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Used Semiconductor Equipment. ID-SS7104-I-1-1-1

Valid: Subject to prior sale without notice. This is only for end users. Applicate your time.The trademarks of the equipment and parts contained in this page belonged to the Original Equipment Manufacturers.

NO BRAND MODEL ALT. MODEL WAFERSIZE YOM
1 Hitachi S-8820 CD-SEM 6 1995
2 Hitachi S-8820 CD-SEM 6 1995
3 ASM Epsilon E2000 Plus (RP&SiGe) – – 2011
4 TEL Expedius + – 12 2007
5 TEL Expedius + – 12 2007
6 TEL Ofen Tel Minibatch OfenTel Minibatch (NITRID) for
12″ / 300 mm		 12 2003
7 TEL Ofen Tel Minibatch OfenTel Minibatch (OXID) for 12″ /
300 mm		 12 2004
8 Teradyne Magnum II ICP – – 2012
9 Teradyne Magnum II ICP – – 2012
10 Teradyne Magnum II ICP – – 2013
11 Teradyne Magnum II ICP – – 2012
12 Teradyne Magnum II ICP – – 2012
13 Teradyne Magnum II ICP – – 2012
14 Teradyne Magnum II ICP – – 2013
15 Teradyne Magnum II ICP – – 2013
16 Teradyne Magnum II ICP – – 2012
17 SEZ DV-Prime 8 Chambers 12 2011
18 SEZ DV-Prime 8 Chambers 12 2010
19 SEZ DV-Prime 8 Chambers 12 2011
20 SEZ DV34 4 Chambers 8, 12
21 SEZ DV34 4 Chambers 8, 12 –
22 SEZ DV34 4 Chambers 8, 12 –
23  SEZ DV34 4 Chambers 8, 12 –
24 SEZ DV34 4 Chambers 8, 12 2007
25 SEZ DV34 4 Chambers 8, 12 2007
26 SEZ RST101 1 Chamber 4,6 –
27 SEZ RST 201 1 Chamber 6 1997
28 SEZ RST 303 1 Chamber 12 1998
29 SEZ 303 – – –
30 SEZ RST 304 1 Chamber 8, 12 2005
31 SEZ RST 304 1 Chamber 8, 12
32 SEZ 304 1 Chamber 8, 12 –
33 SEZ 305 1 Chamber 8, 12 2006
34 SEZ 323 2 Chambers 8, 12 2002
35 SEZ 323 2 Chambers 8, 12 –
36 SEZ 323 2 Chambers 8, 12 2006
37 SEZ 323 2 Chambers 8, 12 2005
38 SEZ ES34 4 Chambers 8, 12 2008
39 SEZ ES34 4 Chambers 8, 12 2008
40 ASM A412 Dual ATM Oxide (Dry Oxide) 12 2007
41 ASM A412 Nitride Dual Reactor 12 –
42 ASM A412 Vertical LPCVD Furnace (Poly) 12 –
43 ASM A412 Vertical LPCVD Furnace (Poly) 12 –
44 ASM A412 Vertical LPCVD Furnace (Poly) 12 –
45 ASM A412 Vertical LPCVD Furnace (Poly) 12 –
46 ASM A412 Vertical LPCVD Furnace (Poly) 12 2006
47 ASM A412 Vertical LPCVD Furnace (Poly) 12 2006
48 ASM A412 Veritcal LPCVD Furnace (NITR) 12 2006
49 ASM A400 Furnace Single Reactor Nitride, x01 Reactor 8 –
50 ASM A412 R1:Nitride _R2:Nitride – –
51 ASM A412 R1:Nitride _R2:Nitride – –
52 ASM A412 R1:Nitride _R2:Nitride – –
53 ASM A412 R1:Nitride _R2:Nitride – –
54 ASM A412 R1:POLY with Dope_R2:POLY with Dope – –
55 ASM A412 R1:POLY with Dope_R2:POLY with Dope – –
56 ASM A412 PLUS R1 Nitride_R2 POLY WITH DOPE – –
57 ASM Eagle XP5 R1:PEALD(SiO)_R2:PEALD(SiO)_R3:PEALD(SiO)_R4:PEALD(SiO) – –
58 ASM Eagle XP-8 DCM DCM#1: PEALD(SiO)_DCM#2: PEALD(SiO)_DCM#3: PEALD(SiO)_DCM#4: PEALD(SiO) – –
59 Suss Microtec Falcon Coat / Develop 4, 5, 6, 8 2002
60 Suss Microtec ACS200/Falcon 3x Coater 4, 5, 6, 8 2000
61 Suss Microtec ACS200/Falcon 4x Developer 4, 5, 6, 8 2000
