Description
The following used semiconductor equipment are in Asia. They are only for end users. Valid Time: Subject to prior sale. ID-SS5588-0-7-1.Appreciate your time!
| EQ Code | Process | Maker | Model | Process | size |
| 1 | ASHER | GASONICS | IRIDIA 4800 DL | Stripper / Asher | 8″ |
| 2 | ASHER | GASONICS | IRIDIA 4800 DL | Stripper / Asher | 8″ |
| 3 | ASHER | GASONICS | IRIDIA 4800 DL | Stripper / Asher | 8″ |
| 4 | ASHER | HITACHI | UA-7200 | Stripper / Asher | 8″ |
| 5 | CVD | AMAT | CENTURA 5200 | DxZ (SiLAINE) | 8″ |
| 6 | CVD | AMAT | CENTURA 5200 | WxZ | 8″ |
| 7 | CVD | AMAT | CENTURA 5200 | WxZ | 8″ |
| 8 | CVD | AMAT | CENTURA 5200 | MxP+ | 8″ |
| 9 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 10 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 11 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 12 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 13 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 14 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 15 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 16 | CVD | AMAT | CENTURA MCVD | WxZ Optima | 8″ |
| 17 | CVD | AMAT | P5000 | Delta Dlh 2ch | 6″ |
| 18 | CVD | AMAT | P5000 | Delta Dlh 3ch | 6″ |
| 19 | CVD | AMAT | P5000 | Delta Teos 3ch | 6″ |
| 20 | CVD | AMAT | P5000 | Delta Teos 3ch | 6″ |
| 21 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 6″ |
| 22 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 23 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 24 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 25 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 26 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 27 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 28 | CVD | AMAT | P5000 | DxL 2ch | 6″ |
| 29 | CVD | AMAT | P5000 | DxL 4ch | 8″ |
| 30 | CVD | AMAT | P5000 | DxL 2ch | 8″ |
| 31 | CVD | AMAT | P5000 | DxL 1ch | 8″ |
| 32 | CVD | AMAT | P5000 | DxL 2ch | 8″ |
| 33 | CVD | AMAT | P5000 | DxZ 4ch | 8″ |
| 34 | CVD | AMAT | P5000 | Teos 2ch | 8″ |
| 35 | CVD | AMAT | P5000 | Delta Teos 3ch | 6″ |
| 36 | CVD | AMAT | P5000 | Delta Teos 3ch, Sputter 1ch | 8″ |
| 37 | CVD | AMAT | P5000 | Sputter 2ch | 8″ |
| 38 | CVD | AMAT | P5000 | Teos 3ch | 8″ |
| 39 | CVD | AMAT | P5000 | Teos 2ch, Sputter 2ch | 8″ |
| 40 | CVD | AMAT | P5000 | Teos 3ch | 6″ |
| 41 | CVD | AMAT | P5000 | Teos 2ch, Sputter 2ch | 8″ |
| 42 | CVD | AMAT | P5000 | Teos 2ch, Sputter 2ch | 8″ |
| 43 | CVD | AMAT | P5000 | Teos 2ch, Sputter 2ch | 8″ |
| 44 | CVD | AMAT | P5000 | Teos 2ch, DxL 2ch | 8″ |
| 45 | CVD | AMAT | P5000 | WxL 3ch | 6″ |
| 46 | CVD | AMAT | P5000 | WxL 3ch | 8″ |
| 47 | CVD | AMAT | P5000 | WxL 3ch | 8″ |
