe-POLY | 2003 | 12 |
372 | TEL | PVD | MarkIV | PVD | 2011 | 8 |
373 | TEL | Track | ACT8 | COT/DEV | 1999 | 6 |
374 | TEL | Track | LITHIUS | 5C5D | 2006 | 12 |
375 | TEL | Track | LITHIUS i+ | COT/DEV | 2006 | 8 |
376 | TEL | Track | Mark7 | BAKE | 1996 | 8 |
377 | TEL | Track | Mark7 | COT | 1996 | 8 |
378 | TEL | Track | Mark7 | COT | 1996 | 8 |
379 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
380 | TEL | Track | Mark7 | COT/DEV | 1996 | 8 |
381 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
382 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
383 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
384 | TEL | Track | Mark7 | COT/DEV | 1995 | 8 |
385 | TEL | Track | Mark7 | COT/DEV | 1994 | 8 |
386 | TEL | Track | Mark7 | COT/DEV | 1998 | 8 |
387 | TEL | Track | Mark7 | COT/DEV | 1993 | 8 |
388 | TEL | Track | Mark7 | DEV | 1997 | 8 |
389 | TEL | Track | Mark7 | DEV | 1996 | 8 |
390 | TEL | Track | Mark7 | DEV | 1997 | 8 |
391 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
392 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
393 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
394 | TEL | Track | Mark8 | COT/DEV | 1994 | 8 |
395 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
396 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
397 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
398 | TEL | Track | Mark8 | COT/DEV | 1998 | 8 |
399 | TEL | Track | Mark8 | COT/DEV | 1992 | 8 |
400 | TEL | Track | Mark8 | COT/DEV | 1995 | 8 |
401 | TEL | Track | Mark8 | COT/DEV | 1996 | 8 |
402 | TEL | Track | Mark8 | COT/DEV | 1997 | 8 |
403 | TES | CVD | Challenger 300 | DCVD | 2008 | – |
404 | Ultratech | Stepper | 1500 | Lithography | 2000 | 6 |
405 | Ultratech | Stepper | 1500 | Lithography | 2000 | 6 |
406 | Ultratech | Stepper | 1500 | Lithography | 1996 | 6 |
407 | Ulvac | Asher | RISE-200 | Asher | 2006 | 8 |
408 | Ulvac | PVD | Ceraus Z-1000 | Metal | – | 8 |
409 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
410 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
411 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 2000 | 8 |
412 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1995 | 8 |
413 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1996 | 8 |
414 | Ulvac | PVD | Ceraus ZX-1000 | PVD | 1996 | 8 |
415 | Ulvac | PVD | Entron EX | TSV Bump UBM | 2006 | 12 |
416 | Ulvac | PVD | Entron EX W300 | PVD | 2007 | 12 |
417 | Ulvac | PVD | Entron EX W300 | PVD | 2011 | 12 |
418 | Ulvac | PVD | Entron S | PVD | – | 12 |
419 | Ulvac | PVD | Entron T | PVD | – | 12 |
420 | UNAXIS | PVD | LLS900 | PVD | – | 8 |
421 | Ushio | Track | UMA-1002-HC93FS | Stabilizer | 1997 | 8 |
422 | Ushio | Track | UMA-1002-HC93FWL | Stabilizer | 1997 | 8 |
423 | Veeco | Metrology | UVX310 | Step Profiler | 2003 | 8 |
424 | Veeco | Metrology | V200 | Profiler | – | 8 |
425 | WONIK IPS | CVD | Bluetain | MCVD | 2008 | 12 |
426 | Yield Engineering System | Others | YES-5 | Lithography | – | 6 |
427 | Yield Engineering System | Others | YES-5E | Lithography | – | 6 |
428 | Yield Engineering System | Others | YES-5E | Lithography | – | 6 |
The items are subject to prior sale without notice. These items are only for end users. Appreciate your time.
SS5684