62 Suss Microtec ACS300 4x Developer 8, 12 2008
63 Suss Microtec Gamma 8 2009
64 Suss Microtec Gamma 80 Coater-CSM – –
65 Suss Microtec  Suss Gamma 80
Coater-CSM		 Coater-CSM – –
66 Suess Twin Gamma Coater/Developer – –
67 Suss Microtec Suss Delta BM20 Coater + HP – –
68 Semitool Semitool Raider ECD System Tool ID:CUPA201 ECD 310 12 2009
69 Semitool STORM 300 12 2010
70 Semitool STORM 3 4 1996
71 Semitool SST 201 (Cintillio) 1 Chamber 8 2011
72 Semitool SST 742 Wet 6 –
73 Semitool SST 742 Wet 8 –
74 Semitool 430-S-4-1-ML-WP SRD 8 2006
75 Semitool SEMITOOL SST-C-632-280-K Spray solvent t K Spray Solvent Tool 8 1999
76 Semitool Semitool Storm ll – 8 2005
77 Semitool Rhetech SRD 280S-6-1-E-LH Spin – 2008
78 Semitool SRD 2300S-6-1-ML – 8 –
79 Semitool SRD 270S-L – 6
80 Semitool SRD 270S-6-1-E-ML – 6 2002
81 DNS FS-820 L Wafercleaner, 3 Baths 6 –
82 DNS FS-820 L Wafercleaner, 3 Baths 6 –
83 DNS SS W60A Wafer Scrubber SS-W60A-A 6 2000
84 Hitachi S-5000H SEM – 1998
85 Hitachi S-9300 – 1996
86 Hitachi S-5000 – 1999-09
87 Hitachi S-9380 CD-SEM –
88 Hitachi S-8840 CD-SEM – –
89 Hitachi S-3400N SEM – 2007
90 Hitachi S-4500 SEM – 1993
91 Hitachi S4700 REM SEM 4 1997
92 Hitachi S-4800 (Type 2 model) SEM – 2007
93 Hitachi S-5000 SEM – 1995
94 Hitachi S-8840 CD-SEM – –
95 Hitachi S-9260A CD-SEM 8 –
96 Accretech UF200 Prober 8 –
97 Accretech UF200 Prober 8 –
98 AMAT eMax CT Plus Chamber – 12 2007
99 AMAT Enabler Chamber – 12 2007
100 AMAT eMax CT Plus Chamber – 12 2007
101 AMAT eMax CT Chamber – 12 2003
102 AMAT Axiom HT Plus Chamber – 12 2007
103 AMAT Enabler Chamber – 12 2007
104 AMAT Semivision CX200 – – –
105 Bruker DektakXT – – –
106 Bruker Veeco Dektak 8 RTP (2 Chambers) – –
107 Esec 2008XP Die Bonder 6 2002
108 Esec 2008XP Die Bonder 6 2004
109 Fluidair Acid Etch HF_HN03_HCl – 1997
110 KLA F5X Film measurement 8 2000
111 KLA Spectra FX200 Film measurement 12 2006
112 KLA P20H Profiler 8 1996
113 KLA Tencor P11 Surface Profiler – – –
114 KOKUSAI QUIXACE-2-LN – –
115 KOKUSAI QUIXACE-2-LN – –
116 KOKUSAI QUIXACE-2-ULN – –
117 LDS 1 Laserjet LDS 200A – –
118 LDS 3 LGS 200A – – –
119 Leica INS-200 8 1996
120 Linn High Therm KH-64-S Coating oven – 2009
121 Matech Waveetch 456G2 – –
122 Prometrix FT750-01 4, 8 –
123 TePLA 300 AL PC 6 2000
124 PVA TePLA 300 AL PC Photoresist Stripping, Surface cleaning 6 2004
125 RECIF ANF8 Notch Aligner Tool ID NANA13 Notch Aligner 8 2000
126 RECIF BPP200A01 Transfer Station – 2001
127 Rigaku XRF 3630 RR42036 Wafer Analyser(XRF) 8 1995
128 TEGAL Tegal 901 (Poly) Etch 6 –
129 TEGAL CS980 (980) Etch 8 –
130 TEGAL CS980 (981) 981 8 –
131 TENCOR PROMETRIX/UV1050 – 4,6,8 1997
132 TENCOR FLX-2908 8
133 Ultrafab WetBench QD72 2 tank Wet Bench 6 1995

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The trademarks of the equipment and parts contained in this website belonged to the Original Equipment Manufacturers