| 48 | CVD | AMAT | P5000 | WxZ 2ch | 6″ |
| 49 | CVD | AMAT | P5000 | WxZ 2ch | 8″ |
| 50 | CVD | AMAT | P5000 | WxZ 3ch | 6″ |
| 51 | CVD | AMAT | P5000 | WxZ 1ch, Sputter 1ch | 6″ |
| 52 | CVD | AMAT | P5000 | WxZ 1ch, Sputter 1ch | 6″ |
| 53 | CVD | AMAT | P5000 | WxZ 2ch, Sputter 1ch | 8″ |
| 54 | CVD | AMAT | P5000 | Mark II WxZ 3ch | 8″ |
| 55 | CVD | BMR | HIDEP | PECVD | N/A |
| 56 | CVD | GEMINI | GEMINI III E | EPI Reactor Batch | 6″ |
| 57 | CVD | KORNIC (AP system) | RTP-600M | RTP, Wafer Diffusion | 4″, 6″ |
| 58 | ETCHER | AMAT | CENTURA 5200 | MxP Poly | 8″ |
| 59 | ETCHER | AMAT | P5000 | Mark II Metal | 6″ |
| 60 | ETCHER | AMAT | P5000 | No Chamber (PLIS type) | 8″ |
| 61 | ETCHER | BMR | GAN (A49-3) | Etcher | 4″ |
| 62 | ETCHER | LAM | 4720 | Oxide Etch | 8″ |
| 63 | ETCHER | LAM | Raindow4500 | Etcher | 5″ |
| 64 | ETCHER | OXFORD | 800+ | RIE | 5″ |
| 65 | ETCHER | PLASMA THERM | WAFER/ BATCH 740 | Dual Plasma Etch And RIE | 4″ |
| 66 | ETCHER | PLASMA THERM | WAFER/ BATCH 741 | Dual Plasma Etch And RIE | 4″ |
| 67 | ETCHER | PSC | DES-220-456AVL | Dry Etching System | N/A |
| 68 | ETCHER | TEGAL | PLASMA 900E | Plasma Dry Etch | 4″ |
| 69 | ETCHER | TEGAL | PLASMA 903E | Plasma Dry Etch | 4″ |
| 70 | ETCHER | TEL | 8500 | Etcher | 8″ |
| 71 | ETCHER | TEL | 8500 | Etcher | 8″ |
| 72 | ETCHER | TEL | 8500 | Etcher | 8″ |
| 73 | ETCHER | TEL | 8500 | Etcher | 8″ |
| 74 | MET | AMRAY | SEM-3800C | Scanning Electron Microscope | N/A |
| 75 | MET | APPIIED BOISYSTEM | ABI-3700 ANALYZER | Automatic Sequencer | N/A |
| 76 | MET | BROOKS | METARA 7200 | Overlay | 8″ |
| 77 | MET | CYBER OPTICS | CYBERSCAN C212/110 | Laser Measure | 8″ |
| 78 | MET | EO TECHNOLOGY | FOR GLASS PANEL | Laser Marker for Glass | 8″ |
| 79 | MET | ESI | M9275 | Laser Repair | 8″ |
| 80 | MET | ESI | M9825 | Laser Repair | 8″ |
| 81 | MET | ESI | M9825 | Laser Repair | 8″ |
| 82 | MET | ESI | M9825 | Laser Repair | 8″ |
| 83 | MET | ESI | M9830 | Laser Repair | 8″ |
| 84 | MET | ESI | M9830 | Laser Repair | 8″ |
| 85 | MET | FSM | SYMPHONYMC | Life Time | 8″ |
| 86 | MET | HITACHI | FB2100 | FIB | 8″ |
| 87 | MET | HITACHI | RS-4000 | Defect Review Sem | 8″ |
| 88 | MET | HITACHI | RS-4000 | Defect Review Sem | 8″ |
| 89 | MET | HITACHI | S-4160 | FE Sem | 6″,8″ |
| 90 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 91 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 92 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 93 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 94 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 95 | MET | HITACHI | S-5000 | FE Sem | 6″,8″ |
| 96 | MET | HITACHI | S-7800 | CD Sem | 6″,8″ |
| 97 | MET | HITACHI | S-7800HSA | CD Sem | 6″,8″ |
| 98 | MET | HITACHI | LS-6800 | Wafer Surface Inspection | 8″,12″ |
| 99 | MET | J.A.WOOLAM | VUV-VASE VU302 (Gen I) |
Ellipsometer | 8″ |
| 100 | MET | JEOL | JSM-5600 | CD Sem | N/A |
| 101 | MET | JEOL | JSM-6340F | FE Sem | N/A |
| 102 | MET | JEOL | JSM-6700F | FE Sem | N/A |
| 103 | MET | JEOL | JWS-7500E | Wafer Inspection System | 8″ |
| 104 | MET | KLA_TENCOR | 2132 (mainbody only) | Inspection Unit | 6″,8″ |
| 105 | MET | KLA_TENCOR | AIT | Particle Review | 8″ |
| 106 | MET | KLA_TENCOR | AIT I | Patterned Wafer Inspection | 6″,8″ |
| 107 | MET | KLA_TENCOR | AIT UV | Darkfield Defect Inspection | 8″ |
| 108 | MET | KLA_TENCOR | AIT XP+ | Darkfield Defect Inspection | 8″ |
| 109 | MET | KLA_TENCOR | ARCHER AIM | Overlay | 8″ |
| 110 | MET | KLA_TENCOR | P-2 | Disk Profiler | 6″,8″ |
| 111 | MET | KLA_TENCOR | P-12 | Disk Profiler | 6″,8″ |
| 112 | MET | KLA_TENCOR | PROMETRIX FT750 | Film Thickness Measurement | N/A |
| 113 | MET | KLA_TENCOR | PROMETRIX FT750 | Film Thickness Measurement | N/A |
| 114 | MET | KLA_TENCOR | SP1 Tbi | Unpatterned wafer inspection | 8″ |
| 115 | MET | KLA_TENCOR | THERMA-WAVE OP 2600 |
Opti-Probe | 8″ |
| 116 | MET | KLA_TENCOR | THERMA-WAVE OP 2600 |
Opti-Probe | 8″ |
| 117 | MET | KLA_TENCOR | THERMA-WAVE OP 2600 |
Opti-Probe | 8″ |
| 118 | MET | KLA_TENCOR | THERMA-WAVE OP 2600B | Opti-Probe | 8″ |
| 119 | MET | KLA_TENCOR | THERMA-WAVE OP 2600B | Opti-Probe | 8″ |
| 120 | MET | KLA_TENCOR | THERMA-WAVE OP 2600B | Opti-Probe | 8″ |
| 121 | MET | KLA_TENCOR | THERMA-WAVE OP 2600B | Opti-Probe | 8″ |
| 122 | MET | KLA_TENCOR | THERMA-WAVE OP 2600 DUV |
Opti-Probe | 8″ |
| 123 | MET | LASERTEC | BGM300 | Wafer Surface Analyzing and Visualization System | 8″ |
| 124 | MET | LG SEMICON | CLS-9002 | 3rd Optical Inspection | N/A |
| 125 | MET | LINDA | IV5_HI | N/A | |
| 126 | MET | NANOMETRICS | 9-7200-0195E | Mask & Wafer Inspection | 8″ |
| 127 | MET | NEC | SL-473D2 | Si Wafer Marker | N/A |
| 128 | MET | NEC | SL-473F | Si Wafer Marker | N/A |
| 129 | MET | NIKON | 3 | Opti station | 5″ |
| 130 | MET | NIKON | 3 | Opti station | 5″ |
| 131 | MET | NIKON | 3A | Opti station | 5″ |
| 132 | MET | RAYTEX | RXW-800 | Edge Scan | 8″ |
| 133 | MET | RIGAKU | XRF3640 (Handle include) |
Wafer/ Disk Analyzer | 8″ |
| 134 | MET | RIGAKU | XRF3640 (Handle not include) |
Wafer/ Disk Analyzer | 8″ |
| 135 | MET | RUDOLPH | FE-3 | Focus Ellipsometer | 8″ |
| 136 | MET | RUDOLPH | FE-4D | Focus Ellipsometer | 8″ |
| 137 | MET | RUDOLPH | FE-7 | Focus Ellipsometer | 8″ |
| 138 | MET | RUDOLPH | WS2500 | Wafer Inspection System | 8″ |
| 139 | MET | RUDOLPH | WS2500 | Wafer Inspection System | 8″ |
| 140 | MET | RUDOLPH | WS2500 | Wafer Inspection System | 8″ |
| 141 | MET | RUDOLPH | WS2500 | Wafer Inspection System | 8″ |
| 142 | MET | RUDOLPH | MP200 | Film thickness measurement | 8″ |
| 143 | MET | RUDOLPH | MP200 | Film thickness measurement | 8″ |
| 144 | MET | RUDOLPH | MP200 | Film thickness measurement | 8″ |
| 145 | MET | RUDOLPH | MP200 | Film thickness measurement | 8″ |
| 146 | MET | RUDOLPH | MP300 | Film thickness measurement | 8″ |
| 147 | MET | RUDOLPH | MP300 | Film thickness measurement | 8″ |
| 148 | MET | SSM | 5200 | Resistivity | 8″ |
| 149 | MET | THERMO FISHER | ECO 1000 | FTIR System | 8″ |
| 150 | PHOTO | DNS | SK-200W-AVPF | Coater / Developer (2C/2D) | 8″ |
| 151 | PHOTO | DNS | SK-200W-BVPE | i-Line Photo Track Coater (3C3D) | 8″ |
| 152 | PHOTO | DNS | SK-80BW-AVPE | Coater/ Developer (2C/2D) | 8″ |
| 153 | PHOTO | DNS | SK-W80B-AVPE | Coater/ Developer (2C/2D) | 8″ |
| 154 | PHOTO | DNS | SSW-60A-AR | Scrubber (4B) | 6″ |
| 155 | PHOTO | KARLSUSS | RC 8-ACS 200 | Spin Coater | 8″ |
| 156 | PHOTO | KARLSUSS | RC 16 | Spin Coater | N/A |
| 157 | PHOTO | KARLSUSS | RC 16(RC5) | Spin Coater | N/A |
| 158 | PHOTO | LABOTECH | Hot Plate | Photonics | N/A |
| 159 | PHOTO | NIKON | NSR-S204B | Scanner DUV (GigaphtonI G20K2 KRF laser) |
8″ |
| 160 | PHOTO | NIKON | NSR-S204B | Scanner DUV (GigaphtonI G20K2 KRF laser) |
8″ |
| 161 | PHOTO | NIKON | NSR-S306B | Scanner DUV | 8″ |
| 162 | PROBER | KARLSUSS | PM8 | Prober | 8″ |
| 163 | PROBER | ELECTROGLAS | EG4090 | Automatic Wafer Prober | 8″ |
| 164 | PROBER | ELECTROGLAS | EG4090 | Automatic Wafer Prober | 8″ |
| 165 | PROBER | ELECTROGLAS | EG4090U | Automatic Wafer Prober | 8″ |
| 166 | PROBER | ELECTROGLAS | EG4090U | Automatic Wafer Prober | 8″ |
| 167 | PROBER | ELECTROGLAS | EG4090U | Automatic Wafer Prober | 8″ |
| 168 | PROBER | ELECTROGLAS | EG4090U | Automatic Wafer Prober | 8″ |
| 169 | PVD | VARIAN | MB2-830 | Sputter | 8″ |
| 170 | PVD | VARIAN | M2I | Sputter | 8″ |
| 171 | RTP | AMAT | Centura RTP | Tpcc / Xe+ / Atm | 8″ |
| 172 | RTP | AMAT | Centura RTP | Tpcc / Xe+ / Atm | 8″ |
| 173 | RTP | AMAT | Centura RTP | Tpcc / Xe+ / Rp(ISSG) | 8″ |
| 174 | ETC | BROOKS | SORTER MTX 2000 | Wafer Handler | 8″ |
| 175 | ETC | BROOKS | SORTER MTX 2000 | Wafer Handler | 8″ |
| 176 | ETC | CARL ZEISS | S-INDUSTRIAL | Zeiss Excistar S-industrial | 8″ |
| 177 | ETC | LUMONICS | SUPERCLEAN | Laser Marking System (Lamp type) |
8″ |
| 178 | ETC | NANO OPTICS | HAZE 2 | Nano Optics Haze 2 | 8″ |
| 179 | ETC | SVS | MSX1000 | Auto Track | 8″ |
| 180 | ETC | THERMAL | GYE-12000 | Evaporator System | 8″ |